In situ probing the self-assembly of 3-hexyl-4-amino-1,2,4-triazole-5-thione on chalcopyrite surfaces

Add time:09/07/2019    Source:sciencedirect.com

The most engineering application for the molecular self-assembly of sulfydryl compounds on solid surfaces is froth flotation. In this work, the hydrophobic mechanism of 3-hexyl-4-amino-1,2,4-triazole-5-thione (HATT) on chalcopyrite (CuFeS2) was first investigated by in situ atomic force microscopy (AFM), in situ scanning electrochemical microscopy (SECM), time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS), contact angle and flotation tests. In situ AFM imaging elucidated that HATT might aggregate on chalcopyrite surface to form self-assembled monolayers. In situ SECM images confirmed the weakened tip current of chalcopyrite region after HATT adsorption. On the self-assembly layers, HATT bound overwhelmingly with copper atoms to form a five-membered-ring Cu(I)-HATT surface complex, accompanying with the reduction of cupric to cuprous. HATT anchored on chalcopyrite surfaces through its exocyclic S and N atoms of 4-amino-1,2,4-triazole-5-thione group and left its hexyl group towards aqueous solutions, resulting in an enhanced surface hydrophobicity to improve the flotation recovery of copper minerals. This fundamental understanding inspired by in situ approaches will promote the innovation and development of novel flotation surfactants.

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