XENON DIFLUORIDE (cas 13709-36-9) plasma fluorination of polymer surfaces
-
Add time:09/10/2019 Source:sciencedirect.com
XENON DIFLUORIDE (cas 13709-36-9) (XeF2) plasma treatment of a series of polymers containing different repeat units gives rise to varying levels of surface fluorination. Alkene and aromatic C–H bonds appear to be more susceptible towards reaction compared to their sp3 counterparts. The extent of fluorine incorporation can be accounted for in terms of a structure–behaviour relationship derived from extended Huckel molecular orbital calculations. Comparison with CF4 plasma modification shows that XeF2 electrical discharges are more effective at fluorinating polymer surfaces.
We also recommend Trading Suppliers and Manufacturers of XENON DIFLUORIDE (cas 13709-36-9). Pls Click Website Link as below: cas 13709-36-9 suppliers
Prev:The reaction of XENON DIFLUORIDE (cas 13709-36-9) with chloroform
Next:Reaction of alkylhypochlorites and XENON DIFLUORIDE (cas 13709-36-9) with cyclohexene) - 【Back】【Close 】【Print】【Add to favorite 】
- Related Information
- Reaction of carbonyl compounds with XENON DIFLUORIDE (cas 13709-36-9) in the presence of silicon tetrafluoride09/25/2019
- Reaction of alkylhypochlorites and XENON DIFLUORIDE (cas 13709-36-9) with cyclohexene09/24/2019
- The reaction of XENON DIFLUORIDE (cas 13709-36-9) with chloroform09/09/2019
- Ipso-amidation of arylboronic acids: XENON DIFLUORIDE (cas 13709-36-9)-nitriles as efficient reagent systems☆09/08/2019
- Multi-emitter chemiluminescence in the solid-phase interaction of XENON DIFLUORIDE (cas 13709-36-9) with uranyl hydrogen phosphate09/07/2019


