COMMUNICATION
DOI: 10.1002/asia.201000522
Catalytic Enantioselective Arylation of Glyoxylate with Arylsilanes: Practical
Synthesis of Optically Active Mandelic Acid Derivatives
Kohsuke Aikawa, Yuta Hioki, and Koichi Mikami*[a]
¯
Enantiomerically enriched mandelic acid derivatives have
been broadly utilized as versatile chiral building blocks for
the synthesis of numerous natural and biologically active
compounds.[1] While several synthetic methods for these
compounds have been developed to date,[2–5] the catalytic
enantioselective Friedel–Crafts (F-C) alkylation reaction of
glyoxylate[6] with aromatic or heteroaromatic rings is one of
Scheme 1. Catalytic enantioselective arylation using chiral dicationic Pd
the most attractive and useful methods for their practical
complex as Lewis acid catalyst.
synthesis.[7,8] On the catalytic enantioselective F-C alkylation
reaction using chiral Cu[7a,d] or Ti[7b,c] catalysts, high yield and
enantioselectivity have been achieved to efficiently synthe-
size mandelic acid derivatives. However, these catalytic re-
actions proceed only with highly reactive substrates, such as
N-methylated aniline, indoline, and indole derivatives, and
hence limit their synthetic application. Additionally, it is in-
herently difficult to control regioselectivity (p- or o-orienta-
tion) of the F-C alkylation reaction by direct use of aromatic
compounds, such as nucleophiles.[6–8] Herein, we describe a
highly regiospecific and practical catalytic enantioselective
arylation of ethyl glyoxylate with various arylsilanes using
chiral dicationic Pd complexes for the efficient synthesis of
enantiomerically enriched mandelic acid derivatives
(Scheme 1). Silyl groups of arylsilanes, which have been
rarely utilized owing to a lack of reactivity without activa-
tion reagents such as fluoride, have been employed as pro-
tective groups of aromatic compounds.[7a,8c] In sharp con-
trast, we anticipated that arylsilanes, which are easily syn-
thesized, storable, air- and moisture-stable, might increase
the enantioselectivity and reactivity by the steric effect and
the stabilizing effect of b-cation to control p- or o-orienta-
tion, respectively.[9] The highly reactive dicationic Pd com-
plex as a chiral Lewis acid catalyst is easily synthesized, air-
and moisture-stable.[10] Recently, the catalytic enantioselec-
tive arylation of carbonyl compounds with arylsilanes via an
aryl-copper intermediate was reported by Shibasaki and
Kanai.[11] However, to the best of our knowledge, the cata-
lytic enantioselective direct arylation with arylsilanes by a
Lewis acid catalyst without need for any additive has never
been reported.
We have already reported chiral dicationic Pd complex-
catalyzed highly enantioselective alkenyl-, dienyl-, and trien-
ylation employing the corresponding silyl compounds as nu-
cleophiles.[12,13] As an initial experiment under a similar con-
dition, the treatment of ethyl glyoxylate 2 with arylsilane 1a
in the presence of 5 mol% of various chiral dicationic Pd
complexes, which are generated in situ by adding slight
excess of AgSbF6 (2.2 equiv) to the corresponding neutral
dichloro Pd complexes,[10b,12] in dichloromethane at room
temperature for 24 h afforded the desired adduct 3a after
the desilylation with 1n HCl/THF solution (Table 1). The
effect of chiral diphosphine ligands was critical in this reac-
tion. While BINAP and tol-BINAP bearing binaphthyl-
backbone result in good-to-excellent yield and enantioselec-
tivity (83%, 98% ee and 71%, 99% ee) (entries 1–2), SYN-
PHOS, SEGPHOS, and MeO-BIPHEP bearing a biphenyl-
backbone decreased both the yield and enantioselectivity
(90, 94, and 82% ee, respectively) (entries 3–5). BDPP and
DUPHOS with central chirality further decreased the reac-
tivity and enantioselectivity (entries 6–7), and the reaction
with BINAPHANE did not proceed (entry 8). Toluene or
diethyl ether as a solvent led to lower yield owing to the
low solubility of the Pd complex (entries 9–10). In addition,
[a] Dr. K. Aikawa, Y. Hioki, Prof. Dr. K. Mikami
Department of Applied Chemistry
Tokyo Institute of Technology
O-okayama, Meguro-ku, 152-8552 (Japan)
Fax : (+81)3-5734-2776
Supporting information for this article is available on the WWW
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Chem. Asian J. 2010, 5, 2346 – 2350