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M.-J. Kim et al. / Organic Electronics 15 (2014) 2922–2931
140.0, 139.2, 138.4 137.8, 137.2, 136.8, 136.2, 135.2, 134.4,
133.8, 133.2, 130.7, 129.6, 129.2, 128.2, 128.0, 127.8, 127.4,
126.2, 125.8, 125.2, 124.4, 124.0, 123.3, 122.8, 122.4, 120.4,
120.1, 66.5. FT-IR (KBr, cmꢀ1) 3060, 3040, 3018 (aromatic
C–H). Anal. Calcd. for C43H26 (542.67): C, 95.17; H, 4.83.
Found: C, 95.20; H, 4.85. MS (FAB) m/z 543.20 [(M + 1)+].
sequentially onto the substrate at a rate of 1.0 Å/s by ther-
mal evaporation from heated alumina crucibles. The con-
centration of the dopant materials was 5%. The devices
were encapsulated with a glass lid and a CaO getter after
cathode deposition. Current density–voltage luminance
and EL characteristics of the blue fluorescent OLEDs were
measured with a Keithley 2400 source measurement unit
(Cleveland, OH, USA) and a CS 1000 spectroradiometer.
2.3. Representative preparation of 3-(2-naphthyl)-10-
naphthylspiro[benzo[i,j]tetraphene-7,90-fluorene] (N-NSBTF)
3. Results and discussion
A solution of 3-bromo-10-naphthylspiro[benzo[ij]tet-
raphene-7,90-fluorene] (6.22 g, 10 mmol), tetrakis(triphen-
ylphosphine)palladium(0) (0.59 g, 0.51 mmol), and
naphthalene-2-boronic acid (1.72 g, 10 mmol) dissolved
in THF (150 mL) was stirred in a double-necked flask for
30 min. K2CO3 (2 M, 150 mL) was added dropwise over
20 min. The resulting reaction mixture was refluxed over-
night at 80 °C and then extracted with ethyl acetate and
water. After the organic layer was evaporated with a rotary
evaporator, the resulting powdery product was purified by
column chromatography from CH2Cl2/n-hexane (1/1) to
give the yellow crystalline product N-NSBTF. NP-NSBTF
and P-NSBTF were prepared using similar procedures
described above.
N-NSBTF: yield 81%. Mp 322 °C. UV–vis (THF): kmax
(absorption) = 370, 387 nm, kmax (emission) = 442 nm. 1H
NMR (500 MHz, CDCl3, ppm) 8.52 (d, 1H), 8.42 (d, 1H),
8.04 (m, 6H), 7.96 (d, 1H), 7.88 (m, 2H), 7.83 (m, 3H),
7.69 (m, 4H), 7.54 (m, 2H), 7.45 (m, 2H), 7.41 (t, 2H),
7.25 (s, 1H), 7.22 (d, 1H), 7.06 (m, 5H), 6.63 (d, 1H). FT-IR
(KBr, cmꢀ1) 3060, 3018 (aromatic C–H). Anal. calcd. for
3.1. Synthesis and characterization
Scheme 2 shows the synthetic route to 3-bromo-
10-naphthylspiro[benzo[ij]tetraphene-7,90-fluorene]. Spe-
cifically, the Pd-catalyzed Suzuki coupling reaction of
3-bromo-10-naphthylspiro[benzo[ij]tetraphene-7,90-fluo-
rene] with naphthalene-2-boronic acid, 4-(2-naph-
thyl)phenyl boronic acid and phenylboronic acid produced
high yields (>87%) of N-NSBTF, NP-NSBTF, and P-NSBTF
(Scheme 3). Bromination of 10-naphthylspiro[benzo[ij]tet-
raphene-7,90-fluorene] with 1.01 equiv. of bromine in car-
bon tetrachloride solution led to the selective, high-yield
formation of 3-bromo-10-naphthylspiro[benzo[ij]tetraph-
ene-7,90-fluorene] (Figs. S1–S6). The chemical structures
and composition of the resulting spiro[benzo[ij]tetraph-
ene-7,90-fluorene] derivatives were characterized via 1H
NMR, FT-IR, gas chromatography–MS, and elemental analy-
sis (Figs. S7–S15).
C
53H32 (668.25): C, 95.18; H, 4.82. Found: C, 95.09; H,
3.2. Thermal properties
4.81. MS (FAB) m/z 669 [(M + 1)+].
NP-NSBTF: yield 78%. Mp 374 °C. UV–vis (THF): kmax
(absorption) = 373 nm, kmax (emission) = 446 nm. 1H NMR
(500 MHz, CDCl3, ppm) 8.52 (d, 1H), 8.42 (d, 1H), 8.15 (s,
1H), 8.03 (m, 5H), 7.95 (m, 2H), 7.78 (m, 7H), 7.78 (d,
1H), 7.74 (d, 1H), 7.57 (m, 3H), 7.51 (m, 2H), 7.46 (m,
2H), 7.42 (t, 2H), 7.21 (d, 1H), 7.13 (m, 3H), 7.07 (m, 2H),
6.63 (d, 1H). FT-IR (KBr, cmꢀ1) 3060, 3018 (aromatic C–
H). anal. calcd. for C59H36 (744.28): C, 95.13; H, 4.87.
Found: C, 95.05; H, 4.85. MS (FAB) m/z 745 [(M + 1)+].
P-NSBTF: yield 84%. Mp 317 °C. UV–vis (THF): kmax
(absorption) = 369, 385 nm, kmax (emission) = 432 nm. 1H
NMR (500 MHz, CDCl3, ppm) 8.50 (d, 1H), 8.39 (d, 1H),
8.04 (m, 5H), 7.82 (m, 3H), 7.74 (m, 1H), 7.67 (m, 1H),
7.59 (d, 1H), 7.53 (d, 2H), 7.51 (m, 2H), 7.44 (m, 2H), 7.41
(m, 3H), 7.21 (d, 1H), 7.10 (m, 3H), 7.04 (d, 2H), 6.61 (d,
1H). FT-IR (KBr, cmꢀ1) 3060, 3038, 3020 (aromatic C–H).
Anal. calcd. for C49H30 (618.23): C, 95.11; H, 4.89. Found:
C, 95.09; H, 4.85. MS (FAB) m/z 619 [(M + 1)+].
The thermal behavior of the NSBTF host materials was
evaluated by means of differential scanning calorimetry
(DSC) and thermogravimetric analysis (TGA) under a nitro-
gen atmosphere, and Table 1 summarizes the thermal
analysis data for the three compounds. A 5% weight loss
was observed at 403, 412, and 398 °C, and the melting
points (Tm) of N-NSBTF, NP-NSBTF, and P-NSBTF were
322, 374, and 317 °C, respectively, but no melting points
were observed on the second heating scan, even though
they were given enough time to cool in air. Once the com-
pounds became amorphous solids, they did not revert to
their crystalline state. After the samples had cooled to
room temperature, a second DSC scan showed glass transi-
tion temperatures (Tg) of 179 °C, 186 °C, and 174 °C for N-
NSBTF, NP-NSBTF, and P-NSBTF, respectively, as a result of
the rigid spiro-type backbone. The data indicate that these
three materials are stable enough to endure the high tem-
peratures of vacuum vapor deposition. As a result, the
amorphous glassy state of the transparent films made of
the two host materials indicated that these are good candi-
dates for use as EL materials [28].
2.4. OLED fabrication
A
basic device configuration of indium tin oxide
(150 nm)/N,N0-bis-[4-(di-m-tolylamino)phenyl]-N,N0-diph-
enylbiphenyl-4,40-diamine
(DNTPD, 60 nm)/bis[N-(1-
3.3. Optical properties and energy levels
naphthyl)-N-phenyl]benzidine (NPB, 30 nm)/NSBTF hosts:
LBD (20 nm, 5%)/aluminum tris(8-hydroxyquinoline)(Alq3,
20 nm)/LiF (1 nm)/Al (200 nm) was used for device fabrica-
tion, as shown in Fig. 1. The organic layers were deposited
Fig. 2 shows the UV absorption and PL spectra of N-
NSBTF, NP-NSBTF, and P-NSBTF in solution, as well as in
the form of solid thin films. Specifically, two maxima were