ORGANIC
LETTERS
2012
Vol. 14, No. 12
2964–2967
Stepwise Cyanation of Naphthalene
Diimide for n-Channel Field-Effect
Transistors
Jingjing Chang,† Qun Ye,† Kuo-Wei Huang,‡ Jie Zhang,§ Zhi-Kuan Chen,§
Jishan Wu,†,§ and Chunyan Chi*,†
Department of Chemistry, National University of Singapore, 3 Science Drive 3,
Singapore 117543, KAUST Catalysis Center and Division of Chemical and Life Sciences
and Engineering, 4700 King Abdullah University of Science and Technology,
Thuwal 23955-6900, Kingdom of Saudi Arabia, and Institute of Materials Research and
Engineering, A*Star, 3 Research Link, Singapore 117602
Received April 9, 2012
ABSTRACT
Stepwise cyanation of tetrabromonaphthalenediimide (NDI) 1 gave a series of cyanated NDIs 2ꢀ5 with the monocyanated NDI 2 and dicyanated
NDI 3 isolated. The tri- and tetracyano- NDIs 4 and 5 show intrinsic instability toward moisture because of their extremely low-lying LUMO energy
.
levels. The partially cyanated intermediates can be utilized as air-stable n-type semiconductors with OFET electron mobility up to 0.05 cm2 Vꢀ1 sꢀ1
Naphthalene diimide (NDI)1 based molecules have been
intensively investigated as n-type semiconductors for or-
ganic field effect transistors (OFETs). The interest stems
from the early observation of the n-type behavior1c as well
as the versatile tuning of their chemical and electron-
ic properties by varying the substituents at the imide
position2 or on the naphthalene core.3 In order to achieve
applicable electron-transporting materials with high
charge carrier mobility and good air stability, introduction
of electron-withdrawing cyano groups onto the NDI
framework has become an important strategy.4
Our interest herein is to synthesize a series of new cyanated
NDI molecules such as 2ꢀ5 from the tetrabromo-NDI 1
(Scheme 1) and to exploit their applications as new
n-type semiconductors for air-stable OFETs. The dicya-
nated NDI (nonbrominated analog of 3) is known as
an air-stable n-type semiconductor,1f while the syn-
thesis of tetracyano NDI 55 is very challenging because
† National University of Singapore.
‡ King Abdullah University of Science and Technology.
§ Institute of Materials Research and Engineering.
(1) (a) Zhan, X.; Facchetti, A.; Barlow, S.; Marks, T. J.; Rather,
M. A.; Wasielewski, M. R.; Marder, S. R. Adv. Mater. 2011, 33, 268. (b)
Bhosale, S. V.; Jani, C. H.; Langford, S. J. Chem. Soc. Rev. 2008, 37, 331.
(c) Laquindanum, J. G.; Dodabalapur, A.; Lovinger, A. J. J. Am. Chem.
Soc. 1996, 118, 11331. (d) Katz, H. E.; Johnson, J.; Lovinger, A. J.; Li,
W. J. Am. Chem. Soc. 2000, 122, 7787. (e) Katz, H. E.; Lovinger, A. J.;
Johnson, J.; Kloc, C.; Siegrist, T.; Li, W.; Lin, Y. Y.; Dodabalapur, A.
Nature 2000, 404, 478. (f) Jones, B. A.; Facchetti, A.; Marks, T. J.;
Wasielewski, M. R. Chem. Mater. 2007, 19, 2703.
(3) (a) Sakai, N.; Mareda, J.; Vauthey, E.; Matile, S. Chem. Soc. Rev.
2010, 46, 4225. (b) Chopin, S.; Chaignon, F.; Blart, E.; Odobel, F.
€
J. Mater. Chem. 2007, 17, 4139. (c) Kruger, H.; Janietz, S.; Sainova, D.;
Dobreva, D.; Koch, N.; Vollmer, A. Adv. Funct. Mater. 2007, 17, 3715.
(d) Suraru, S.; Wurther, F. Synthesis 2009, 11, 1841.
(4) (a) Hu, Y.; Gao, X.; Di, C.; Yang, X.; Zhang, F.; Liu, Y.; Li, H.;
Zhu, D. Chem. Mater. 2011, 23, 1204. (b) Gao, X.; Di, C.; Hu, Y.; Yang,
X.; Fan, H.; Zhang, F.; Liu, Y.; Li, H.; Zhu, D. J. Am. Chem. Soc. 2010,
132, 3697.
(2) (a) See, K. C.; Landis, C.; Sarjeant, A.; Katz, H. E. Chem. Mater.
2008, 20, 3609. (b) Shukla, D.; Nelson, S. F.; Freeman, D. C.; Rajeswaran,
M.; Ahearn, W. G.; Meyer, D. M.; Carey, J. T. Chem. Mater. 2008, 20,
7286. (c) Jung, B.; Sun, J.; Lee, T.; Sarjeant, A.; Katz, H. E. Chem.
Mater. 2009, 21, 94. (d) Kantchev, E. A. B.; Tan, H. S.; Norsten, T. B.;
Sullivan, M. B. Org. Lett. 2011, 13, 5432.
€
r
10.1021/ol300914k
Published on Web 05/25/2012
2012 American Chemical Society