requisite base. Next, we investigated the utility of this
reagent for in situ masking with substrates 1À6, each
bearing two different carbonyl groups (Table 1). The
broad scope of this approach was striking, because high
levels of chemoselectivity were easily achieved during
nucleophilic addition with reducing reagents, Grignard
reagents, organolithium reagents, Wittig reagents, and
enolate anions. Following treatment with the complex on
4-acetylbenzaldehyde (1), MeLi addition occurred exclu-
sively at the ketone togive the tertiary alcohol 7 in excellent
86% yield. The Grignard reagents, EtMgBr and PhMgBr,
also provided high yields of the tertiary alcohols 8 and 9,
respectively. Indeed, the role of Grignard reagents in
synthesis continues to expand with recent advances in the
preparation of organomagnesium reagents.17,18 Wittig
olefination using Ph3PCH3Br and n-BuLi following in situ
trapping with the aluminumÀamide reagent gave the
alkene 10 in 80% yield. To our knowledge, prior in situ
masking strategies have not demonstrated compatibility
with Wittig olefinations.3À9 Also, a Claisen condensation
was performed with the lithium-derived enolate of EtOAc
after in situ masking of 1, and the product 11 was obtained
in 70% yield. This approach using dimethylaluminumÀ
dimethylhydroxylamine was then applied to the nonaromatic
substrate, 4-oxocyclohexanecarbaldehyde (2), and selective
Wittig olefination at the ketone provided the alkene 12 in
86% yield. Two additional selective Grignard additions using
MeMgBr and allyl MgCl were performed with 4-acetyl-
methylbenzoate (3), and double addition to the ester gave
alcohols 13 and 14, respectively. Ethyl 4-oxocyclohexanecar-
boxylate (4) participates in a similar fashion to provide the
double-addition product 15 in 79% yield. Also, methyl
4-formylbenzoate (5) was subjected to in situ trapping with
the aluminumÀamide followed by selective addition of the
organolithiums, EtLi and n-BuLi, at the ester to give 16 and
17, respectively. Grignard addition to the masked derivative
of 5 yielded 83% of the double-addition product 18. Com-
plete reduction of the ester in the presence of the aldehyde was
achieved using 5 and providing the primary alcohol 19.
Lastly, the reactive ethyl benzoylformate 6 was subjected to
in situ masking followed by Grignard addition, and despite
the proximity of the trapped R-ketoester, double addition
gave the tertiary alcohol 20 in 84% yield. Overall, this strategy
can efficiently use aromatic and alkyl substrates, regardless of
the presence of acidic R-protons, and also it is compatible
with many types of nucleophiles, including Wittig reagents
and enolate anions.
compound has been used as a tool to study chemical19 and
enzyme kinetics.20 Using the in situ masking followed by
reduction with DIBALH yielded the same target 21 in 88%
yield in a single step! This comparison clearly illustrates the
power of this process to eliminate protection/deprotection
sequences and enhance isolated yields.
Next, we turned our attention to developing a simple proto-
col to unmask the trapped carbonyl groups for immediate
synthetic manipulation. First, 19F NMR data were ac-
quired for 4-fluorobenzaldehyde (22), following treatment
with the dimethylaluminum N,O-dimethylhydroxylamine
complex (Figure 1A). A single signal was observed at À117
ppm, and this peak was distinct from the starting material
22 at À105 ppm (data not shown). After an extensive
screen of reagents and conditions, it was discovered that
the trapped intermediate could be quantitatively un-
masked to the precursor carbonyl group in the 19F NMR
spectrum using Dowex and sonication (Figure 1B). A new
peak at À105 ppm appeared, which indicates complete
regeneration of 4-fluorobenzaldehyde 22. The addition of
acid to collapse the intermediate aminal was anticipated,
because an acidic workup is required to hydrolyze this type
of aminal, which is usually formed following nucleophilic
addition to a Weinreb amide.
Scheme 2. Comparison of in Situ Masking versus Stepwise
A side-by-side comparison to demonstrate the in situ
masking approach with dimethylaluminumÀdimethyl-
hydroxylamine against a traditional protection/deprotection
sequence was executed (Scheme 2). A three-step synthesis
of 4-(hydroxymethyl)cyclohexanone 21 from 4-oxocyclo-
hexanecarboxylate (4) has been reported by acetal formation,
reduction of the ester, and acetal hydrolysis.19 The target 21
was isolated in 36% yield across these three steps, and this
Figure 1. Comparison of 19F NMR data of 4-fluorobenzalde-
hyde at 276 MHz. (A) 4-Fluorobenzaldehyde after treatment
with the dimethylaluminum N,O-dimethylhydroxylamine com-
plex. (B) After unmasking the mixture in 1A with Dowex and
sonication. C6H5CF3 was used as an internal standard.
(17) Krasovskiy, A.; Krasovskaya, V.; Knochel, P. Angew. Chem.,
Int. Ed. 2006, 45, 2958–2961.
(18) Fleury, L. M.; Ashfeld, B. L. Tetrahedron Lett. 2010, 51, 2427–2430.
(19) Kayser, M. M.; Clouthier, C. M. J. Org. Chem. 2006, 71, 8424–8430.
Org. Lett., Vol. XX, No. XX, XXXX
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