
Journal of Organic Chemistry p. 934 - 935 (1986)
Update date:2022-07-29
Topics: Purification Starting Material Chiral Auxiliary Introduction De-Protection Chiral Auxiliary Removal
Erickson, Thomas J.
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Doi:10.1039/c39930000191
(1993)Doi:10.1016/S0008-6215(92)84233-I
(1992)Doi:10.1039/c39930000156
(1993)Doi:10.1055/s-1979-28879
(1979)Doi:10.1021/jo00078a053
(1993)Doi:10.1039/c39920001082
(1992)