Macromolecules
Article
2013, 54, 3182−3187. (p) Podsiadły, R.; Strzelczyk, R. Dyes Pigm.
2013, 97, 462−468. (q) Shen, K.; Li, Y.; Liu, G.; Li, Y.; Zhang, X. Prog.
Org. Coat. 2013, 76, 125−130. (r) Xiao, Q.; Ji, Y.; Xiao, Z.; Zhang, Y.;
Lin, H.; Wang, Q. Chem. Commun. 2013, 49, 1527−1529.
ization of EPOX, the radical polymerization of TMPTA, the
TMPTA/EPOX blend IPN polymerization, and the thiol−ene
polymerization as well under low light intensities. In addition,
the ID2/amine/phenacyl bromide or the ID2/amine/2,4,6-
tris(trichloromethyl)-1,3,5-triazine combinations are also effi-
cient for the radical polymerization of TMPTA. Moreover, ID2
is more efficient than the well-known visible light sensitizer CQ
and can be useful to overcome the oxygen inhibition. The
proposed structure is also very efficient for the in situ formation
of Ag(0) nanoparticles. This present research confirms that the
design of push−pull photoinitiators is a promising way to
develop highly absorbing compounds in the blue wavelength
range which ensures polymerization reactions under low
intensity light sources.
(6) (a) Xiao, P.; Dumur, F.; Tehfe, M.-A.; Graff, B.; Gigmes, D.;
Fouassier, J. P.; Laleve
DOI: 10.1002/macp.201300363. (b) Xiao, P.; Dumur, F.; Tehfe, M.
A.; Graff, B.; Gigmes, D.; Fouassier, J. P.; Lalevee, J. Polymer 2013, 54,
3458−3466.
(7) Xiao, P.; Dumur, F.; Frigoli, M.; Tehfe, M.-A.; Morlet-Savary, F.;
Graff, B.; Fouassier, J. P.; Gigmes, D.; Lalevee, J. Polym. Chem. 2013, 4,
5440−5448.
(8) Tehfe, M. A.; Dumur, F.; Graff, B.; Gigmes, D.; Fouassier, J. P.;
Lalevee
́
e, J. Macromol. Chem. Phys. 2013,
́
́
́
, J. Macromolecules 2013, 46, 3332−3341.
(9) Dumur, F.; Contal, E.; Wantz, G.; Phan, T. N. T.; Bertin, D.;
Gigmes, D. Chem.Eur. J. 2013, 19, 1373−1384.
(10) Tehfe, M. A.; Dumur, F.; Contal, E.; Graff, B.; Gigmes, D.;
ASSOCIATED CONTENT
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Fouassier, J. P.; Lalevee
2201.
́
, J. Macromol. Chem. Phys. 2013, 214, 2189−
S
* Supporting Information
Figure S1, steady state photolysis of ID1/Iod and ID4/Iod in
acetonitrile. This material is available free of charge via the
(11) Tehfe, M. A.; Dumur, F.; Graff, B.; Morlet-Savary, F.; Gigmes,
D.; Fouassier, J. P.; Lalevee, J. Polym. Chem. 2013, 4, 3866−3875.
́
(12) Tehfe, M. A.; Lalevee, J.; Telitel, S.; Sun, J.; Zhao, J.; Graff, B.;
Morlet-Savary, F.; Fouassier, J. P. Polymer 2012, 53, 2803−2808.
(13) Tehfe, M. A.; Lalevee, J.; Morlet-Savary, F.; Graff, B.; Blanchard,
N.; Fouassier, J. P. Macromolecules 2012, 45, 1746−1752.
(14) Xiao, P.; Lalevee, J.; Allonas, X.; Fouassier, J. P.; Ley, C.; El Roz,
M.; Shi, S. Q.; Nie, J. J. Polym. Sci., Part A: Polym. Chem. 2010, 48,
5758−5766.
(15) Fouassier, J. P. Photoinitiator, Photopolymerization and Photo-
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AUTHOR INFORMATION
Corresponding Authors
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́
Present Address
⊥Formerly at: ENSCMu-UHA, 3 rue Alfred Werner, 68093
Mulhouse Cedex, France.
(16) Rehm, D.; Weller, A. Isr. J. Chem. 1970, 8, 259−271.
(17) Foresman, J. B.; Frisch, A. Exploring Chemistry with Electronic
Structure Methods; Gaussian. Inc.: Pittsburgh, PA, 1996.
Notes
The authors declare no competing financial interest.
(18) Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.;
Robb, M. A.; Cheeseman, J. R.; Zakrzewski, V. G.; Montgomery, J. A.;
Stratmann, J. R. E.; Burant, J. C.; Dapprich, S.; Millam, J. M.; Daniels,
A. D.; Kudin, K. N.; Strain, M. C.; Farkas, O.; Tomasi, J.; Barone, V.;
Cossi, M.; Cammi, R.; Mennucci, B.; Pomelli, C.; Adamo, C.; Clifford,
S.; Ochterski, J.; Petersson, G. A.; Ayala, P. Y.; Cui, Q.; Morokuma, K.;
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I.; Gomperts, R.; Martin, R. L.; Fox, D. J.; Keith, T.; Al-Laham, M. A.;
Peng, C. Y.; Nanayakkara, A.; Challacombe, M.; Gill, P. M. W.;
Johnson, B.; Chen, W.; Wong, M. W.; Andres, J. L.; Gonzalez, C.;
Head-Gordon, M.; Replogle, E. S.; Pople, J. A. Gaussian 03, Revision B-
2; Gaussian, Inc.: Pittsburgh PA, 2003.
ACKNOWLEDGMENTS
J.L. thanks the Institut Universitaire de France for the financial
support.
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dx.doi.org/10.1021/ma402149g | Macromolecules XXXX, XXX, XXX−XXX