Dimesogenic LQ organosiloxanes
Russ.Chem.Bull., Int.Ed., Vol. 52, No. 7, July, 2003
1619
models of packing in the SmA and SmC phases of comꢀ
pound 1 constructed based on Xꢀray diffraction data and
on the HyperChem 4.5 models designed on a Silicon
Graphics O2 computer.
Experimental
1
H and 29Si NMR spectra were recorded on a Bruker
AMXꢀ400 spectrometer at 20 °C in a CDCl3—CCl4 mixture and
the IR spectra were measured on a Specord Mꢀ82 spectrometer
in КВr pellets. The temperatures and enthalpies of phase transiꢀ
tions in the compounds were determined by differential scanꢀ
ning calorimetry on a PerkinꢀElmer DSCꢀ7 instrument at a
heating rate of 2, 5, or 10 °C min–1. The Xꢀray diffraction
measurements were carried out on a Dronꢀ3M diffractometer.
Prior to the measurements, the samples were maintained at a
constant temperature, to within 1 °C, for 20 min. The phase
state was determined by optical polarization microscopy using
an Axiolab Pol microscope (Zeiss). A Linkam controlled hot
stage was used.
1,3ꢀBis[10ꢀ(4´ꢀcyanobiphenylꢀ4ꢀylcarbonyloxy)decyl]tetraꢀ
methyldisiloxane (1). A solution of chlorosilane 4 (1.9 g,
4.1 mmol) in 10 mL of an Et2O—toluene mixture (1 : 1) was
added over a period of 30 min to a mixture of H2O (0.07 g,
3.9 mmol) and NaHCO3 (0.34 g, 4.0 mmol) in 5 mL of Et2O.
The mixture was heated for 2 h on a water bath. The precipitate
was filtered off and the upper layer was washed with water and
dried with Na2SO4. The solvents were evaporated in vacuo. Fracꢀ
tional crystallization from hot EtOH and subsequent recrystalliꢀ
zation from Et2O gave 1.40 g (78.6%) of compound 1 with Тi
108—110 °C. Found (%): C, 72.70; H, 7.75; N, 3.20; Si, 6.78.
C52H68N2OSi2. Calculated (%): C, 72.90; H, 7.24; N, 3.27; Si,
6.54. 1H (δ: 0.02 (s, 6 H, MeSi); 0.48 (m, 2 H, CH2Si); 1.28 (m,
12 H, CH2CH2CH2); 1.39 (quint., 2 H, CH2CH2CH2, 3J =
7.6 Hz); 1.76 (quint, 2 H, C(O)CH2CH2, J = 7.6 Hz); 2.55 (t,
2 H, C(O)CH2CH2, 3J = 7.6 Hz); 7.15 (d, 2 H, CHCCN,
The results of Xꢀray diffraction measurements may
imply two variants of molecular packing for compound 2
in the SmA phase. First, with known interlayer spacing
calculated from the angle position of the smallꢀangle reꢀ
flection (d = 28.8 Å) and the length of the mesogenic
group (L = 27.8 Å), one can construct the model of
molecular packing with full overlap of the mesogenic
groups (Fig. 9, a). However, within the bounds of this
model, it is difficult to interpret a number of features
inherent in the Xꢀray diffraction patterns of compound 2
in the SmA phase, in particular, the complex pattern of
amorphous scattering and the negative gradient of the
d1(T ) dependence. It follows from Xꢀray diffraction data
that the layer packing with d = 2d002 = 57.44 Å shown in
Fig. 9, b is most probable for compound 2. Indeed, the
presence of amorphous diffraction in the Xꢀray diffracꢀ
tion pattern caused by scattering on the siloxane rings
attests to an increase in the electron density in the center
of the layer. This should result in a decrease in the intenꢀ
sity of odd reflection orders responsible for interlayer peꢀ
riodicity. Therefore, an index of 002 should be ascribed to
the registered interlayer reflection with 2θ = 3.07°, asꢀ
suming that the <001> direction coincides with the norꢀ
mal to the plane of the layer.
The presence of these features in the Xꢀray diffracꢀ
tion characteristics in the case of compound 2 and their
lack for compound 1 is due to a substantial increase in the
volume fraction of the siloxane moiety upon replacement
of the linear central fragment by a cyclic one. The calcuꢀ
lation showed that the ratios of the sums of the increꢀ
ments of the van der Waals volumes of atoms incorporated
in the siloxane and mesogenic fragments, Σ∆ViSi/Σ∆Vim
are 178.3/689.4 ≈ 0.26 and 671.2/689.4 ≈ 0.97 for comꢀ
pounds 1 and 2, respectively.11
3
C6H4CN, J = 8.4 Hz); 7.53 (d, 2 H, CHCHCCN, C6H4CN,
3J = 8.4 Hz); 7.61 (d, 2 H, CHCHCO, J = 8.4 Hz); 7.68 (d,
3
2 H, CHCHCO, C6H4O, 3J = 8.4 Hz). 29Si NMR, δ: 7.15
(s, CH2SiMe2O).
2,8ꢀBis[10ꢀ(4´ꢀcyanobiphenylꢀ4ꢀyloxycarbonyl)decyl(diꢀ
methyl)silyloxy]ꢀ2,4,4,6,6,8,10,10,12,12ꢀdecamethylcyclohexaꢀ
siloxane (2). A solution of chlorosilane 4 (0.16 g, 3.58 mmol) in
2 mL of toluene was placed into an argonꢀfilled flask equipped
with a reflux condenser, a dropping funnel, and a thermometer.
At 20 °C, a mixture of cyclohexasiloxane 5 (0.06 g, 0.145 mmol)
and 0.4 mL of Et3N in 6 mL of toluene was added from a
dropping funnel with stirring over a period of 0.5 h and the
resulting mixture was heated for 12 h at 50 °C. The precipitate
was filtered off, the solution was washed many times with water
and dried with CаCl2, and the solvent was evaporated. The
residue was purified on a column with silica gel (elution with
toluene—acetone, 5 : 1) to give 0.06 g (32%) of compound 2
with Тi 87—89 °C. Found (%): C, 57.60; H, 7.58; N, 2.05;
Si, 17.61. C62H98N2O12Si8. Calculated (%): C, 57.78; H, 7.65;
N, 2.17; Si, 17.43. H NMR, δ: 0.02, 0.04 (both s, 3 H each,
cis and trans MeSiO3); 0.06 (s, 24 H, Me2SiO2); 0.09 (s, 6 H,
CH2(CH3)2SiO); 0.51 (m, 2 H, CH2Si); 1.28 (m, 12 H,
CH2CH2CH2); 1.40 (quint, 2 H, CH2CH2CH2, J = 7.6 Hz);
1.76 (quint, 2 H, C(O)CH2CH2, J = 7.6 Hz); 2.56 (t, 2 H,
C(O)CH2CH2, 3J = 7.6 Hz); 7.16 (d, 2 H, CHCCN, C6H4CN,
3J = 8.4 Hz); 7.55 (d, 2 H, CHCHCCN, C6H4CN, 3J =
8.4 Hz); 7.64 (d, 2 H, CHCHCO, 3J = 8.4 Hz); 7.71 (d,
2 H, CHCHCO, C6H4, 3J = 8.4 Hz). 29Si NMR, δ: 7.92
Thus, in relation to two liquid crystalline organosilicon
compounds with linear and cyclic siloxane centers with
the predominant transꢀposition of the terminal cyanoꢀ
biphenylyl mesogenic groups connected to the core by an
aliphatic (CH2)n spacer (n = 10), it was shown that the
type of packing in the LC state depends on the structure
of the siloxane core. The cyclosiloxane core stabilizes the
layer type of packing in the LC state, while the linear core
in the absence of a chiral center in the mesogenic group
creates conditions for the formation of the SmC chiral
phase with a maximum interlayer distance in the region of
1
3
the SmA
SmC transition. Irrespective of the structure
of the siloxane center, the synthesized liquidꢀcrystalline
methylsiloxanes are characterized by a negative gradient
of the temperature dependence of the interlayer spacing
in the SmA phase.