New photolabile protecting groups in nucleoside and nucleotide chemistry - Synthesis, cleavage mechanisms and applications

Article abstract of DOI:10.1080/07328319808004738

New photolabile protecting groups have been found in the 2-(2- nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. β-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced β-elimination process is proposed.

Full text of DOI:10.1080/07328319808004738

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Nucleosides and Nucleotides
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New Photolabile Protecting Groups
in Nucleoside and Nucleotide
Chemistry—Synthesis, Cleavage
Mechanisms and Applications
H. Giegrich a , S. Eisele-Bühler a , Chr Hermann a , E. Kvasyuk a , R.
Charubala a & W. Pfleiderer a
a Fakultät für Chemie, Universität Konstanz, Postfach 5560,
D-78434, Konstanz, Germany
Published online: 22 Aug 2006.
To cite this article: H. Giegrich , S. Eisele-Bhler , Chr Hermann , E. Kvasyuk , R. Charubala
& W. Pfleiderer (1998) New Photolabile Protecting Groups in Nucleoside and Nucleotide
Chemistry—Synthesis, Cleavage Mechanisms and Applications, Nucleosides and Nucleotides, 17:9-11,
1987-1996, DOI: 10.1080/07328319808004738
To link to this article: http://dx.doi.org/10.1080/07328319808004738
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