Beilstein J. Org. Chem. 2015, 11, 85–91.
Acknowledgements
We gratefully acknowledge Morita Chemical Industries Co.,
Ltd for supplying triethylamine poly(hydrogen fluoride)
[Et3N·nHF (n = 3–5)] and tetraethylammonium fluoride
poly(hydrogen fluoride) [Et4NF·nHF (n = 3–5)] that were used
as supporting salt fluorine source. We also thank technical staffs
working at Center for Advanced Materials Analysis
(Suzukakedai Campus) of Tokyo Institute of Technology for
analyzing new compounds. One of the authors (Y. B.) acknowl-
edges Ministry of Education, Culture, Sports, Science & Tech-
nology of Japan for awarding national scholarship to conduct
this research.
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Scheme 4: Mechanism for suppression of the elimination of HF
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