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G. Rossé et al.
LETTER
were added. After 5 min shaking at r.t., the light yellow
(6) (a) Ruden, R. A. J. Org. Chem. 1974, 39, 3607. (b) Yang, H.
W.; Romo, D. Tetrahedron Lett. 1998, 39, 2877.
(7) Black, T. H.; Zhang, Y.; Huang, J.; Smith, D. C.; Yates, B. E.
Synth. Commun. 1995, 25, 15.
(8) Otera, J.; Nakazawa, K.; Sekoguchi, K.; Orita, A. Tetrahedron
1997, 53, 13633.
(9) Burns, C. J.; Groneberg, R. D.; Salvino, J. M.; McGeehan, G.;
Condon, S. M.; Morris, R.; Morrissette, M.; Mathew, R.;
Darnbrough, S.; Neuenschwander, K.; Scotese, A.; Djuric, S.
W.; Ullrich, J.; Labaudiniere, R. Angew. Chem., Int. Ed. 1998,
37, 2848.
(10) Carpino, L. A. J. Am. Chem. Soc. 1993, 115, 4397.
(11) Davis, A. F.; Stringer, O. D. J. Org. Chem 1982, 47, 1774.
(12) The synthesis of 5a and 6a are representative of the procedure
used for the parallel synthesis of the libraries.
solution was added to the hydroxylamine-Wang resin. The
reaction mixture was shaken for 2 h, filtered off, washed three
times with DMA (4 mL) and three times with i-PrOH (3 mL)
each. A sample of the resin was dried under high vacuum:
77% conversion based on elemental analysis. ATR
(attenuated total reflection) FTIR: 1670 cm-1. Anal. Found:
N, 1.21; S, 1.93.
5,5-Dimethyl-3-(naphthalene-2-sulfinyl)-hexanoic acid
hydroxyamide (5a): A portion of resin 4a (0.25 mmol) was
washed three times with CH2Cl2 (4 mL) and then a solution of
N-phenylsulfonyl-3-phenyloxaziridine (2.8 mL, 0.1 M, 0.28
mmol) in CH2Cl2 was added. The reaction mixture was shaken
for 10 h, filtered off, washed three times with CH2Cl2 (4 mL),
three times with i-PrOH (3 mL) and again three times with
CH2Cl2 (4 mL). A solution of TFA/H2O/CH2Cl2 70:2:28
(4 mL) was added to the resin and the reaction mixture was
shaken for 3 h. This eluate and one subsequent wash with
TFA/H2O/CH2Cl2 70:2:28 were collected and combined. The
solvent was evaporated and the residue was purified by
preparative HPLC (YMC Pack Pro C18 column, 5 , 120 Å,
50 20 mm) using a gradient of H2O and MeCN (in 3.3 min
from 20%MeCN to 95% MeCN, 1.2 min at 95% MeCN, in 0.1
min from 95% MeCN to 20% MeCN, 0.1 min at 20% MeCN,
flow: 35 mL/min). 35 mg (41%) of 5a: ESIMS m/z 332.3
([M-], 100). 1H NMR (250 MHz, DMSO-d6): 10.4 (s, 1H,
NH), 8.21 (s, 1H), 8.02-8.19 (m, 3H), 7.63-7.70 (m, 3H), 3.12-
3.24 (m, 1H), 1.81-2.22 (m, 3H), 1.23-1.31 (m, 1H), 0.93 (s,
9H).
5,5-Dimethyl-3-(naphthalene-2-sulfonyl)-hexanoic acid
hydroxyamide (6a): A portion of resin 4a (0.2 5 mmol) was
washed three times with CH2Cl2 (4 mL) and then of a solution
of MCPBA (4.0 mL, 0.25 M, 1.0 mmol) in CH2Cl2 was added.
The suspension was shaken at r.t. for 4 h. Washing of the resin,
cleavage of the compound from the resin and purification
using preparative HPLC were performed as described for 5a.
25 mg (29%) of 6a: ESIMS m/z 348.3 ([M-], 100). 1H NMR
(250 MHz, DMSO-d6): 10.5 (s, 1H, NH), 8.57 (s, 1H), 8.25
(d, J = 7.6 Hz, 1H), 8.20 (d, J = 8.7 Hz, 1H), 8.10 (d, J = 7.6
Hz, 1H), 7.84 (d, J = 8.6 Hz, 1H), 7.68-7.79 (m, 2H), 3.56-
3.72 (m, 1H), 2.67 (dd, J = 6.8 Hz, 16.1 Hz, 1H), 2.24 (dd,
J = 4.4 Hz, 16.1 Hz, 1H), 1.85 (d, J = 13.1 Hz, 1H), 1.32 (dd,
J = 7.4 Hz, 14.6 Hz, 1H), 0.72 (s, 9H).
4-(2,2-Dimethyl-propyl)-oxetan-2-one (2a): A solution of
BF3 OEt2 (1 mL, 0.5 M, 0.5 mmol) in CH2Cl2 was slowly
added at -15 °C to a solution of 3,3-dimethyl-butyraldehyde
(3.9 g, 39 mmol) in CH2Cl2 (50 mL) and then trimethylsilyl
ketene (6 mL, 43 mmol) was added at -15 °C over 30 min. The
reaction was stirred for 3 h at -15 °C, two drops of H2O were
added and stirring was continued for 1 h at r.t. After
evaporation of the solvent, MeCN (30 mL) and potassium
fluoride dihydrate (3 g, 19 mmol) were added. The mixture
was stirred overnight, filtered off, evaporated and the residue
was chromatographed on SiO2 eluting with hexane/CH2Cl2/
Et2O (6:2:1) affording 2a: 4.4 g (80%). 1H NMR (250 MHz,
DMSO-d6): 4.66-4.71 (m, 1H), 3.56-3.72 (m, 1H), 3.64 (dd,
J = 5.7 Hz, 16.3 Hz, 1H), 3.19 (dd, J = 4.3 Hz, 16.2 Hz, 1H),
1.75 (dd, J = 7.1 Hz, 14.3 Hz, 1H), 1.66 (dd, J = 5.8 Hz, 14.3
Hz, 1H), 0.93 (s, 9H).
5,5-Dimethyl-3-(naphthalene-2-sulfanyl)-hexanoic acid
(3a): Naphthalene-2-thiol (352 mg, 2.2 mmol) was added to
CsF (334 mg, 2.2 mmol) in DMF (4 mL), and the suspension
was stirred for 10 min at r.t. Then, 2a (203 mg, 1.1 mmol) was
added and the suspension was stirred for 1 h at 30 °C. After
filtration of the CsF, the solvent was evaporated, the residue
was dissolved in CH2Cl2/MeOH (95:5) and filtered through
silica gel. 189 mg (57%) of 3a: ESIMS m/z 301.1 ([M-], 100).
1H NMR (250 MHz, DMSO-d6): 7.88-7.95 (m, 4H), 7.50-
7.53 (m, 3H), 3.59-3.63 (m, 1H), 2.45-2.54 (m, 2H), 1.56-1.61
(m, 2H), 0.93 (s, 9H).
Synthesis of resin 4a: Hydroxylamine-Wang resin (500 mg,
0.5 mmol, 1% crosslinking, 38-75 , 1 mmol/g, from Bachem,
Switzerland) was swollen once with DMA (5 mL). To a
solution of acid 3a (226 mg, 0.75 mmol) in DMA (0.75 mL),
a solution of HATU in DMA (1.5 mL, 0.5 N, 0.75 mmol) and
a solution of i-Pr2NEt in DMA (1.5 mL, 1.5 N, 2.25 mmol)
Article Identifier:
1437-2096,E;2001,0,04,0538,0540,ftx,en;G00101ST.pdf
Synlett 2001, No. 4, 538–540 ISSN 0936-5214 © Thieme Stuttgart · New York