Journal of the American Chemical Society p. 809 - 810 (1994)
Update date:2022-09-26
Topics: Derivatives Substrates Behavior Photooxidation Sulfenic acid
Clennan, Edward L.
Zhang, Houwen
NIGNXIA XINDACHANG TECHNOLOGY CO.,LTD
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Jiaxing Anrui Material Technology Co., Ltd.
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Doi:10.1021/jm0109816
(2002)Doi:10.1039/c4ra13390k
(2015)Doi:10.1016/S0960-894X(00)00342-5
(2000)Doi:10.1016/j.bmcl.2006.05.098
(2006)Doi:10.1016/S0040-4039(00)90031-5
(1965)Doi:10.1016/j.ejmech.2020.112772
(2020)
