Journal of the American Chemical Society p. 809 - 810 (1994)
Update date:2022-09-26
Topics: Derivatives Substrates Behavior Photooxidation Sulfenic acid
Clennan, Edward L.
Zhang, Houwen
Taizhou volsen chemical Co., Ltd
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Address:Jiaojiang District, Taizhou, Zhejiang, China.
JiYi Chemical (Beijing) Co., Ltd.
Contact:+86-10-89385733
Address:Shilou Town of Fangshan District， Beijing
Chemieliva Pharmaceutical Co., Ltd.
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Contact:+86-23-67770219
Address:99 Longhua Road, Yubei District, 401147, Chongqing, China Email: sales@chemieliva.com Tel:0086-23-67770219 Fax: 0086-23-67770220 Attn: Andy Huang
WUXI HONOR SHINE CHEMICAL CO.,LTD
Contact:+86-510-83593312
Address:No.1699 Huishan avenue,Huishan district,Wuxi ,Jiangsu,China,214177.(Wuxi Huishan Ecomonic Develop Zone )
Xi'an yuanfar international trade company
website:https://www.yuanfarchemical.com
Contact:86-029-88745613 ext 828
Address:Floor19th ,B Building, Oak Block,No.36 South Fenghui Road, Dev. Zone of High-Tech Ind.,Xi’an, China
Doi:10.1021/jm0109816
(2002)Doi:10.1039/c4ra13390k
(2015)Doi:10.1016/S0960-894X(00)00342-5
(2000)Doi:10.1016/j.bmcl.2006.05.098
(2006)Doi:10.1016/S0040-4039(00)90031-5
(1965)Doi:10.1016/j.ejmech.2020.112772
(2020)
