Journal of the American Chemical Society p. 809 - 810 (1994)
Update date:2022-09-26
Topics: Derivatives Substrates Behavior Photooxidation Sulfenic acid Sulfenamides
Clennan, Edward L.
Zhang, Houwen
Beijing Wisdom Chemicals Co., Ltd.
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Tianjin Tensing Fine Chemical Research Develop Centre
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Shanghai ZaiQi Bio-Tech Co., Ltd.,
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