Journal of the American Chemical Society p. 809 - 810 (1994)
Update date:2022-09-26
Topics: Derivatives Substrates Behavior Photooxidation Sulfenic acid
Clennan, Edward L.
Zhang, Houwen
Winchem Industrial Co. Ltd.(expird)
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WEIFANG DERUN CHEMICAL CO.,LTD
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Chengdu ZY Biochemical Technology Co., LTD
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Qingdao S. H. Huanyu Imp. & Exp. Co., Ltd.
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Doi:10.1021/jm0109816
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(2006)Doi:10.1016/S0040-4039(00)90031-5
(1965)Doi:10.1016/j.ejmech.2020.112772
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