Spectroscopic and electrical characterization of…
OFET device fabrication
On a pre-cleaned SiO2/Si substrate, a THF solution of 1•–C6H6 (2.4 wt%) was spin-
coated (500 rpm, 10 s to 800 rpm, 30 s, flm thickness: ~ 100 nm) [29–32]. After
drying under vacuum, Al electrodes were vacuum-deposited on the coated sub-
strate (Channel length: 100 μm). The conduction band of the thin-flm of 1• was
low enough to inject a carrier from Al. OFET characteristics were measured under a
nitrogen atmosphere.
Acknowledgements The authors acknowledge valuable discussions with Mr. Yu Suenaga at OPU.
This study was partially supported by JSPS KAKENHI grant numbers JP24109009 (Innovative Area
Stimuli-responsive Chemical Species), JP17H01265, JP23350023, JP23108718 (pi-Space), JP21108520,
JP21655016, and JP19350025. YM also acknowledges the Program to Disseminate Tenure Tracking Sys-
tem, MEXT, Japan.
References
1. J. Fossey, D. Lefort, J. Sorba, Free Radicals in Organic Chemistry (Wiley, New York, 1995)
2. B. Halliwell, J.M.C. Gutteridge, Free Radicals in Biology and Medicine (Oxford Univ. Press,
Oxford, 2015)
3. G. Moad, D.H. Solomon, The Chemistry of Radical Polymerization, 2nd edn. (Elsevier, Amsterdam,
2006)
4. R.G. Hicks (ed.), Stable Radicals: Fundamentals and Applied Aspects of Odd‑Electron Compounds
(Wiley, Weinhelm, 2010)
5. A. Rajca, Chem. Rev. 94, 871 (1994)
6. M. Abe, Chem. Rev. 113, 7011 (2013)
7. C.F. Koelsch, J. Am. Chem. Soc. 54, 3384 (1932)
8. C.F. Koelsch, J. Am. Chem. Soc. 54, 4744 (1932)
9. C.F. Koelsch, J. Am. Chem. Soc. 79, 4439 (1957)
10. Y. Hattori, T. Kusamoto, H. Nishihara, Angew. Chem. Int. Ed. 53, 11845 (2014)
11. H. Namai, H. Ikeda, Y. Hoshi, N. Kato, Y. Morishita, K. Mizuno, J. Am. Chem. Soc. 129, 9032
(2007)
12. H. Ikeda, J. Photopolym. Sci. Technol. 21, 327 (2008)
13. H. Namai, H. Ikeda, Y. Hoshi, K. Mizuno, Angew. Chem. Int. Ed. 46, 7396 (2007)
14. T. Suga, H. Ohshiro, S. Sugita, K. Oyaizu, H. Nishide, Adv. Mater. 21, 1627 (2009)
15. Y. Morita, S. Nishida, T. Murata, M. Moriguchi, A. Ueda, M. Satoh, K. Arifuku, K. Sato, T. Takui,
Nat. Mater. 10, 947 (2011)
16. H. Maruyama, H. Nakano, M. Nakamoto, A. Sekiguchi, Angew. Chem. Int. Ed. 53, 1324 (2014)
17. K. Uchida, Z. Mou, M. Kertesz, T. Kubo, J. Am. Chem. Soc. 138, 4665 (2016)
18. S. Müllegger, M. Rashidi, M. Fattinger, R. Koch, J. Phys. Chem. C 116, 22587 (2012)
19. D.D. Eley, K.W. Jones, J.G.F. Littler, M.R. Willis, Trans. Faraday Soc. 63, 902 (1967)
20. S.L. Solar, J. Org. Chem. 28, 2911 (1963)
21. M.J. Frisch, G.W. Trucks, H.B. Schlegel, G.E. Scuseria, M.A. Robb, J.R. Cheeseman, G. Scalm-
ani, V. Barone, G.A. Petersson, H. Nakatsuji, X. Li, M. Caricato, A. Marenich, J. Bloino, B.G.
Janesko, R. Gomperts, B. Mennucci, H.P. Hratchian, J.V. Ortiz, A.F. Izmaylov, J.L. Sonnenberg,
D. Williams-Young, F. Ding, F. Lipparini, F. Egidi, J. Goings, B. Peng, A. Petrone, T. Henderson,
D. Ranasinghe, V.G. Zakrzewski, J. Gao, N. Rega, G. Zheng, W. Liang, M. Hada, M. Ehara, K.
Toyota, R. Fukuda, J. Hasegawa, M. Ishida, T. Nakajima, Y. Honda, O. Kitao, H. Nakai, T. Vreven,
K. Throssell, J. A. Montgomery, Jr., J.E. Peralta, F. Ogliaro, M. Bearpark, J.J. Heyd, E. Brothers,
K.N. Kudin, V.N. Staroverov, T. Keith, R. Kobayashi, J. Normand, K. Raghavachari, A. Rendell,
J.C. Burant, S.S. Iyengar, J. Tomasi, M. Cossi, J.M. Millam, M. Klene, C. Adamo, R. Cammi, J.W.
Ochterski, R.L. Martin, K. Morokuma, O. Farkas, J.B. Foresman, and D.J. Fox, Gaussian 09, Revi-
sion A.02 (Gaussian, Inc., Wallingford CT) (2016)
1 3