
Journal of Organic Chemistry p. 4102 - 4109 (1990)
Update date:2022-08-05
Topics:
Graham, John C.
Feng, Chuang-Hwa
Orticochea, Margarita
Ahmed, Gulam
The electrophilic chlorination of toluene has been studied using bis(4-chlorophenyl)selenide/Lewis acids as catalysts.These catalysts generate ortho/para ratios which are considerably lower than those obtained using Lewis acids as catalysts with the ortho/para ratio decreasing as the reaction temperature increases in the range of -30 to 70 deg C.The enhanced para selectivity observed using these catalysts has been ascribed to the intermediacy of a bis(4-chlorophenyl)selenium dichloride/Lewis acid complex which functions as a sterically hindered source of chlorine.Proton NMR studies in acetone-d6 support the existance of bis(4-chlorophenyl)selenium dichloride/Lewis acid complexes which lose chlorine directly from the selenium atom.The loss of para selectivity as the reaction temperature decreases has been ascribed to an increase in the conversion of bis(4-chlorophenyl)selenide to bis(4-chlorophenyl)(4-methylphenyl)selenonium chloride, which does not function as a catalyst in this reaction.Although triarylselenonium chlorides are known to reductively eliminate to produce aryl chlorides, our studies have shown that only where the Lewis acid is aluminium(III)chloride does this occur.Subsequently, with the exception of aluminium(III)chloride, reductive elimination of bis(4-chlorophenyl)(4-methylphenyl)-selenonium chloride is not responsible for the high para selectivity observed under our conditions.
View MoreHangzhou Pharma & Chem Co.,Ltd.
Contact:+86-571-87040515
Address:No,139Qingchun Rd
Hongyi Import & Export CO.,LTD
Contact:86-13319649499
Address:Nanzheng Neighborhood Commitees, Chongwen Office, Yongding District
Tianjin Emulsion Science&Technology Development Co.,Ltd
Contact:13901380442
Address:Vake Garden New Town New Yi Bai Road Beichen District Tianjin,China
Changzhou Anyi Biochem Co., Ltd.(expird)
Contact:+86-519-88836158
Address:no,51 caoda
Shanghai Bosman Industrial Co., Ltd
Contact:86-21-63065878-8006
Address:Rm907, No.1611, North Sichuan Road, Hongkou District, Shanghai, 200080 China
Doi:10.1021/jacs.5b08635
(2015)Doi:10.1016/S0040-4039(00)88661-X
(1982)Doi:10.1002/anie.201800375
(2018)Doi:10.1002/zaac.200400196
(2004)Doi:10.1016/j.jorganchem.2004.09.054
(2005)Doi:10.1021/ol047453j
(2005)