ORGANIC
LETTERS
2007
Vol. 9, No. 15
2831-2833
Application of the Excited State Meta
Effect in Photolabile Protecting Group
Design
Pengfei Wang,* Huayou Hu, and Yun Wang
Department of Chemistry, UniVersity of Alabama at Birmingham,
Birmingham, Alabama 35294
Received May 9, 2007
ABSTRACT
A novel photolabile protecting group for carbonyl compounds has been developed, based on the excited state meta effect.
Controllable removal of a photolabile protecting group (PPG)
by photochemical means typically requires no chemical
reagents and can provide high spatial and temporal resolution.
These features are appealing to the researchers in the fields
of organic synthesis, solid-phase synthesis, combinatorial
chemistry, photolithography, and biochemical and biophysi-
cal research.1 Despite advances in developing PPGs for
various applications, practically useful PPGs for some
important functional groups (e.g., carbonyl group) are still
rare.2
we found that the application of the excited-state meta effect
could be further expanded.
In our design (Scheme 1), carbonyl compound 1 could be
protected by 3,5-dimethoxylsalicylic alcohol (2) in a cyclic
acetal/ketal form 3. The π-π* excitation of 3 would increase
the electron density at C-1 in S1 owing to the presence of
two m-methoxyl groups. This charge accumulation at C-1
should facilitate the benzylic C-O breakage, leading to the
release of 1, presumably via the zwitterionic intermediate 4.
Recently, we developed a robust PPG, 2-[hydroxy-
(diphenyl)methyl]-4-methoxyphenol, for the protection of
carbonyl groups.3 Herein we report our progress in the
development of another novel type of PPG based on the
excited state meta effect.4,5 The meta effect driven PPGs are
available for protecting carboxyl groups, amino groups (in
the carbamate form), or phosphate esters.1,4,6 To our delight,
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Mestres, R. J. Chem. Res. Synop. 1995, 12, 452. (g) Ceita, L.; Maiti, A.
K.; Mestres, R.; Tortajada, A. J. Chem. Res. Synop. 2001, 10, 403. (h)
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W.; Lawrence, D. S. J. Org. Chem. 2002, 67, 2723. (j) Lu, M.; Fedoryak,
O. D.; Moister, B. R.; Dore, T. M. Org. Lett. 2003, 5, 2119. (k) Blanc, A.;
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Guillier, F.; Orain, D.; Bradley, M. Chem. ReV. 2000, 100, 2091. (g) Bochet,
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(3) Wang, P.; Hu, H.; Wang, Y. Org. Lett. 2007, 9, 1533.
(4) Chamberlin, J. W. J. Org. Chem. 1966, 31, 1658.
(5) (a) Zimmerman, H. E.; Sandel, V. R. J. Am. Chem. Soc. 1963, 85,
915. (b) Zimmerman, H. E.; Somasekhara, S. J. Am. Chem. Soc. 1963, 85,
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Zimmerman, H. E. J. Phys. Chem. A 1998, 102, 5616.
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10.1021/ol071085c CCC: $37.00
© 2007 American Chemical Society
Published on Web 06/20/2007