Phosphorus, Sulfur and Silicon and the Related Elements p. 2423 - 2429 (2005)
Update date:2022-08-16
Topics:
Lakouraj, Moslem M.
Tajbakhsh, Mahmood
Shirini, Farhad
Asady Tamami, Mohammad V.
HIO3 in the presence of wet SiO2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free conditions. Copyright Taylor & Francis Inc.
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