Article
Singh et al.
precursors to circumvent disulfide formation while allowing for
facile deprotection and monolayer formation. The approach has
proved particularly effective for self-assembly of dithiols, where
disulfide formation would lead to multilayer formation and,
worse, polymerization. Favoring the application of the thio-
acetates are their convenient preparation from alkyl halides, their
effective prevention of oxidative formation of disulfides upon
storage, and the ready ability to cleave the thioester to release
the thiol.
Deprotection of Thioacetates. Since thioacetates have seen
the greatest scope of applications, we have focused our efforts on
the use of thioacetate protection and cleavage to address our
desire for a simple, reliable method that can be used to produce
well-ordered SAMs under ambient conditions with routine bench-
top procedures that do not require heroically pure materials.
Herein, we highlight pertinent literature examples of in situ
deprotection of thioacetates for self-assembly of thiolate mono-
layers, provide new NMR spectroscopy data for the extent of
cleavage of decanethioacetate by various reagents in deuterated
methanol or tetrahydrofuran, and show by STM imaging that
conditions leading to faster, more complete thioacetate deprotec-
tion yield larger fractions of crystalline, molecularly ordered
domains in the resultant decanethiolate monolayers formed by
in situ deprotection of decanethioacetate.
absence of the carbonyl stretch from the thioacetate implied that
deprotection of the molecules incorporated into the SAM was
complete. Several other studies on SAM formation cited this initial
work as support for in situ cleavage of other arylthioacetates and
alkanethioacetates in various solvents through the addition of a
wider range of exogenous bases. These conditions include the use of
NH OH in EtOH, THF, or acetone-MeOH; Cs CO in acetone/
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MeOH or conc. H SO in CH Cl /MeOH; triethylamine or
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NH OH in DMF; NH OH or conc. H SO in EtOH; NaOH
in EtOH; or EtOH/H O. Concentrations of the thioacetate
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compound ranged 0.1-1 mM and concentration of the cleaving
agent 0.1 mM to 0.2 M. The cleaving agent to thioacetate mole
ratio ranged from nearly unity to over a thousandfold excess.
Direct Use of Thioacetates. It has also been speculated that
no cleavage agent is required to form the thiolate SAM, because
it seemed that direct deprotection of the thiol could occur at the
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gold surface
SPR, XPS, and TOF-SIMs measurements
for thioacetates of alkyl chains and oligo(phenylene ethylnylene)-
based R,ω-dithioacetates in EtOH, THF, or 1:1 dichloromethane/
EtOH showed that full monolayers can be formed directly from
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thioacetates. Utilizing surface characterization by XPS and
IRRAS, Lee et al. found that SAMs formed from alkanethio-
acetate are more disordered and less densely packed than the
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similar alkanethiol-derived SAMs. In followup work, W o€ ll et al.
showed that an ethanolic solution of decanethioacetate carefully
purified to be free from thiol formed a molecularly ordered flat-
lying decanethiolate monolayer on gold by STM. Only small
regions of high-density upright-standing molecules were observed
at defect sites and at the boundaries between larger phases of flat-
An initial report on the in situ cleavage of organothioacetates
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for chemisorption onto gold used aqueous NH OH in THF. The
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characterization of the resulting self-assembled monolayers in this
and subsequent reports has relied chiefly on thickness determina-
tions by ellipsometry, X-ray photoelectron spectroscopic (XPS),
infrared reflection absorption spectroscopy (IRRAS), near-edge
X-ray absorption fine structure (NEXAFS), electrochemistry,
contact angle, and/or surface plasmon resonance (SPR) measure-
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lying molecules. Thus, if direct cleavageoccurs, it is not expected
to occur at a rate sufficient to allow formation of large regions
of dense upright phases. Additionally, XPS and IRRAS studies
show that the molecule-gold interface in thioacetate-derived
SAMs is predominantly thiolate; thioacetate, if present, is only
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ments. Although these techniques measure bulk properties,
such as average effective thickness and molecular tilt (IRRAS and
NEXAFS), molecular ordering is not measured but, in the case of
IRRAS, can be inferred from comparison to appropriate model
systems. An accurate assessment of the molecular order and
crystallinity of the SAM requires a direct imaging technique such
as STM or a surface diffraction technique such as grazing incident
X-ray diffraction (GIXRD) or low-energy atom diffraction
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present as a minority.
In summary, SAMs derived from
thioacetates, of ordinary purity with or without cleavage by
exogenous base, have been shown to produce thiolate SAMs with
monolayer coverage, but with a large degree of uncertainty
regarding long-range crystalline molecular ordering.
(
LEAD). One study used STM imaging to characterize SAMs
Results and Discussion
produced by an in situ deprotection of thioacetates, but molecular
resolution was not obtained. To our knowledge, no systematic
assessment of the molecular order of SAMs formed by cleavage of
thioacetates has been undertaken.
Tour et al. reported that, when acetyl-protected arylthiols
Given this diverse background for in situ cleavage under vari-
ous conditions, we initiated an STM study to compare the struc-
ture and order of SAMs grown from decanethioacetates with and
without the presence of a thioacetyl cleaving agent. As discussed
below, we did observe striking differences in the quality of high-
density, upright-standing SAMs produced in the presence of vari-
ous cleaving agents. Although the exact percentages of mole-
cularly ordered SAM regions were not quantified, the SAMs
formed in the presence of different thioacetate cleaving agents
ranged from almost completely disordered regions to almost
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(
0.1 to 41 mM) were initially reacted with NH OH in THF before
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exposing to gold surfaces, the resulting layer thickness was closer
to that expected for a full monolayer of standing up molecules,
than when no exogenous base was added (ellipsometry and
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XPS). This result was attributed to a higher concentration of
organothiolate being present due to base-catalyzed hydrolysis.
Thiolate adsorption to the surface without exogenous base was
suggested to possibly occur through initial adsorption of the
thioacetates to the gold surface or by limited thioacetate hydro-
lysis by trace wateror enols of the thioesters. NMR measurements
were reported to indicate that hydrolysis of the thioacetate in
(
17) Shaporenko, A.; Elbing, M.; Blaszczyk, A.; von Hanisch, C.; Mayor, M.;
Zharnikov, M. J. Phys. Chem. B 2006, 110, 4307.
18) Cheng, L.; Yang, J.; Yao, Y.; Price, D. W.; Dirk, S. M.; Tour, J. M.
Langmuir 2004, 20, 1335.
19) Cai, L. T.; Skulason, H.; Kushmerick, J. G.; Pollack, S. K.; Naciri, J.;
(
(
Shashidhar, R.; Allara, D. L.; Mallouk, T. E.; Mayer, T. S. J. Phys. Chem. B 2004,
108, 2827.
THF-d was complete within 10 min upon exposure to aqueous
8
NH OH and that other bases such as N,N-dipropylamine or 4-N,
N-dimethylaminopyridine (DMAP) were less effective. In that
same study, infrared measurements of one of the phenylene
ethynylene molecules showed that these rigid-rod molecules were
standing up, oriented within 20ꢀ of the surface normal, and had
infrared intensities consistent with a full monolayer. Furthermore,
(20) Nakashima, H.; Furukawa, K.; Ajito, K.; Kashimura, Y.; Torimitsu, K.
Langmuir 2005, 21, 511.
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(
21) B ꢀe thencourt, M. I.; Srisombat, L.-o.; Chinwangso, P.; Lee, T. R. Langmuir
2009, 25, 1265.
22) Kang, Y.; Won, D.-J.; Kim, S. R.; Seo, K.; Choi, H.-S.; Lee, G.; Noh, Z.;
Lee, T. S.; Lee, C. Mater. Sci. Eng. C 2004, 24, 43.
23) Badin, M. G.; Bashir, A.; Krakert, S.; Strunskus, T.; Terfort, A.; W o€ ll, C.
Angew. Chem., Int. Ed. 2007, 46, 3762.
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3222 DOI: 10.1021/la100103k
Langmuir 2010, 26(16), 13221–13226