Ligand Radical Localization in Nickel Complexes
COMMUNICATION
(Evanꢃs Method) meff =1.6 BM. Elemental analysis (%) calcd for
C36H54N2O2NiSbF6: C 51.40, H 6.47, N 3.33; found: C 51.56, H 6.18, N
3.28.
[11] O. Rotthaus, O. Jarjayes, C. P. Del Valle, C. Philouze, F. Thomas,
[13] See the Supporting Information for details.
6972; b) A. Berkessel, M. Brandenburg, E. Leitterstorf, J. Frey, J.
[15] F. Thomas, G. Gellon, I. Gautier-Luneau, E. Saint-Aman, J. L.
ꢀ
X-ray details for 4 and 4+ SbF6 are available in the Supporting Informa-
tion. CCDC-770780 and CCDC-770781 contain the supplementary crys-
tallographic data for this paper. These data can be obtained free of
charge from The Cambridge Crystallographic Data Centre via
computations, electrochemistry, UV/Vis data, X-ray absorption spectros-
copy, and Raman analysis are available as Supporting Information.
[17] a) L. Benisvy, A. J. Blake, D. Collison, E. S. Davies, C. D. Garner,
E. J. L. McInnes, J. McMaster, G. Whittaker, C. Wilson, Chem.
Acknowledgements
[18] L. Benisvy, A. J. Blake, D. Collison, E. S. Davies, C. D. Garner,
E. J. L. McInnes, J. McMaster, G. Whittaker, C. Wilson, Dalton
This work was supported by NIH grant GM-50730 (T.D.P.S.), the CSUC
College of Natural Science (E.C.W.), an NSERC post-doctoral scholar-
ship (T.S.), and a Grant-in-Aid for Scientific Research No. 17750055
(Y.S.). Dr. Allen Oliver is thanked for X-ray analysis. SSRL operations
are funded by the DOE, Office of Basic Energy Services. Prof. Fumito
Tani, Kushu University is acknowledged for Raman analysis. Mithi Adhi-
kari is thanked for the solution magnetic measurement of 4+.
[19] Gaussian 03, Revision C.02, M. J. Frisch, G. W. Trucks, H. B. Schle-
gel, G. E. Scuseria, M. A. Robb, J. R. Cheeseman, J. A. Montgom-
ery, Jr., T. Vreven, K. N. Kudin, J. C. Burant, J. M. Millam, S. S.
Iyengar, J. Tomasi, V. Barone, B. Mennucci, M. Cossi, G. Scalmani,
N. Rega, G. A. Petersson, H. Nakatsuji, M. Hada, M. Ehara, K.
Toyota, R. Fukuda, J. Hasegawa, M. Ishida, T. Nakajima, Y. Honda,
O. Kitao, H. Nakai, M. Klene, X. Li, J. E. Knox, H. P. Hratchian,
J. B. Cross, V. Bakken, C. Adamo, J. Jaramillo, R. Gomperts, R. E.
Stratmann, O. Yazyev, A. J. Austin, R. Cammi, C. Pomelli, J. W.
Ochterski, P. Y. Ayala, K. Morokuma, G. A. Voth, P. Salvador, J. J.
Dannenberg, V. G. Zakrzewski, S. Dapprich, A. D. Daniels, M. C.
Strain, O. Farkas, D. K. Malick, A. D. Rabuck, K. Raghavachari,
J. B. Foresman, J. V. Ortiz, Q. Cui, A. G. Baboul, S. Clifford, J. Cio-
slowski, B. B. Stefanov, G. Liu, A. Liashenko, P. Piskorz, I. Komaro-
mi, R. L. Martin, D. J. Fox, T. Keith, M. A. Al-Laham, C. Y. Peng,
A. Nanayakkara, M. Challacombe, P. M. W. Gill, B. Johnson, W.
Chen, M. W. Wong, C. Gonzalez, J. A. Pople, Gaussian, Inc., Wall-
ingford CT, 2004.
Keywords: intervalence complexes
ligands · nickel · oxidation locus
· localization · N,O
[1] a) P. Chaudhuri, K. Wieghardt, Prog. Inorg. Chem. 2001, 50, 151;
[20] V. W. Manner, T. F. Markle, J. H. Freudenthal, J. P. Roth, J. M.
[4] a) M. W. Bouwkamp, A. C. Bowman, E. Lobkovsky, P. J. Chirik, J.
Schonberg, J. Harmer, A. Sreekanth, H. Grutzmacher, Angew.
d) A. I. Nguyen, K. J. Blackmore, S. M. Carter, R. A. Zarkesh, A. F.
T. P. J. Peters, S. Thewissen, A. N. J. Blok, J. M. M. Smits, R. de
Harmer, D. Stein, H. Ruegger, B. de Bruin, H. Grutzmacher,
Angew. Chem. 2010, 122, 395; Angew. Chem. Int. Ed. 2010, 49, 385.
[6] T. Storr, P. Verma, R. C. Pratt, E. C. Wasinger, Y. Shimazaki, T. D. P.
[21] The slight difference in Ni spin density for 1+ (10%) in comparison
to our previous report (14%; see reference [10]) is due to the use of
the 6-311g* basis set (Ni, O, N) in this investigation in comparison
to the use of the TZVP basis set of R. Ahlrichs (A. Schafer, H.
Horn, R. Ahlrichs, J. Chem. Phys. 1992, 97, 2571) in the previous
report.
[22] K. Fujita, R. Schenker, W. W. Gu, T. C. Brunold, S. P. Cramer, C. G.
[23] a) M. B. Robin, P. Day, Adv. Inorg. Chem. Radiochem. 1967, 9, 247;
b) D. M. D’Alessandro, F. R. Keene, Chem. Soc. Rev. 2006, 35, 424.
[24] R. Schnepf, A. Sokolowski, J. Mꢄller, V. Bachler, K. Wieghardt, P.
[25] a) J. Radziszewski, M. Gil, A. Gorski, J. Spanget-Larsen, J. Waluk,
Gil, A. Gorski, D. M. Blake, J. Waluk, J. G. Radziszewski, J. Am.
[27] Y. Shimazaki, S. Huth, S. Karasawa, S. Hirota, Y. Naruta, O. Yamau-
[7] O. Rotthaus, O. Jarjayes, F. Thomas, C. Philouze, C. P. Del Valle, E.
[8] O. Rotthaus, F. Thomas, O. Jarjayes, C. Philouze, E. Saint-Aman,
[9] Y. Shimazaki, F. Tani, K. Fukui, Y. Naruta, O. Yamauchi, J. Am.
[28] Selected Raman peaks [cmꢀ1
] (lex =413 nm) 4: n˜ =1350, 1530,
+
1619 cmꢀ1 (n8a); 4 : 918, 1350, 1370, 1501 (PhO n7a), 1530, 1581
C
ꢀ1
(PhO n8a), 1615 cm (n8a); 1: 1351, 1533, 1627 cmꢀ1 (n8a); 1+: 1370,
C
ꢀ1
C
C
1504 (PhO n7a), 1605 cm (PhO n8a).
[10] T. Storr, E. C. Wasinger, R. C. Pratt, T. D. P. Stack, Angew. Chem.
Received: April 7, 2010
Published online: July 19, 2010
Chem. Eur. J. 2010, 16, 8980 – 8983
ꢀ 2010 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
8983