Full text of DOI:10.1063/1.105950

Highly stable silicon dioxide films deposited by means of rapid thermal low
pressure chemical vapor deposition onto InP
A. Katz, A. Feingold, U. K. Chakrabarti, S. J. Pearton, and K. S. Jones
Citation: Applied Physics Letters 59, 2552 (1991); doi: 10.1063/1.105950
View online: http://dx.doi.org/10.1063/1.105950
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/59/20?ver=pdfcov
Published by the AIP Publishing
Articles you may be interested in
Rapid thermal low-pressure metal organic chemical vapor deposition of Fe-doped InP layers
Appl. Phys. Lett. 80, 422 (2002); 10.1063/1.1436278
Tungsten metallization onto InP prepared by rapid thermal lowpressure chemical vapor deposition of
WF6 and H2
Appl. Phys. Lett. 61, 1522 (1992); 10.1063/1.107535
The influence of ammonia on rapidthermal lowpressure metalorganic chemical vapor deposited TiN x
films from tetrakis (dimethylamido) titanium precursor onto InP
J. Appl. Phys. 71, 993 (1992); 10.1063/1.351271
Rapid thermal lowpressure chemical vapor deposition of SiO x films onto InP
Appl. Phys. Lett. 59, 579 (1991); 10.1063/1.105392
High concentration Zn doping in InP grown by lowpressure metalorganic chemical vapor deposition
J. Appl. Phys. 68, 859 (1990); 10.1063/1.346769
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.209.144.159 On: Tue, 09 Dec 2014 18:30:43

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.209.144.159 On: Tue, 09 Dec 2014 18:30:43

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.209.144.159 On: Tue, 09 Dec 2014 18:30:43

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.209.144.159 On: Tue, 09 Dec 2014 18:30:43