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Journal of Materials Chemistry A
Page 9 of 11
DOI: 10.1039/C5TA03988F
Journal Name
ARTICLE
27. C. Koenigsmann, A. C. Santulli, K. Gong, M. B. Vukmirovic,
W.-p. Zhou, E. Sutter, S. S. Wong and R. R. Adzic, J. Am.
Chem. Soc., 2011, 133, 9783-9795.
28. C. Koenigsmann, W.-p. Zhou, R. R. Adzic, E. Sutter and S. S.
Wong, Nano Lett., 2010, 10, 2806-2811.
29. E. Koposova, A. Kisner, G. Shumilova, Y. Ermolenko, A.
Acknowledgements
We thank Prof. Praveen C. Ramamurthy for impedance
measurements facility. The Tecnai T20 is a part of Advanced
facility for Microscopy and Microanalysis at IISc. The XPS and
solar simulator are part of MNCF, CeNSE, IISc. NR
acknowledges financial support from the TUE and
Swarnajayanti Fellowship from DST.
Offenhäusser and Y. Mourzina, J. Phys. Chem. C, 2013, 117
13944-13951.
,
30. A. Leelavathi, G. Madras and N. Ravishankar, J. Am. Chem.
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33. A. Halder, P. Kundu, B. Viswanath and N. Ravishankar, J.
Mater. Chem., 2010, 20, 4763-4772.
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