Full text of DOI:10.1063/1.105016

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum
2ethylhexanoate
Toshiro Maruyama and Tsuyoshi Nakai
Citation: Applied Physics Letters 58, 2079 (1991); doi: 10.1063/1.105016
View online: http://dx.doi.org/10.1063/1.105016
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/58/19?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
131.230.73.202 On: Tue, 23 Dec 2014 20:50:21

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
131.230.73.202 On: Tue, 23 Dec 2014 20:50:21