Thermal SiSi/SiSi redistribution of hexaorganodisilane. A new thermally 'forbidden' molecular reaction

DOI: 10.1016/S0022-328X(00)85108-6

Source and publish data:

Journal of Organometallic Chemistry p. C15-C17 (1972)

Update date:2022-08-16

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Authors:

Sakurai, Hideki

Hosomi, Akira

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Article abstract of DOI:10.1016/S0022-328X(00)85108-6

Full text of DOI:10.1016/S0022-328X(00)85108-6

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