Photolithography of self-assembled monolayers: Optimization of protecting groups by an electroanalytical method

DOI: 10.1139/v96-281

Source and publish data:

Canadian Journal of Chemistry p. 2509 - 2517 (1996)

Update date:2022-08-30

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Authors:

Jennane, Jamila

Boutros, Tanya

Giasson, Richard

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Article abstract of DOI:10.1139/v96-281

Patterned surfaces presenting a high density of chemically reactive functional groups can be prepared through photolithography of self-assembled monolayers (SAM). In this paper, we report the synthesis and the evaluation of three reagents that can be used

Full text of DOI:10.1139/v96-281

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