Journal of Fluorine Chemistry p. 331 - 348 (1989)
Update date:2022-08-17
Topics:
Paleta, O.
Danda, A.
Stepan, L.
Kvicala, J.
Dedek, V.
Several chlorofluoroalkanols RF-CH2OH (RF is CF3-CFCl, CF2Cl-CF2, CF2Cl-CFCl and CF2Cl) and their methacrylates or acrylates were synthesized.The corresponding polymeric methacrylates have properties of highly-sensitive electron-beam and X-ray resists for microlithography.The main step in the syntheses, which start from halogenoalkanes RF-CCl3, is the chemo-selective reduction of halogenoesters with sodium borohydride, in which the C-Cl bonds in the acyl parts of the esters are not attacked.Relative rates of the reductions of esters RF-COOCH3 are influenced by the structure of halogenoalkyls RF in the order CF2Cl: CF3-CFCl: CF2Cl-CFCl = 4.5:3.5:1.A remarkable reactivity decrease in the reduction rate in the structure possessing a Cl atom at the β-position in the acyl group is discussed.
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