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such as deposition temperature and choice of the specific
ionic liquid. The electrodeposition of aluminium was the
subject of detailed studies in the past [6–8]. The air–mois-
ture stability of newly developed ionic liquids render this
technique interesting even for industrial applications
(coatings).
level obtained from the high energy cutoff observed for
metallic samples in UPS.
The fitting of XPS spectra was performed using Origin-
Pro7 (OriginLab Corporation) including the PFM add-on.
The full width at half maximum (FWHM) and the position
for the metallic Al2p peak were obtained in previous mea-
surements (not shown here) and used as fitting parameters
in order to get more reliable results.
2. Experimental
Several different mechanisms for the interaction of meta-
stable He* atoms with surfaces are known. For the nano-
crystalline aluminium samples studied here, only the
Auger deexcitation (AD) occurs. During AD, an electron
from the sample surface fills the 1s orbital of the impinging
He*. Simultaneously, the He* 2s carrying the excess energy
is emitted. Detailed descriptions of the different interaction
processes between He* and surfaces may be found in recent
reviews [9,10].
A commercial X-ray source is used for XPS. The pho-
tons hit the surface under an angle of 80ꢁ with respect to
the surface normal. Electrons emitted from the surface
are analyzed under 10ꢁ to the surface normal using a hemi-
spherical analyzer. Survey spectra are recorded with an en-
ergy resolution of 2.2 eV, detail spectra with 1.1 eV,
respectively.
The ionic liquid [BMP]Tf2N of the highest available
quality was purchased. It was subsequently dried at
100 ꢁC under vacuum conditions to water-content below
3 ppm and stored in an argon filled glove box (water-
and oxygen-content below 2 ppm). Anhydrous AlCl3
(Fluka, 99%) was used as a source of aluminium. A concen-
tration of 1.6 Mol per litre AlCl3 was used in this study.
The electrochemical cell with a geometric surface area of
0.79 cm2 was made of polytetraflouroethylene and clamped
over a teflon covered viton o-ring onto the hydrogen termi-
nated Si(100) substrate. The hydrogen termination was
achieved by immersion in HF and NH4F after extensive
cleaning procedures. The deposition was carried out inside
the glove box using a Parstat 2263 Potentiostat/Galvano-
stat (Princeton Applied Research) controlled by Power
CV and PowerStep software at a voltage of À1.4 V (vs.
Al/AlCl3 quasi reference electrode) for a duration of 2 h.
Upon deposition, the ionic liquid is removed by washing
the sample with acetonitrile inside the glove box.
3. Results
Fig. 1 shows an HRSEM micrograph of a nanocrystal-
line aluminium film deposited onto a Si(100) substrate in
the manner described above. Manually size evaluation of
about 100 particles gives a value of 16 3 nm for the mean
grain size. This size could also be corroborated with X-ray
diffraction measurements (not shown here) giving a similar
mean grain size. The particles constitute a film covering the
substrate completely. In the micrograph, residues of neither
the ionic liquid nor the solvent (acetonitrile) are visible.
Fig. 2 shows a XPS survey spectrum (0–1100 eV) of a
nanocrystalline aluminium film after sputtering. All peaks
are labelled with the corresponding element. Striking is
The surface morphology of the film was investigated
with a high resolution scanning electron microscope
(HRSEM) (Carl Zeiss DSM 982 Gemini). X-ray photo-
electron spectroscopy (XPS), metastable impact electron
spectroscopy (MIES) and ultraviolet photoelectron spec-
troscopy (UPS) were performed at the ‘‘Institut fur Physik
¨
und Physikalische Technologien’’. For that purpose, the
samples were transferred to a vacuum-tight transportation
chamber inside the glove box. The transportation chamber
could be docked to the load lock chamber of the spectros-
copy apparatus, so that the samples were not exposed to
the ambient atmosphere.
The spectroscopy apparatus with a base pressure of
2 · 10À11 mbar is equipped with a combined MIES-
UPS(HeI)-source, X-ray source (combined Al and Mg
cathode, Specs RQ-20/38C) and a hemispherical electron
energy analyser (VSW HA100). Details on this apparatus
can be found elsewhere [5].
A cold-cathode discharge adapted via two pumping
stages to the chamber is utilized to perform MIES and
UPS. An integrated time-of-flight technique is used to sep-
arate signals arising by electron emission from He* (MIES)
and HeI (UPS) interaction with the surface. Both MIES
and UPS spectra, are recorded under normal emission
within 140 s with an energy resolution of 220 meV. The
mixed H*–HeI beam exhibits an angle of incidence of
45ꢁ. All MIES and UPS spectra are displayed as a function
of the electron binding energy with respect to the Fermi
Fig. 1. HRSEM micrograph of a nanocrystalline aluminium film.