Full text of DOI:10.1063/1.104338

Lowtemperature chemical vapor deposition of epitaxial Si and SiGe layers
at atmospheric pressure
W. B. de Boer and D. J. Meyer
Citation: Appl. Phys. Lett. 58, 1286 (1991); doi: 10.1063/1.104338
View online: http://dx.doi.org/10.1063/1.104338
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Downloaded 05 Aug 2013 to 128.206.9.138. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 05 Aug 2013 to 128.206.9.138. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 05 Aug 2013 to 128.206.9.138. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 05 Aug 2013 to 128.206.9.138. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions