Full text of DOI:10.1063/1.105763

New insights on the effect of hydrogen to tungsten hexafluoride partial pressure
ratio on plasma deposited tungsten thin films
Yong Tae Kim, Jong Sung Hong, and SukKi Min
Citation: Applied Physics Letters 59, 3136 (1991); doi: 10.1063/1.105763
View online: http://dx.doi.org/10.1063/1.105763
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/59/24?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
29.120.242.61 On: Sat, 22 Nov 2014 20:13:07
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
29.120.242.61 On: Sat, 22 Nov 2014 20:13:07
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
29.120.242.61 On: Sat, 22 Nov 2014 20:13:07
1