Properties of tungsten point contacts formed with chemical vapour deposition

DOI: 10.1016/0921-4526(95)00569-2

Source and publish data:

Physica B: Condensed Matter p. 101 - 104 (1996)

Update date:2022-08-29

Topics:

Authors:

Gribov Gribov

Caro Caro

Oosterlaken

Radelaar

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Article abstract of DOI:10.1016/0921-4526(95)00569-2

We have used chemical vapour deposition to form tungsten point contacts. From electron microscopy we find that nanoholes in membranes are filled from the beginning of the deposition using the CVD process for α-W. Fabricated devices show good point-contact

Full text of DOI:10.1016/0921-4526(95)00569-2

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