
RSC Advances p. 35753 - 35758 (2018)
Update date:2022-08-16
Topics:
Ma, Baojun
Li, Dekang
Wang, Xiaoyan
Lin, Keying
Here, we reported a new method for fast and safe synthesis of a micron germanium (Ge) semiconductor. The Ge was successfully prepared from mixed GeO2 with a low amount of MoO3 by the NH3 reduction method at 800 °C for an ultra-short time of 10 min. XRD patterns show that the Ge has a tetragonal structure. SEM images show that the size of the Ge particles is from 5 μm to 10 μm, and so it is on the micron scale. UV-visible diffuse reflectance spectroscopy shows that the Ge has good light absorption both in the ultraviolet and visible regions. The formation of Ge mainly goes through a two-step conversion in the NH3 flow. Firstly, GeO2 is converted to Ge3N4, and then Ge3N4 is decomposed to generate Ge. The comparison experiments of MoO3 and Mo2N demonstrate that Mo2N is the catalyst for the Ge synthesis which improves the Ge3N4 decomposition. The presented fast and safe synthesis method of Ge has great potential for industrialization and the proposed Mo2N boosting the Ge3N4 decomposition has provided significant guidance for other nitride decomposition systems.
Nanjing Samwon International Limited
Contact:+86-25-84873444
Address:1108, BLDG B, New Century Plaza, No 1, South Taiping Rd.,
Zhengzhou Xinlian Chemical Tech Co. ,Ltd
Contact:0371-65771781 021-52042910
Address:H Part, Building I, No. 700 Gonglu Road, Pudong New Area, Shanghai
Wuxi Pharma-Trading Import & Export Co.,Ltd.
Contact:+86-510-82304590 82716390
Address:Room 523,Youzu Alliance Building,No.88 Renmin Zhonglu,Wuxi,Jiangsu,China
Chemsky(shanghai)International Co.,Ltd.
Contact:0
Address:0
ClickChem Technology Co., Limited
Contact:+86-0310-6519966/0531-52893837
Address:No.750 Shunhua Road, High-Tech Zone, Jinan city, Shandong China
Doi:10.1021/acs.orglett.6b00876
(2016)Doi:10.1016/S0040-4039(00)90327-7
(1966)Doi:10.1081/SCC-100103998
(2001)Doi:10.1021/cs5003959
(2014)Doi:10.1007/BF01435407
(1996)Doi:10.1007/BF00863601
(1992)