Microstructures and Band Gaps of Metal-Doped ZrO2
J. Phys. Chem. B, Vol. 108, No. 46, 2004 18103
respectively; these values are similar to those expected for Cr2O3
and FeO.35,36 On the other hand, the absorption edge at 355 nm
for the Ni-doped ZrO2 is close to the value of the atomic
absorption of Ni (352.4 nm). In contrast to the solid solution
forms, these results reveal that the band gaps of the dopants in
their oxides or metallic forms dominate the new band gaps of
the doped ZrO2 thin films at 950 °C.
Supporting Information Available: Descriptions of the
morphology and thickness of the sol-gel-derived ZrO2 thin film,
the relationship between d spacings and concentrations of the
dopants, the direct band gaps of ZrO2 thin films at different
temperatures, and the reducing behavior of the metal ions in
the as-dried ZrO2 thin film. This material is available free of
When the microstructures and the band gaps of the doped
ZrO2 thin films with respect to the conversions of the chemical
states of the dopants have been demonstrated, the mechanisms
of the conversions of the chemical states during thermal treat-
ment require further clarification. From the XPS results obtained
at different temperatures, the reducing behavior of dopants in
the ZrO2 thin film was observed. The reduction of the doped
ions is associated initially with the oxidation of 2-propanol to
acetone in the as-dried samples. Afterward, dehydroxylation and
deoxygenation processes drive the reduction of the metal ions
in the sol-gel-derived ZrO2 thin films during thermal treatment.
The further reduction of Fe3+ to Fe2+ and Fe0 from 550 to 950
°C indicates the fact that the reducing capacity to cations was
enhanced with increasing temperatures. In contrast to these
reductions, oxidations of the dopants also occurred at 950 °C,
in which the m-tetragonal phase was converted to the monoclinic
phase. This phenomenon is presumably due to this phase
transformation being triggered by an intake of oxygen from air.37
The systematic identification of the chemical states of the
dopants depicts that the redox properties of the dopants in the
ZrO2 matrix are highly dependent on their d-electronic con-
figurations. At 550 °C, the dopants that have half-filled (d5)
and closed-shell (d10) d-electron configurations, including Mn2+
and Fe3+, Cu+, and Zn2+, have specially high stability against
thermally induced reductions. On the other hand, metal ions
that lack these stable electronic structures, such as Cr3+(d3) and
Co2+(d7), are reduced to metallic elements upon calcination.
These results clearly indicate that the conversions of the
chemical states change the ionic sizes and electronic configura-
tions of the dopants, which control the microstructures and band
gaps of the doped ZrO2 at different calcination temperatures.
References and Notes
(1) Pieck, C. L.; Banares, M. A.; Fierro, J. L. G. J. Catal. 2004, 224,
1.
(2) Wang, S. B.; Murata, K.; Hayakawa, T.; Hamakawa, S.; Suzuki,
K. Energy Fuels 2001, 15, 384.
(3) Schattka, J. H.; Shchukin, D. G.; Jia, J. G.; Antonietti, M.; Caruso,
R. A. Chem. Mater. 2002, 14, 5103.
(4) Reddy, V. R.; Hwang, D. W.; Lee, J. S. Korean J. Chem. Eng.
2003, 20, 1026.
(5) Yan, L.; Qing, Y.; Wei, J. M.; Xu, B. Q. Chinese J. Catal. 2004,
25, 326.
(6) Navio, J. A.; Hidalgo, M. C.; Colon, G.; Botta, S. G.; Litter, M. I.
Langmuir 2001, 17, 202.
(7) Pieck, C. L.; del Val, S.; Granados, M. L.; Banares, M. A.; Fierro,
J. L. G. Langmuir 2002, 18, 2642.
(8) Anpo, M.; Nomura, T.; Kondo, J.; Domen, K.; Maruya, K. I.;
Onishi, T. Res. Chem. Intermed. 1990, 13, 195.
(9) Hannink, R. H. J.; Kelly, P. M.; Muddle, B. C. J. Am. Ceram. Soc.
2000, 83, 461.
(10) Labaki, M.; Lamonier, J. F.; Siffert, S.; Zhilinskaya, E. A.;
Aboukais, A. Colloids Surf., A 2003, 227, 63.
(11) Rivas, P. C.; Caracoche, M. C.; Pasquevich, A. F.; Martinez, J.
A.; Rodriguez, A. M.; Garcia, A. R. L.; Mintzer, S. R. J. Am. Ceram. Soc.
1996, 79, 831.
(12) Zhang, Y. W.; Jin, S.; Yang, Y.; Liao, C. S.; Yan, C. H. Solid
State Commun. 2002, 122, 439.
(13) Hartridge, A.; Krishna, M. G.; Bhattacharya, A. K. Thin Solid Films
2001, 384, 254.
(14) West, A. R. Basic Solid State Chemistry; John Wiley & Sons: New
York, 1998.
(15) Kralik, B.; Chang, E. K.; Louie, S. G. Phys. ReV. B 1998, 57, 7027.
(16) Navio, J. A.; Colon, G.; Herrmann, J. M. J. Photochem. Photobiol.,
A 1997, 108, 179.
(17) Emeline, A.; Kataeva, G. V.; Litke, A. S.; Rudakova, A. V.;
Ryabchuk, V. K.; Serpone, N. Langmuir 1998, 14, 5011.
(18) Adamski, A.; Sojka, Z.; Dyrek, K.; Che, M. Solid State Ionics 1999,
117, 113.
(19) Ramamoorthy, R.; Ramasamy, S.; Sundararaman, D. J. Mater. Res.
1999, 14, 90.
(20) Srinivasan, R.; Hubbard, C. R.; Cavin, O. B.; Davis, B. H. Chem.
Mater. 1993, 5, 27.
Conclusions
The chemical states, as well as the ionic sizes and d-electronic
configurations, of the dopants determine the crystalline proper-
ties and band gaps of the metal-doped ZrO2 thin films. The
oxidation of 2-propanol and the dehydroxylation and deoxy-
genation processes drive the reduction of the metal ions in the
sol-gel-derived ZrO2 thin films at different temperatures. The
final oxidation states control the microstructures, including the
d spacings, the crystallite sizes, the preferred orientation, and
the phase transformation, of the metal-doped ZrO2 thin films.
On the other hand, the changes in chemical states lead to
different electronic configurations that influence the positions
of the impurity levels between the intrinsic bands and the new
band gaps of the metal-doped ZrO2 thin films. The redox
properties of the metal ions in the first series are dependent
upon the d-electronic configurations and the calcination tem-
peratures. The ions with the d5 or d10 configurations possess
high stability in the ZrO2 lattice while the other ions are readily
reduced at elevated temperatures. The results obtained in this
study clearly demonstrate that the dopants influence the phys-
icochemical properties of ZrO2 thin film. This finding should
be helpful in facilitating the development of catalytic processes
using metal-doped ZrO2 thin films.
(21) Kosacki, I.; Petrovsky, V.; Anderson, H. U. Appl. Phys. Lett. 1999,
74, 341.
(22) Zhao, Q.; Wang, X. P.; Cai, T. X. Appl. Surf. Sci. 2004, 225, 7.
(23) Nishino, Y.; Krauss, A. R.; Lin, Y. P.; Gruen, D. M. J. Nucl. Mater.
1996, 228, 346.
(24) Indovina, V.; Occhiuzzi, M.; Pietrogiacomi, D.; Tuti, S. J. Phys.
Chem. B 1999, 103, 9967.
(25) Kristof, J.; Daolio, S.; De Battisti, A.; Piccirillo, C.; Mihaly, J.;
Horvath, E. Langmuir 1999, 15, 1498.
(26) Saadoune, I.; Cora, F.; Alfredsson, M.; Catlow, C. R. A. J. Phys.
Chem. B 2003, 107, 3012.
(27) Stefanic, G.; Stefanic, I. I.; Music, S. Mater. Chem. Phys. 2000,
65, 197.
(28) Jana, S.; Biswas, P. K. Mater. Lett. 1997, 30, 53.
(29) Sun, Y. M.; Lee, S. Y.; Lemonds, A.; Lozano, J.; Zhou, J. P.; Ekerdt,
J. G.; White, J. M.; Imesh, I. Surf. Interface Anal. 2001, 32, 79.
(30) Ram, S. J. Mater. Sci. 2003, 38, 643.
(31) Pankove, J. I. Optical Processes in Semiconductors; Dover Publica-
tions Inc: New York, 1971.
(32) Method 7000B: Flame Atomic Absorption Spectrophotometry; CD-
ROM 7000B-1; United States Environmental Protection Agency: Wash-
ington, D.C., 1998.
(33) Tian, J. H.; Liang, B. C.; Wang, Y.; Li, S. F. J. Electroanal. Chem.
2002, 526, 36.
(34) Takahashi, M.; Igarashi, J. Phys. ReV. B 1996, 54, 13566.
(35) Cheng, R. H.; Xu, B.; Borca, C. N.; Sokolov, A.; Yang, C. S.;
Yuan, L.; Liou, S. H.; Doudin, B.; Dowben, P. A. Appl. Phys. Lett. 2001,
79, 3122.
(36) Zimmermann, R.; Steiner, P.; Claessen, R.; Reinert, F.; Hufner,
S.; Blaha, P.; Dufek, P. J. Phys.: Condens. Matter 1999, 11, 1657.
(37) Collins, D. E.; Bowman, K. J. J. Mater. Res. 1998, 13, 1230.
Acknowledgment. We thank the National Science Council,
Taiwan, R.O.C. for the financial support under grant No. NSC
92-2113-M007-068.