Inorg. Chem. 2005, 44, 3755−3761
Synthesis, Structure, and Thermal Properties of Soluble Hydrazinium
Germanium(IV) and Tin(IV) Selenide Salts
David B. Mitzi
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
Received December 8, 2004
The crystal structures of two hydrazinium-based germanium(IV) and tin(IV) selenide salts are determined. (N2H5)4-
Ge2Se6 (1) [I41cd, a 12.708(1) Å, c 21.955(2) Å, Z 8] and (N2H4)3(N2H5)4Sn2Se6 (2) [P1, a 6.6475(6)
Å, b 9.5474(9) Å, c 9.8830(10) Å, R ) 94.110(2) 1] each consist
of anionic dimers of edge-sharing metal selenide tetrahedra, M2Se6 (M Ge or Sn), separated by hydrazinium
)
)
)
h
)
)
)
°
,
â ) 99.429(2)
°
,
)
γ ) 104.141(2)
°
, Z
)
4-
cations and, for 2, additional neutral hydrazine molecules. Substantial hydrogen bonding exists among the hydrazine/
hydrazinium molecules as well as between the hydrazinium cations and the selenide anions. Whereas the previously
reported tin(IV) sulfide system, (N2H5)4Sn2S6, decomposes cleanly to microcrystalline SnS2 when heated to 200
°C
in an inert atmosphere, higher temperatures (>300 C) are required to dissociate selenium from 1 and 2 for the
°
analogous preparations of single-phase metal selenides. The metal chalcogenide salts are highly soluble in hydrazine,
as well as in a variety of amines and DMSO, highlighting the potential usefulness of these compounds as precursors
for the solution deposition of the corresponding metal chalcogenide films.
Introduction
antimony-germanium-telluride phase-change materials,
which currently dominate the CD-RW and DVD markets.16
Most electronic applications of metal chalcogenides and
other semiconductors depend on the ability to deposit
continuous thin films with a well-defined thickness. Common
deposition techniques for the chalcogenides routinely require
relatively high deposition temperatures or vacuum conditions.
Vapor-phase techniques involving vacuum processes, such
as evaporation or sputtering,17,18 and chemical vapor deposi-
tion19,20 are commonly employed to deposit high-quality films
for device applications. Although broadly applicable across
the chalcogenide family, these techniques are not readily
amenable to large area, low-cost deposition. In contrast,
solution-based film deposition is particularly desirable
The diverse structural chemistry and range of electronic
properties exhibited by metal chalcogenides lead to important
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10.1021/ic048276l CCC: $30.25
Published on Web 04/19/2005
© 2005 American Chemical Society
Inorganic Chemistry, Vol. 44, No. 10, 2005 3755