Mechanism of the photochemically induced reaction between Ga(CH3)3 and HN3 and the deposition of GaN films

DOI: 10.1063/1.120653

Source and publish data:

Applied Physics Letters p. 88 - 90 (1998)

Update date:2022-08-10

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Authors:

Linnen Linnen

Coombe Coombe

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Article abstract of DOI:10.1063/1.120653

Gaseous HN₃ reacts with surface-bound Ga(CH₃)_x species slowly at 300 K to produce thin films containing azide-substituted gallium compounds. When mixtures of HN₃ and Ga(CH₃)₃ over the surfa

Full text of DOI:10.1063/1.120653

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