31
Table 1. δ ( P) (in ppm) and Yield (%) of Compounds 3
compda
R1
Ar
δ (31P)
yield (%)
b
3
a
OH
OEt
OEt
Ph
Ph
OEt
OEt
4-MeO-C6H4
4-MeO-C6H4
4-MeO-C6H4
4-MeO-C6H4
4-MeO-C6H4
3,5-diMe-C6H4
3,5-diMe-C6H4
47.33
43.8
59
24
37
48
37
29
40
trans-3b
cis-3b
trans-3c
cis-3c
trans-3d
cis-3d
42.77
53.62
61.65
44.88
43.91
a
The cis/trans descriptors indicate the relative arrangement of the
b
substituents R1 and Ar. Isolated.
Figure 2. Transient kinetic traces recorded at 340 nm following
55 nm laser excitation of a sample containing 2.5 mM of 3a in
not affected.12 The structural assignment of 3 was straight-
3
forward. The presence of the oxaphosphole moiety was
di-tert-butylperoxide/acetonitrile (50/50) under nitrogen (9) and
oxygen (O).
31
13
revealed by the large P, C coupling constants observed in
1
3
the C NMR spectra for the methine carbon attached to
1
phosphorus ( JPC ranging from 78.1 to 123.2 Hz) and the
The growth of the radical signal reflects the hydrogen
abstraction process (k ) and other forms of decay of tert-
2
butoxyl radicals (k ), such as reaction with the solvent and
0
â-cleavage. The experimental rate constant for the growth
C
ipso carbon adjacent to the oxygen atom and linked to the
t
3
Bu group ( JPC ranging from 6 to 9.6 Hz). The relative
configuration of the stereoisomers was readily deduced from
the NOEs observed in the 2D gNOESY spectra. Thus, the
ortho protons of the P-phenyl ring of trans-3c and cis-3c
correlate, respectively, with the methine proton at δ 4.53
is given by eq 3 in Scheme 2.
2
4
6
ppm (dt, JPH 8.1, JHH ) JHH 0.9 Hz) and the ortho pro-
3
tons of the p-methoxy substituent at δ 6.78 ppm (dd, JHH
Scheme 2. H-Abstraction Process by tert-Butoxyl Radicals
)
7.8 Hz).
Laser flash photolysis (λ ) 355 nm) of di-tert-butyl
peroxide in deaerated acetonitrile (50% v/v) in the presence
of 3a (2.5 mM) were carried out in order to generate the
corresponding benzylic radical and to study its reactivity with
1
3
oxygen. The resulting transient species showed one strong
UV band with maximum at 350 nm and a less intense broad
band with maximum in the visible at 580 nm (Figure 1A).
For comparison, the transient absorption spectrum obtained
upon photolysis of di-tert-butyl peroxide in the presence of
HP-136 in the same solvent is shown in Figure 1B. In the
presence of oxygen, the rates of growth and decay of the
oxaphosphole oxide radical (4a) were essentially the same
as under nitrogen, indicating a low reactivity toward oxygen
Accurate measurements of the rate constant for the
hydrogen abstraction process could not be done due to the
poor solubility of the phospholane oxides, which prevented
to obtain kinetic data at different concentrations. Then, the
efficiency of benzylic radical formation from 3a was esti-
mated by comparison with HP-136, using the same concen-
tration for both compounds. Figure 3 shows the transient
kinetic traces at the corresponding UV maxima obtained upon
laser excitation of the peroxide in the presence of 2.5 mM
solutions of 3a or HP-136.
1
4
(Figure 2). These data suggest that the phosphonyl group in
radical 4a provides a stability to the benzylic radical similar
to that of the carbonyl group in HP-136.
The same types of studies were carried out with both dia-
stereomers of compounds 3b-d. For all of them, the
generated radicals exhibited similar transient absorption
spectrum as that obtained from 3a; oxygen did not produce
any appreciable change in the growth or decay rate of these
radicals. However, comparison of the transient kinetic traces
recorded at 360 nm for each diastereomeric pair at the same
concentration revealed important differences in the relative
absorbances (see Figure 4 for cis-3b and trans-3b as an
example). It should be taken into account that, as mentioned
above, the growth of the signal reflects not only the hydrogen
atom abstraction by tert-butoxyl radical from the benzylic
position, but also other forms of decay of this radical. Hence,
this fact evidences a marked dependence of the hydrogen
(
11) (a) Ivanov, B. E.; Ageeva, A. B. IzV. Akad. Nauk SSSR, Ser. Khim.
1
967, 226; Chem. Abstr. 1967, 67, 11538. (b) Sidky, M. M.; El-Kateb, A.
A.; Hennawy, I. T. Phosphorus Sulfur Silicon 1981, 10, 343. (c) Chasar,
D. W. J. Org. Chem. 1983, 48, 4768. (d) Nifant’ev, E. E.; Kukhareva, T.
S.; Popkova, T. N.; Bekker, A. R. Zh. Org. Khim. 1987, 57, 2003; Chem.
Abstr. 1988, 109, 129113. (e) Gross, H.; Costisella, B.; Ozegowski, S.;
Keitel, I.; Forner, K. Phosphorus Sulfur Silicon 1993, 84, 121. (f) Gorg,
M.; Dieckbreder, U.; Schoth, R.-M.; Kadyrov, A. A.; Roschenthaler, G..-
V. Phosphorus Sulfur Silicon 1997, 124-125, 419. (g) Zhou, J.; Qiu, Y.
G.; Feng, K. S.; Chen, R. Y. Synthesis 1999, 234.
(12) Mukhametov, F. S.; Korshin, E.; Korshunov, R. L.; Efremov, Y.
Y.; Zyablikova, T. A. Zh. Org. Khim. 1986, 56, 1781; Chem. Abstr. 1987,
1
07, 576105.
13) Paul, H.; Small, R. D.; Scaiano, J. C. J. Am. Chem. Soc. 1978, 100,
520.
14) (a) Lohray, B. B.; Kumar, C. V.; Das, P. K.; George, M. V. J. Am.
(
4
(
Chem. Soc. 1984, 106, 7352. (b) Davis, H. F.; Lohray, B. B.; Gopidas, K.
R.; Kumar, C. V.; Das, P. K.; George, M. V. J. Org. Chem. 1985, 50,
685.
3
Org. Lett., Vol. 6, No. 4, 2004
563