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993-07-7 Usage

Uses

Potential reducing agent that will produce low boiling hexamethyldisiloxane by-product.

Check Digit Verification of cas no

The CAS Registry Mumber 993-07-7 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 9,9 and 3 respectively; the second part has 2 digits, 0 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 993-07:
(5*9)+(4*9)+(3*3)+(2*0)+(1*7)=97
97 % 10 = 7
So 993-07-7 is a valid CAS Registry Number.
InChI:InChI=1/C3H10Si/c1-4(2)3/h4H,1-3H3

993-07-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name TRIMETHYLSILANE

1.2 Other means of identification

Product number -
Other names SILICON TRIMETHYL

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:993-07-7 SDS

993-07-7Synthetic route

lithium aluminium tetrahydride
16853-85-3

lithium aluminium tetrahydride

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
aluminum (III) chloride; lithium chloride In xylene at 80℃; for 0.166667h; Product distribution / selectivity;95.4%
In toluene at 80℃; for 0.166667h; Product distribution / selectivity;92.5%
lithium tetrachloroaluminate In toluene at 80℃; for 0.166667h; Product distribution / selectivity;92.7%
1-(Trimethylsilyloxy)cyclohexene
6651-36-1

1-(Trimethylsilyloxy)cyclohexene

A

trimethylsilan
993-07-7

trimethylsilan

B

cyclohexanone
108-94-1

cyclohexanone

Conditions
ConditionsYield
With hydrogen; [RuCl(η2-H2)(dppe)2]OTf In 1,2-dichloro-ethane at 50℃; under 760 Torr; for 48h; Product distribution; Further Variations:; Catalysts;A n/a
B 95%
With hydrogen; [RuCl(dppe)2]OTf In benzene-d6 at 50℃; for 3h; Hydrogenolysis; Title compound not separated from byproducts;
trimethylsilyl trifluoromethanesulfonate
27607-77-8

trimethylsilyl trifluoromethanesulfonate

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With C35H37IrN2P(1+)*C24BF20(1-); hydrogen; N-ethyl-N,N-diisopropylamine; triphenylphosphine In (2)H8-toluene at 20℃; under 760.051 Torr; for 4.5h;94%
With [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at -196 - 60℃; under 3040.2 Torr; for 48h;95 %Spectr.
With 1,4-bis-(trimethylsilyl)benzene; [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at 60℃; under 3040.2 Torr; for 48h; Reagent/catalyst;95 %Spectr.
With [Ru(H)2CO(HN(CH2CH2P(iPr)2)2)]; hydrogen; triethylamine In benzene-d6 at 20℃; under 3000.3 Torr; for 18h; Catalytic behavior; Pressure;85 %Spectr.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With lithium aluminium tetrahydride; calcium hydride In diethylene glycol dimethyl ether for 11h; Inert atmosphere; Reflux;92%
With lithium aluminium tetrahydride In toluene at 80℃; for 0.916667h; Inert atmosphere;82%
With lithium aluminium tetrahydride In hexane at 40℃; for 3h; Irradiation; ultrasonic irradiation;80%
C10H26OSi3
83268-94-4

C10H26OSi3

A

trimethyl(prop-1-ynyl)silane
6224-91-5

trimethyl(prop-1-ynyl)silane

B

trimethylsilan
993-07-7

trimethylsilan

C

Methoxytrimethylsilane
1825-61-2

Methoxytrimethylsilane

D

ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

Conditions
ConditionsYield
at 650℃; under 0.0001 Torr;A 18%
B n/a
C 87%
D 28%
1,1,2,2-tetramethyldisilane
814-98-2

1,1,2,2-tetramethyldisilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilane
1111-74-6

dimethylsilane

D

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride at 180℃; for 17h; Sealed tube;A 2%
B 4%
C 87%
D 7%
pentamethylchlorodisilane
1560-28-7

pentamethylchlorodisilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 89h; Sealed tube;A 85%
B 11%
Dimethylphenylsilane
766-77-8

Dimethylphenylsilane

3-dimethylaminophenyl-trimethylsilane
17961-91-0

3-dimethylaminophenyl-trimethylsilane

A

trimethylsilan
993-07-7

trimethylsilan

B

3-(dimethyl(phenyl)silyl)-N,N-dimethylaniline

3-(dimethyl(phenyl)silyl)-N,N-dimethylaniline

Conditions
ConditionsYield
With tris(pentafluorophenyl)borate In chlorobenzene at 100℃; for 24h; Mechanism; Glovebox; Inert atmosphere; chemoselective reaction;A n/a
B 81%
3-(dimethylsilyl)-N,N-dimethylaniline

3-(dimethylsilyl)-N,N-dimethylaniline

A

trimethylsilan
993-07-7

trimethylsilan

B

3,3′-(dimethylsilanediyl)-bis(N,N-dimethylaniline)

3,3′-(dimethylsilanediyl)-bis(N,N-dimethylaniline)

Conditions
ConditionsYield
With trimethylphenylsilane; tris(pentafluorophenyl)borate In chlorobenzene at 100℃; for 24h; Mechanism; Glovebox; chemoselective reaction;A n/a
B 78%
2-cyclopropyl-2-methoxyhexamethyltrisilane
83268-89-7

2-cyclopropyl-2-methoxyhexamethyltrisilane

A

trimethyl(prop-1-ynyl)silane
6224-91-5

trimethyl(prop-1-ynyl)silane

B

trimethylsilan
993-07-7

trimethylsilan

C

Methoxytrimethylsilane
1825-61-2

Methoxytrimethylsilane

D

ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

Conditions
ConditionsYield
at 590℃; under 0.0001 Torr;A 18%
B n/a
C 72%
D 27%
N,N-diethyl-1,1,1-trimethylsilanamine
996-50-9

N,N-diethyl-1,1,1-trimethylsilanamine

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With lithium aluminium tetrahydride In hexane at 40℃; for 3h; Irradiation; ultrasonic irradiation;70%
Al(SiMe3)3*OEt2

Al(SiMe3)3*OEt2

diphenylphosphane
829-85-6

diphenylphosphane

A

{((CH3)3Si)2AlP(C6H5)2}2
111920-15-1

{((CH3)3Si)2AlP(C6H5)2}2

B

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
In hexane combining Ph2PH soln. with (Me3Si)Al.Et2O soln. at -78 °C, warming to 25 °C, evapn. after several h, redissolution of resulting oil in hexane, refluxing for 48 h ; under inert gas; cooling, decantation, washing of residue with hexane twice (improvement of yield by collection of decanted liquids and filtrates and crystn. from hexane at -20 °C) ; elem. anal.;A 65%
B n/a
(C6H5)3PNP(C6H5)3(1+)*(CO)4FeSi(CH3)3(1-)=(C6H5)3PNP(C6H5)3[(CO)4FeSi(CH3)3]
78465-74-4

(C6H5)3PNP(C6H5)3(1+)*(CO)4FeSi(CH3)3(1-)=(C6H5)3PNP(C6H5)3[(CO)4FeSi(CH3)3]

trifluorormethanesulfonic acid
1493-13-6

trifluorormethanesulfonic acid

A

dihydridotetracarbonyliron
71564-37-9, 22763-20-8, 12002-28-7

dihydridotetracarbonyliron

B

trimethylsilan
993-07-7

trimethylsilan

C

(CO)4FeH(Si(CH3)3)
63022-27-5

(CO)4FeH(Si(CH3)3)

Conditions
ConditionsYield
With Hexamethylbenzene In dichloromethane-d2 mixt. of Fe-complex, hexamethylbenzene standard (molar ratio 1:0.25) and CD2Cl2 cooled to -40°C, 1 equiv of CF3SO3H added; without isolation; monitored by (1)H NMR spectra;A n/a
B 0%
C 65%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With N,N,N,N,N,N-hexamethylphosphoric triamide; borane-THF In tetrahydrofuran at 20℃; for 48h;64%
trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With C35H37IrN2P(1+)*C24BF20(1-); hydrogen; N-ethyl-N,N-diisopropylamine; triphenylphosphine In (2)H8-toluene at 20℃; under 760.051 Torr; for 432h;61%
With [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at -196 - 60℃; under 3040.2 Torr; for 48h; Mechanism; Reagent/catalyst;91 %Spectr.
With 1,4-bis-(trimethylsilyl)benzene; [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at 60℃; under 3040.2 Torr; for 48h; Reagent/catalyst;91 %Spectr.
1,1-Dimethyl-2,3-bis-trimethylsilanyl-[1,3]disiletane
86997-49-1

1,1-Dimethyl-2,3-bis-trimethylsilanyl-[1,3]disiletane

2,3-dimethyl-buta-1,3-diene
513-81-5

2,3-dimethyl-buta-1,3-diene

A

trimethylsilan
993-07-7

trimethylsilan

B

2,2,6,7-Tetramethyl-1-trimethylsilanyl-2,4-disila-spiro[3.4]oct-6-ene
86997-51-5

2,2,6,7-Tetramethyl-1-trimethylsilanyl-2,4-disila-spiro[3.4]oct-6-ene

Conditions
ConditionsYield
In benzene at 450℃; in a vertical Pyrex tube packed with Pyrex chips;A n/a
B 57%

A

trimethyl(prop-1-ynyl)silane
6224-91-5

trimethyl(prop-1-ynyl)silane

B

trimethylsilan
993-07-7

trimethylsilan

C

Methoxytrimethylsilane
1825-61-2

Methoxytrimethylsilane

D

ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

Conditions
ConditionsYield
at 650℃; under 0.0001 Torr;A 17%
B n/a
C 55%
D 16%
trimethylsilyldiethylgermane
100460-02-4

trimethylsilyldiethylgermane

triethylgermylcesium
51639-33-9

triethylgermylcesium

A

pentaethyldigermane
993-84-0

pentaethyldigermane

B

trimethylsilan
993-07-7

trimethylsilan

C

Triethylgerman
1188-14-3

Triethylgerman

D

hexaethyldigermane
993-62-4

hexaethyldigermane

E

trimethylsilyltriethylgermane
7749-85-1

trimethylsilyltriethylgermane

Conditions
ConditionsYield
With water In benzene byproducts: Me3SiGeEt2H; Mixt. of Me3SiGe(H) and Et3GeCs in benzene is stirred for 72 h at 25°C.; After hydrolysis mixt. is examined by GLC, gas chromy. and mass spectrometry.;A 53.2%
B 7.7%
C 18.9%
D 4.4%
E 3%
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

N-Benzylidenemethylamine
622-29-7

N-Benzylidenemethylamine

A

trimethylsilan
993-07-7

trimethylsilan

B

N-(2-trimethylsilylbenzylidene)methylamine

N-(2-trimethylsilylbenzylidene)methylamine

C

N-<2,6-bis(trimethylsilyl)benzylidene>methylamine

N-<2,6-bis(trimethylsilyl)benzylidene>methylamine

Conditions
ConditionsYield
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h;A n/a
B 23%
C 52%
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h; Product distribution; Mechanism; var. of ratio imine:silane, time;A n/a
B 38%
C 27%
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h; Yield given. Yields of byproduct given;
Al(SiMe3)3*OEt2

Al(SiMe3)3*OEt2

phenyl(trimethylsilyl)phosphine
32796-33-1

phenyl(trimethylsilyl)phosphine

A

{((CH3)3Si)2AlP(C6H5)Si(CH3)3}2
118334-37-5

{((CH3)3Si)2AlP(C6H5)Si(CH3)3}2

B

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
In hexane combining (Me3Si)PhPH soln. with (Me3Si)Al.Et2O soln. at -78 °C, warming to 25 °C, stirring 4 h, evapn. of solvent, redissolution of resulting oil in hexane, refluxing for 48 h ; under inert gas; concn., decantation, washing of residue with cold hexane (improvement of yield by collection of decanted liquids and filtrates and crystn. from hexane at -20 °C), drying in vacuo;A 50%
B n/a
1,1,1,3,3,3-hexamethyltrisilane
5089-32-7

1,1,1,3,3,3-hexamethyltrisilane

A

trimethylsilan
993-07-7

trimethylsilan

B

1-methyl-1,3-disilacyclobutane
80540-80-3

1-methyl-1,3-disilacyclobutane

Conditions
ConditionsYield
at 750℃; under 0.05 Torr;A n/a
B 45%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

trimethylsilan
993-07-7

trimethylsilan

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride at 220℃; for 24h; Sealed tube;A 16%
B 30%
C 5%
D 44%
bis(trimethylsilyl)mercury
4656-04-6

bis(trimethylsilyl)mercury

bis(trifluoromethyl)phosphine
460-96-8

bis(trifluoromethyl)phosphine

A

(CH3)3SiP(H)CF3

(CH3)3SiP(H)CF3

B

trimethylsilan
993-07-7

trimethylsilan

C

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

D

Trimethylsilyl-bis-(trifluormethyl)-phosphin
21658-00-4

Trimethylsilyl-bis-(trifluormethyl)-phosphin

E

mercury

mercury

Conditions
ConditionsYield
A n/a
B n/a
C n/a
D 40%
E n/a
bis(trimethylsilyl)mercury
4656-04-6

bis(trimethylsilyl)mercury

bis(trifluoromethyl)phosphinic chloride
646-71-9

bis(trifluoromethyl)phosphinic chloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

trimethylsilan
993-07-7

trimethylsilan

C

bis(trifluoromethyl)chlorophosphine
650-52-2

bis(trifluoromethyl)chlorophosphine

D

Bistrifluormethyltrimethylsiloxyphosphinoxid
32114-80-0

Bistrifluormethyltrimethylsiloxyphosphinoxid

Conditions
ConditionsYield
warming up from -84°C to 20°C;A n/a
B n/a
C n/a
D 38%
warming up from -84°C to 20°C;A n/a
B n/a
C n/a
D 38%
(dimethylphenylgermyl)trimethylsilane
37899-63-1

(dimethylphenylgermyl)trimethylsilane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

trimethylsilan
993-07-7

trimethylsilan

C

trimethylphenylsilane
768-32-1

trimethylphenylsilane

D

dimethylphenylgermane
7366-21-4

dimethylphenylgermane

E

1,1,2,2-tetramethyl-1,2-diphenyldigermane
22702-72-3

1,1,2,2-tetramethyl-1,2-diphenyldigermane

Conditions
ConditionsYield
With methanol In benzene Irradiation (UV/VIS); irradiation of catenate in benzene containing an excess of methanol with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS;A <1
B n/a
C 37%
D <1
E <1
In cyclohexane Irradiation (UV/VIS); irradiation of catenate in cyclohexane with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS;A <1
B 4%
C 24%
D <1
E <1
triethylsilane
617-86-7

triethylsilane

2-(pentamethyldisilanyl)furan
156116-66-4

2-(pentamethyldisilanyl)furan

A

2-furyltrimethylsilane
1578-33-2

2-furyltrimethylsilane

B

trimethylsilan
993-07-7

trimethylsilan

C

triethyldimethyldisilane
31732-54-4

triethyldimethyldisilane

Conditions
ConditionsYield
In cyclohexane at 19.9℃; Rate constant; Irradiation;A 1%
B 35%
C 2%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilane
1111-74-6

dimethylsilane

D

trimethylsilan
993-07-7

trimethylsilan

E

dichloro[(chlorodimethylsilyl)methyl]methylsilane
4519-04-4

dichloro[(chlorodimethylsilyl)methyl]methylsilane

F

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With n-Butyl chloride; tributylphosphine at 220℃; for 70h; Sealed tube;A 13%
B 30%
C 2%
D 2%
E 18%
F 35%
trimethyl(prop-1-ynyl)silane
6224-91-5

trimethyl(prop-1-ynyl)silane

pentaborane(9)

pentaborane(9)

A

2-(trimethylsilyl)-3-(methyl)-2,3-dicarba-nido-hexaborane(8)

2-(trimethylsilyl)-3-(methyl)-2,3-dicarba-nido-hexaborane(8)

B

{CH3CHCSi(CH3)3}3B
91793-61-2

{CH3CHCSi(CH3)3}3B

C

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
from -196°C to 135°C, 48 h at 135°C; fractionated by trap-to-trap destillation;A 33.4%
B n/a
C n/a
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

1,1-Dilithioethan
86901-29-3

1,1-Dilithioethan

A

trimethylsilan
993-07-7

trimethylsilan

B

1,1-bis(trimethylsilyl)ethane
18406-29-6

1,1-bis(trimethylsilyl)ethane

C

ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

Conditions
ConditionsYield
In tetrahydrofuran for 24h; Ambient temperature;A 19%
B 30%
C n/a
1,1,2,2-tetramethyl-1,2-disilacyclohex-4-ene
51043-84-6

1,1,2,2-tetramethyl-1,2-disilacyclohex-4-ene

A

1,1-Dimethylsilacyclopent-3-en
16054-12-9

1,1-Dimethylsilacyclopent-3-en

B

trimethylsilan
993-07-7

trimethylsilan

C

1,1-dimethyl-1,3-disilacyclobutanes
38512-90-2

1,1-dimethyl-1,3-disilacyclobutanes

D

1,3-dimethyl-1,3-disilacyclobutane
1628-01-9

1,3-dimethyl-1,3-disilacyclobutane

Conditions
ConditionsYield
at 750℃; under 0.01 Torr; Further byproducts given;A 25%
B 0.5%
C 16%
D 9%
trimethylsilan
993-07-7

trimethylsilan

2(μ-CO)(μ-C=C(CH3)CH2CH3) (3)

2(μ-CO)(μ-C=C(CH3)CH2CH3) (3)

A

Trimethyl-((E)-2-methyl-but-1-enyl)-silane
116597-17-2, 116663-37-7

Trimethyl-((E)-2-methyl-but-1-enyl)-silane

B

12, 13

12, 13

Conditions
ConditionsYield
In benzene-d6 for 2h; Irradiation;A 100%
B n/a
5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-3-hydroxy-4-methyl-bicyclo[2.2.2]octan-2-one
929097-27-8

5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-3-hydroxy-4-methyl-bicyclo[2.2.2]octan-2-one

trimethylsilan
993-07-7

trimethylsilan

5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-4-methyl-3-(trimethyl-silanyloxy)-bicyclo[2.2.2]octan-2-one
929097-32-5

5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-4-methyl-3-(trimethyl-silanyloxy)-bicyclo[2.2.2]octan-2-one

Conditions
ConditionsYield
With 1H-imidazole In dichloromethane at 0 - 20℃; for 1h;100%
{C5H5(CO)Fe}2(μ-CC(CH3)C2H5)

{C5H5(CO)Fe}2(μ-CC(CH3)C2H5)

trimethylsilan
993-07-7

trimethylsilan

A

cyclopentadienyl iron(II) dicarbonyl dimer
38117-54-3

cyclopentadienyl iron(II) dicarbonyl dimer

B

(CH3)3Si(CH3)CC(CH3)C2H5

(CH3)3Si(CH3)CC(CH3)C2H5

C

[(η(5)-Cp)Fe(CO)]4

[(η(5)-Cp)Fe(CO)]4

Conditions
ConditionsYield
In benzene-d6 Irradiation (UV/VIS); Fe complex and trimethylsilane were photolyzed (black light bulb, emission max. 366 nm) for 2 h; monitored by NMR, 4,4'-dimethylbiphenyl as internal standard;A 53%
B 100%
C 37%
{Ru2(CO)(MeCN)(μ-CH2)(μ-CO)(η-C5H5)2}

{Ru2(CO)(MeCN)(μ-CH2)(μ-CO)(η-C5H5)2}

trimethylsilan
993-07-7

trimethylsilan

(C5H5)2Ru2(μ-CH2)(H)(SiMe3)(CO)2

(C5H5)2Ru2(μ-CH2)(H)(SiMe3)(CO)2

Conditions
ConditionsYield
In benzene inert atmosphere; evapn. (reduced pressure); detd. by NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14CH3)

ClHB(C9H14CH3)

ClHB(C9H14CH3)*C4H8O

ClHB(C9H14CH3)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14C2H5)

ClHB(C9H14C2H5)

ClHB(C9H14C2H5)*C4H8O

ClHB(C9H14C2H5)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; stirring (15 min); detd. by (11)B NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14CH(CH3)2)

ClHB(C9H14CH(CH3)2)

ClHB(C9H14CH(CH3)2)*C4H8O

ClHB(C9H14CH(CH3)2)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14C3H7)

ClHB(C9H14C3H7)

ClHB(C9H14C3H7)*C4H8O

ClHB(C9H14C3H7)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14CH2CH(CH3)2)

ClHB(C9H14CH2CH(CH3)2)

ClHB(C9H14CH2CH(CH3)2)*C4H8O

ClHB(C9H14CH2CH(CH3)2)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy;100%
tetrahydrofuran
109-99-9

tetrahydrofuran

trimethylsilan
993-07-7

trimethylsilan

ClHB(C9H14C6H5)

ClHB(C9H14C6H5)

ClHB(C9H14C6H5)*C4H8O

ClHB(C9H14C6H5)*C4H8O

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy;100%
trimethylsilan
993-07-7

trimethylsilan

Ru(CO)2(CH3P(C(CH3)3)2)2
167774-59-6

Ru(CO)2(CH3P(C(CH3)3)2)2

cis,cis,trans-Ru(H)2(CO)2(P((t)Bu)2Me)2
167774-62-1

cis,cis,trans-Ru(H)2(CO)2(P((t)Bu)2Me)2

Conditions
ConditionsYield
15 h;100%
In benzene-d6 (Ar); room temp. (2 days);
trimethylsilan
993-07-7

trimethylsilan

1-acetyl-(2S,3aS,7aS)-octahydroindole-2-carboxylic acid

1-acetyl-(2S,3aS,7aS)-octahydroindole-2-carboxylic acid

methyl 1-acetyl-(2S,3aS,7aS)-octahydroindole-2-carboxylate

methyl 1-acetyl-(2S,3aS,7aS)-octahydroindole-2-carboxylate

Conditions
ConditionsYield
In methanol100%
trimethylsilan
993-07-7

trimethylsilan

[Ru2(CO)2(NCCH3)(C5H5)2(CHSi(CH3)3)]

[Ru2(CO)2(NCCH3)(C5H5)2(CHSi(CH3)3)]

(C5H5)2Ru2(μ-CH2)(SiMe3)2(CO)2

(C5H5)2Ru2(μ-CH2)(SiMe3)2(CO)2

Conditions
ConditionsYield
In not given room temp.;99%
trimethylsilan
993-07-7

trimethylsilan

(C(C6H5)3)(1+)*CHB11F11(1-)=(C(C6H5)3)CHB11F11

(C(C6H5)3)(1+)*CHB11F11(1-)=(C(C6H5)3)CHB11F11

(CH3)3Si(1+)*HCB11F11(1-)=((CH3)3Si)(HCB11F11)

(CH3)3Si(1+)*HCB11F11(1-)=((CH3)3Si)(HCB11F11)

Conditions
ConditionsYield
In neat (no solvent) byproducts: (C6H5)3CH; B-compd. treated in the fitration apparatus with (CH3)3SiH; washed with (CH3)3SiH, sublimed at 110°C under high vac. (p<1E-2 mbar);99%
trimethylsilan
993-07-7

trimethylsilan

(C6H5)3C(1+)*C2H5CB11F11(1-)=((C6H5)3C)(C2H5CB11F11)

(C6H5)3C(1+)*C2H5CB11F11(1-)=((C6H5)3C)(C2H5CB11F11)

(CH3)3Si(1+)*C2H5CB11F11(1-)=((CH3)3Si)(C2H5CB11F11)

(CH3)3Si(1+)*C2H5CB11F11(1-)=((CH3)3Si)(C2H5CB11F11)

Conditions
ConditionsYield
In neat (no solvent) byproducts: (C6H5)3CH; B-compd. treated in the fitration apparatus with (CH3)3SiH; washed with (CH3)3SiH, sublimed at 110°C under high vac. (p<1E-2 mbar);99%
(η5-C5H5)Fe(CO)2CH2CH2C6H5

(η5-C5H5)Fe(CO)2CH2CH2C6H5

trimethylsilan
993-07-7

trimethylsilan

A

3-phenyl-propionaldehyde
104-53-0

3-phenyl-propionaldehyde

B

C5H5Fe(CO)H(Si(CH3)3)2

C5H5Fe(CO)H(Si(CH3)3)2

C

C5H5Fe(CO)4

C5H5Fe(CO)4

D

Propylbenzene
103-65-1

Propylbenzene

E

trimethyl(3-phenylpropoxy)silane
14629-60-8

trimethyl(3-phenylpropoxy)silane

Conditions
ConditionsYield
In benzene-d6 react. of Fe complex and HSiMe3 in benzene, 90°C, 9 h; yields detd. by (1)H-NMR (C5H5Fe(CO)H(SiMe3)2; elem. anal.) and GL-chromy. (other products);A 0%
B 91%
C 10%
D 0%
E 98%
(η5-C5H5)Fe(CO)2CH2CH2C6H5

(η5-C5H5)Fe(CO)2CH2CH2C6H5

trimethylsilan
993-07-7

trimethylsilan

A

cyclopentadienyl iron(II) dicarbonyl dimer
38117-54-3

cyclopentadienyl iron(II) dicarbonyl dimer

B

C5H5Fe(CO)H(Si(CH3)3)2

C5H5Fe(CO)H(Si(CH3)3)2

C

[(cyclopentadienyl)4Fe4(CO)4]

[(cyclopentadienyl)4Fe4(CO)4]

D

trimethyl(3-phenylpropoxy)silane
14629-60-8

trimethyl(3-phenylpropoxy)silane

Conditions
ConditionsYield
In benzene-d6 under Ar; 90°C, 9 h; not isolated; NMR;A 10%
B 90%
C 10%
D 98%
[((Me)Cp)2MoH2]
61112-91-2

[((Me)Cp)2MoH2]

trimethylsilan
993-07-7

trimethylsilan

(trimethylsilyl)hydrido(methylcyclopentadienyl)2molybdenum

(trimethylsilyl)hydrido(methylcyclopentadienyl)2molybdenum

Conditions
ConditionsYield
In benzene Irradiation (UV/VIS); soln. of starting materials in benzene is photolyzed (350 nm, N2) for 36 h at 10°C; removal of volatiles under vac., purified by sublimation (60°C 1E-3 Torr), elem. anal.;98%
trimethylsilan
993-07-7

trimethylsilan

[((C5H3N)CH2(C5H3N)CH2(C5H3N)C2H4)PtH(CH3)2](1+)*[B((CF3)2C6H3)4](1-) = (C19N3H17)PtH(CH3)2(B((CF3)2C6H3)4)

[((C5H3N)CH2(C5H3N)CH2(C5H3N)C2H4)PtH(CH3)2](1+)*[B((CF3)2C6H3)4](1-) = (C19N3H17)PtH(CH3)2(B((CF3)2C6H3)4)

[((C5H3N)CH2(C5H3N)CH2(C5H3N)C2H4)PtH2CH3](1+)*[B((CF3)2C6H3)4](1-) = [(C19N3H17)PtH2CH3][B((CF3)2C6H3)4]

[((C5H3N)CH2(C5H3N)CH2(C5H3N)C2H4)PtH2CH3](1+)*[B((CF3)2C6H3)4](1-) = [(C19N3H17)PtH2CH3][B((CF3)2C6H3)4]

Conditions
ConditionsYield
In methanol byproducts: CH4, CH3OSi(CH3)3; at room temp. for 5 h; detd. by NMR;98%
trimethylsilan
993-07-7

trimethylsilan

Cp*Ni(PEt3)NH(p-C6H4Me)
198903-13-8

Cp*Ni(PEt3)NH(p-C6H4Me)

Cp*Ni(PEt3)H
198903-12-7

Cp*Ni(PEt3)H

Conditions
ConditionsYield
In benzene inert atmosphere; freezing, evacuation, warming (1 d, room temp.), colorchange; removal of volatile materials (vac.), vac. (overnight), extn. (pentane),filtration, concn.(vac.), cooling (-30°C); elem. anal.;97%
trimethylsilan
993-07-7

trimethylsilan

ethylamine
75-04-7

ethylamine

N,N-bis(trimethylsilyl)ethanamine
2477-39-6

N,N-bis(trimethylsilyl)ethanamine

Conditions
ConditionsYield
96.9%
trimethylsilan
993-07-7

trimethylsilan

Diethylaminodichloroborane
868-30-4

Diethylaminodichloroborane

diethylaminoborane dimer
93458-84-5

diethylaminoborane dimer

Conditions
ConditionsYield
150-180°C; sublimation at 50°C;96.5%
150-180°C; sublimation at 50°C;96.5%
trimethylsilan
993-07-7

trimethylsilan

bis(trifluoromethyl)ketene
684-22-0

bis(trifluoromethyl)ketene

A

(1-hydrohexafluoroisobutenyloxy)trimethylsilane
857899-86-6

(1-hydrohexafluoroisobutenyloxy)trimethylsilane

B

1-hydrohexafluoroisobutenyl 2-hydrohexafluoroisobutyrate

1-hydrohexafluoroisobutenyl 2-hydrohexafluoroisobutyrate

C

trimethylsilyl 2-hydrohexafluoroisobutyrate
64637-86-1

trimethylsilyl 2-hydrohexafluoroisobutyrate

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate at -78 - 40℃; Title compound not separated from byproducts;A 96%
B 0.4 % Spectr.
C 0.2 % Spectr.
trimethylsilan
993-07-7

trimethylsilan

Tris(phenylseleno)borane
29680-62-4

Tris(phenylseleno)borane

A

phenyl trimethylsilyl selenide
33861-17-5

phenyl trimethylsilyl selenide

B

diborane
19287-45-7

diborane

Conditions
ConditionsYield
In neat (no solvent) excess of SiMe3H, 60°C (closed ampoule); low-temp. fractionation (traps at -23, -126 and -196°C);A 96%
B n/a
trimethylsilan
993-07-7

trimethylsilan

1,4-bis(trimethylsilyl)-1,3-butadiyne
4526-07-2

1,4-bis(trimethylsilyl)-1,3-butadiyne

1,1,3,4-tetrakis(trimethylsilyl)-1,2-butadiene
103716-80-9

1,1,3,4-tetrakis(trimethylsilyl)-1,2-butadiene

Conditions
ConditionsYield
RhCl(PPh3)3 at 100℃; for 19h;95%
trimethylsilan
993-07-7

trimethylsilan

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With sodium hydroxide; ethanol at 60℃; for 4h;95%
trimethylsilan
993-07-7

trimethylsilan

methacrylic acid methyl ester
80-62-6

methacrylic acid methyl ester

acetone
67-64-1

acetone

A

1-methoxy-2-methyl-1-trimethylsiloxy-1-propene
31469-15-5

1-methoxy-2-methyl-1-trimethylsiloxy-1-propene

B

3-trimethylsiloxy-2,2,3-trimethylbutyrate
115579-81-2

3-trimethylsiloxy-2,2,3-trimethylbutyrate

Conditions
ConditionsYield
rhodium(III) chloride Ambient temperature;A 5%
B 95%
With BTH; rhodium(III) chloride Ambient temperature;A 5%
B 95%
rhodium(III) chloride Mechanism; Ambient temperature; other catalysts;
trimethylsilan
993-07-7

trimethylsilan

(E)-4-bromo-4'-methoxystilbene
58358-51-3

(E)-4-bromo-4'-methoxystilbene

{4-[(E)-2-(4-Methoxy-phenyl)-vinyl]-phenyl}-trimethyl-silane

{4-[(E)-2-(4-Methoxy-phenyl)-vinyl]-phenyl}-trimethyl-silane

Conditions
ConditionsYield
Stage #1: (E)-4-bromo-4'-methoxystilbene With n-butyllithium In diethyl ether at 3℃; for 2h; Metallation;
Stage #2: trimethylsilan With water at -40 - 20℃; Substitution; hydrolysis;
95%

993-07-7Relevant articles and documents

Fritz,Becker

, p. 180 (1969)

Investigation of the Gas-Phase Reaction of Trimethylsilyl Radicals with HBr: Measurement of the (CH3)3Si-H Bond Strength

Goumri, A.,Yuan, W.-J.,Marshall, Paul

, p. 2539 - 2540 (1993)

-

Co2(CO)8-catalyzed reactions of acetals or lactones with hydrosilanes and carbon monoxide. A new access to the preparation of 1,2-diol derivatives through siloxymethylation

Chatani, Naoto,Fujii, Satoru,Kido, Yoichi,Nakayama, Yasuhide,Kajikawa, Yasuteru,Tokuhisa, Hideo,Fukumoto, Yoshiya,Murai, Shinji

, p. 81 - 90 (2021/02/05)

The Co2(CO)8-catalyzed reaction of acetals with hydrosilanes and CO under mild reaction conditions (an ambient temperature under an ambient CO pressure), leading to the production of vicinal diols is reported. A siloxymethyl group can be introduced via the cleavage of one of two alkoxy groups in the acetal. The effects of the types of hydrosilanes, acetals, solvents, and reaction temperatures on the yield of siloxymethylation products were examined in detail. The reactivity for hydrosilanes is as follows; HSiMe3 > HSiEtMe2 > HSiEt2Me > HSiEt3. Hemiacetal esters are more reactive than dimethyl acetals. The polarity of the solvent used also has a significant effect on both the course of the reaction as well as the reaction rate. The site-selective siloxymethylation can be achieved in the case of cyclic acetals such as tetrahydrofuran (THF) and tetrahydropyrane (THP) derivatives, depending on the nature of the oxygen substituent attached adjacent to the oxygen atom in the ring. When 2-alkoxy THF or THP derivatives are used as substrates, the siloxymethylation takes place with cleavage of the ring C-O bond. In contrast, the reaction of 2-acetoxy THF or THP derivatives results in siloxymethylation with the cleavage of C-OAc bond. The ring-opening siloxymethylation of lactones was also examined.

Hydrogenolysis of Polysilanes Catalyzed by Low-Valent Nickel Complexes

Comas-Vives, Aleix,Eiler, Frederik,Grützmacher, Hansj?rg,Pribanic, Bruno,Trincado, Monica,Vogt, Matthias

supporting information, p. 15603 - 15609 (2020/04/29)

The dehydrogenation of organosilanes (RxSiH4?x) under the formation of Si?Si bonds is an intensively investigated process leading to oligo- or polysilanes. The reverse reaction is little studied. To date, the hydrogenolysis of Si?Si bonds requires very harsh conditions and is very unselective, leading to multiple side products. Herein, we describe a new catalytic hydrogenation of oligo- and polysilanes that is highly selective and proceeds under mild conditions. New low-valent nickel hydride complexes are used as catalysts and secondary silanes, RR′SiH2, are obtained as products in high purity.

Dual Role of Doubly Reduced Arylboranes as Dihydrogen- and Hydride-Transfer Catalysts

Von Grotthuss, Esther,Prey, Sven E.,Bolte, Michael,Lerner, Hans-Wolfram,Wagner, Matthias

supporting information, p. 6082 - 6091 (2019/04/17)

Doubly reduced 9,10-dihydro-9,10-diboraanthracenes (DBAs) are introduced as catalysts for hydrogenation as well as hydride-transfer reactions. The required alkali metal salts M2[DBA] are readily accessible from the respective neutral DBAs and Li metal, Na metal, or KC8. In the first step, the ambiphilic M2[DBA] activate H2 in a concerted, metal-like fashion. The rates of H2 activation strongly depend on the B-bonded substituents and the counter cations. Smaller substituents (e.g., H, Me) are superior to bulkier groups (e.g., Et, pTol), and a Mes substituent is even prohibitively large. Li+ ions, which form persistent contact ion pairs with [DBA]2-, slow the H2-addition rate to a higher extent than more weakly coordinating Na+/K+ ions. For the hydrogenation of unsaturated compounds, we identified Li2[4] (Me substituents at boron) as the best performing catalyst; its substrate scope encompasses Ph(H)C=NtBu, Ph2C=CH2, and anthracene. The conversion of E-Cl to E-H bonds (E = C, Si, Ge, P) was best achieved by using Na2[4]. The latter protocol provides facile access also to Me2Si(H)Cl, a most important silicone building block. Whereas the H2-transfer reaction regenerates the dianion [4]2- and is thus immediately catalytic, the H--transfer process releases the neutral 4, which has to be recharged by Na metal before it can enter the cycle again. To avoid Wurtz-type coupling of the substrate, the reduction of 4 must be performed in the absence of the element halide, which demands an alternating process management (similar to the industrial anthraquinone process).

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