14049-36-6Relevant articles and documents
Laser induced dielectric breakdown for synthesis of chlorofluorosilanes
Ermakov, A. A.,Gornushkin, I. B.,Kornev, R. A.,Polyakov, V. S.,Sennikov, P. G.,Shkrunin, V. E.
, (2021)
Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different combinations of F and Cl in molecules of chlorofluorosilane SiFxCly adds additional flexibility in realization of these processes. Direct synthesis of SiFxCl4-x (x = 1, 2, 3) from SiF4 and SiCl4 is thermodynamically forbidden under standard conditions. This restriction is removed in low-temperature plasmas studied in this work: a laser induced dielectric breakdown (LIDB) plasma and steady-state inductively-coupled plasma (ICP). The plasmas differ in many respects including energy content, temperature, and electron density that lead to different ionization/excitation states of plasma species, which are observed from plasma optical emission spectra. IR spectroscopy and mass-spectrometry confirm the formation of three chlorofluorosilanes, SiF3Cl, SiF2Cl2, and SiFCl3 that constitute ～60 % in products of LIDB plasma and split 50/50 between SiF3Cl, SiFCl3 and SiF2Cl2. Experimental observations are verified by equilibrium static calculations via the minimization of Gibbs free energy and by dynamic calculations via the chemical-hydrodynamic plasma model of a spherically expanding plasma plume. The both types of calculations qualitatively agree with the results of spectroscopic analysis and reproduce dominant presence of SiF2Cl2 as the temperature of the gas approaches the room temperature.
Infrared photoreaction of 2-chloroethyltrifluorosilane
Dementyev, Petr S.,Nizovtsev, Anton S.,Chesnokov, Evgenii N.
, p. 77 - 80 (2011)
Infrared laser dissociation of 2-chloroethyltrifluorosilane has been studied in light of silicon isotopes separation. The reaction occurs via beta-elimination mechanism to yield ethylene and chlorotrifluorosilane as products. The dissociation has a relatively low energy barrier what was confirmed by high-level quantum chemical calculations. High enrichment of 30Si isotope was demonstrated.
Conversion of alkyltrifluoroborates into alkyldichloroboranes with tetrachlorosilane in coordinating solvents
Kim, Byung Ju,Matteson, Donald S.
, p. 3056 - 3058 (2007/10/03)
Organotrifluoroborate salts are converted rapidly by tetrachlorosilane in nucleophilic solvents such as THF or acetonitrile into organodichloroboranes coordinated with the solvent (see scheme). This reaction completes a sequence from alkylboronic esters via the trifluoroborate salts to reactive alkyldichloroboranes under mild conditions.
