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Tris(2-(2-methoxyethoxy)ethyl)amine is a complex organic compound that features a central nitrogen atom bonded to three 2-(2-methoxyethoxy)ethyl groups. Tris(2-(2-methoxyethoxy)ethyl)amine is known for its ability to act as a phase-transfer catalyst, which is particularly useful in various chemical reactions involving the transfer of reagents between immiscible phases.

70384-51-9

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70384-51-9 Usage

Uses

Used in Organic Synthesis:
Tris(2-(2-methoxyethoxy)ethyl)amine is used as a phase-transfer catalyst for the oxidation of arylmethanols under phase-transfer conditions. This application is crucial in the synthesis of various organic compounds, where the selective oxidation of arylmethanols is required.
Used in Cryptand Chemistry:
In the field of cryptand chemistry, Tris(2-(2-methoxyethoxy)ethyl)amine serves as a cryptand during phase-transfer glycosylation of 2-amino-4-methoxy-7H-pyrrolo[2,3-d]pyrimidine. Cryptands are multidentate ligands that can encapsulate metal ions, and their use in this context highlights the versatility of Tris(2-(2-methoxyethoxy)ethyl)amine in facilitating specific chemical reactions.
Used in Pharmaceutical Synthesis:
Tris(2-(2-methoxyethoxy)ethyl)amine is used as a phase-transfer catalyst in the synthesis of 1,3-dideaza-2′-deoxyadenosine and related benzimidazole 2′-deoxyribonucleosides. These compounds are of significant interest in the pharmaceutical industry due to their potential applications as therapeutic agents.
Used in Chemical Research:
In the broader field of chemical research, Tris(2-(2-methoxyethoxy)ethyl)amine is utilized for its phase-transfer catalytic properties, enabling the development of new synthetic pathways and the discovery of novel compounds with potential applications in various industries.

Check Digit Verification of cas no

The CAS Registry Mumber 70384-51-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,0,3,8 and 4 respectively; the second part has 2 digits, 5 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 70384-51:
(7*7)+(6*0)+(5*3)+(4*8)+(3*4)+(2*5)+(1*1)=119
119 % 10 = 9
So 70384-51-9 is a valid CAS Registry Number.
InChI:InChI=1/C15H33NO6/c1-17-10-13-20-7-4-16(5-8-21-14-11-18-2)6-9-22-15-12-19-3/h4-15H2,1-3H3

70384-51-9 Well-known Company Product Price

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  • Alfa Aesar

  • (L13544)  Tris(3,6-dioxaheptyl)amine, 95%   

  • 70384-51-9

  • 5g

  • 165.0CNY

  • Detail
  • Alfa Aesar

  • (L13544)  Tris(3,6-dioxaheptyl)amine, 95%   

  • 70384-51-9

  • 25g

  • 529.0CNY

  • Detail
  • Alfa Aesar

  • (L13544)  Tris(3,6-dioxaheptyl)amine, 95%   

  • 70384-51-9

  • 100g

  • 1069.0CNY

  • Detail
  • Aldrich

  • (301248)  Tris[2-(2-methoxyethoxy)ethyl]amine  95%

  • 70384-51-9

  • 301248-5G

  • 335.79CNY

  • Detail
  • Aldrich

  • (301248)  Tris[2-(2-methoxyethoxy)ethyl]amine  95%

  • 70384-51-9

  • 301248-100G

  • 1,129.05CNY

  • Detail
  • Aldrich

  • (301248)  Tris[2-(2-methoxyethoxy)ethyl]amine  95%

  • 70384-51-9

  • 301248-500G

  • 4,179.24CNY

  • Detail

70384-51-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Tris(2-(2-methoxyethoxy)ethyl)amine

1.2 Other means of identification

Product number -
Other names tris<2-(2-methoxyethoxy)ethyl>amine

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:70384-51-9 SDS

70384-51-9Synthetic route

2-Bromoethyl methyl ether
6482-24-2

2-Bromoethyl methyl ether

2,8,9-trioxa-5-aza-1-borabicyclo[3.3.3]undecane
283-56-7

2,8,9-trioxa-5-aza-1-borabicyclo[3.3.3]undecane

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
With tetrabutyl-ammonium chloride; sodium hydroxide In sulfolane at 60 - 120℃; Reagent/catalyst;92.7%
2-chloroethyl methyl ether
627-42-9

2-chloroethyl methyl ether

2,8,9-trioxa-5-aza-1-borabicyclo[3.3.3]undecane
283-56-7

2,8,9-trioxa-5-aza-1-borabicyclo[3.3.3]undecane

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
With tetrabutylammomium bromide; potassium hydroxide In dimethyl sulfoxide at 60 - 120℃; Catalytic behavior; Reagent/catalyst; Solvent; Inert atmosphere; Autoclave; Large scale;86.3%
1-chloro-2-(2-methoxyethoxy)ethane
52808-36-3

1-chloro-2-(2-methoxyethoxy)ethane

2-(2-methoxyethoxy)ethanamine
31576-51-9

2-(2-methoxyethoxy)ethanamine

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
With sodium carbonate at 110℃; for 24h; Temperature;85.48%
1-chloro-2-(2-methoxyethoxy)ethane
52808-36-3

1-chloro-2-(2-methoxyethoxy)ethane

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
With ammonia In methanol
2-(2-methoxyethoxy)ethyl alcohol
111-77-3

2-(2-methoxyethoxy)ethyl alcohol

A

8-aza-2,5,11,14-tetraoxa-pentadecane
5732-47-8

8-aza-2,5,11,14-tetraoxa-pentadecane

B

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
With ammonia; hydrogen; nickel at 185℃; 1.) 3h, 2.) 2h;A 3241 %
B 15125 g
With ammonia; hydrogen; nickel at 185℃; 1.) 3h, 2.) 2h;A 3241 g
B 15125 g
2-(2-methoxyethoxy)ethyl alcohol
111-77-3

2-(2-methoxyethoxy)ethyl alcohol

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: SOCl2, Py
2: NH3 / methanol
View Scheme
aluminum nickel
Multi-step reaction with 2 steps
1: thionyl chloride / N,N-dimethyl-formamide / 3 h / 28 - 60 °C
2: sodium carbonate / 24 h / 110 °C
View Scheme
Multi-step reaction with 3 steps
1: thionyl chloride / N,N-dimethyl-formamide / 3 h / 28 - 60 °C
2: ammonia / 6 h / 130 °C / 11251.1 Torr / Autoclave
3: sodium carbonate / 24 h / 110 °C
View Scheme
triethanolamine
102-71-6

triethanolamine

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: toluene / 1 h / Reflux; Inert atmosphere; Large scale
2: potassium hydroxide; tetrabutylammomium bromide / dimethyl sulfoxide / 60 - 120 °C / Inert atmosphere; Autoclave; Large scale
View Scheme
Multi-step reaction with 2 steps
1: toluene / 1 h / Reflux
2: potassium hydroxide; tetrabutylammomium bromide / dimethyl sulfoxide / 60 - 120 °C / Inert atmosphere; Autoclave; Large scale
View Scheme
Multi-step reaction with 2 steps
1: toluene / 1 h / Reflux
2: potassium hydroxide; tetrabutylammomium bromide / dimethyl sulfoxide / 60 - 120 °C / Inert atmosphere; Autoclave; Large scale
View Scheme
Multi-step reaction with 2 steps
1: toluene / 1 h / Reflux; Inert atmosphere; Large scale
2: sodium hydroxide; tetrabutyl-ammonium chloride / sulfolane / 60 - 120 °C
View Scheme
Multi-step reaction with 2 steps
1: toluene / 1 h / Reflux
2: sodium hydroxide; tetrabutyl-ammonium chloride / sulfolane / 60 - 120 °C
View Scheme
α-ketoglutaric acid
328-50-7

α-ketoglutaric acid

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

AKG-diTMEEA

AKG-diTMEEA

Conditions
ConditionsYield
In acetone at 35 - 45℃;100%
2-acrylamido-2-methylpropanesulfonic acid
15214-89-8

2-acrylamido-2-methylpropanesulfonic acid

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

tris-[2-(2-methoxy-ethoxy)-ethyl]-amine; compound with 2-acryloylamino-2-methyl-propane-1-sulfonic acid

tris-[2-(2-methoxy-ethoxy)-ethyl]-amine; compound with 2-acryloylamino-2-methyl-propane-1-sulfonic acid

Conditions
ConditionsYield
at 25℃; for 8h;99%
3-Acryloyloxypropane-1-sulfonic acid
39121-78-3

3-Acryloyloxypropane-1-sulfonic acid

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

C15H33NO6*C6H10O5S
1509627-70-6

C15H33NO6*C6H10O5S

Conditions
ConditionsYield
In water at 20℃; for 10h; Inert atmosphere; Schlenk technique;99%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

(2-hydroxyphenyl)acetic acid disodium salt
117571-22-9

(2-hydroxyphenyl)acetic acid disodium salt

potassium 2-iodo-5-methylbenzoate
117571-21-8

potassium 2-iodo-5-methylbenzoate

2-<2-(carboxymethyl)phenoxy>-5-methylbenzoic acid
117571-23-0

2-<2-(carboxymethyl)phenoxy>-5-methylbenzoic acid

Conditions
ConditionsYield
With hydrogenchloride; copper(l) chloride In 1,4-dioxane; sodium hydroxide91%
3,3-Dibutyl-2,3-dihydro-5H-7-fluoro-1,5-benzothiazepine-4-one

3,3-Dibutyl-2,3-dihydro-5H-7-fluoro-1,5-benzothiazepine-4-one

para-iodoanisole
696-62-8

para-iodoanisole

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

3,3-dibutyl-2,3-dihydro-7-fluoro-5-(4'-methoxyphenyl)-1,5-benzothiazepine-4-one

3,3-dibutyl-2,3-dihydro-7-fluoro-5-(4'-methoxyphenyl)-1,5-benzothiazepine-4-one

Conditions
ConditionsYield
With CuI; potassium carbonate90%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

N,N-dimethylethylenediamine
108-00-9

N,N-dimethylethylenediamine

ortho-nitrofluorobenzene
1493-27-2

ortho-nitrofluorobenzene

N1,N1-dimethyl-N2-(2-nitrophenyl)ethane-1,2-diamine
25238-55-5

N1,N1-dimethyl-N2-(2-nitrophenyl)ethane-1,2-diamine

Conditions
ConditionsYield
With potassium carbonate90%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

toluene-4-sulfonic acid
104-15-4

toluene-4-sulfonic acid

8-amino-8-(2-(2-methoxyethoxy)ethyl)-2,5,11,14-tetraoxa-8-azapentadecan-8-ium4-methylbenzenesulfonate

8-amino-8-(2-(2-methoxyethoxy)ethyl)-2,5,11,14-tetraoxa-8-azapentadecan-8-ium4-methylbenzenesulfonate

Conditions
ConditionsYield
With iodosylbenzene; ammonium carbamate In acetonitrile at 25℃; for 2h;89%
3-formyl-10-methylphenothiazine
4997-36-8

3-formyl-10-methylphenothiazine

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

(E)-3-(10-methyl-10H-phenothiazin-3-yl)acrylaldehyde
1374005-27-2

(E)-3-(10-methyl-10H-phenothiazin-3-yl)acrylaldehyde

Conditions
ConditionsYield
With (1,3-dioxolan-2-yl-methyl)triphenylphosphonium bromide; potassium carbonate In dichloromethane for 20h; Reflux;88.6%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

ethyl iodide
75-03-6

ethyl iodide

N-ethyl-2-(2-methoxyethoxy)-N,N-bis(2-(2-methoxyethoxy)ethyl)ethan-1-aminium iodide

N-ethyl-2-(2-methoxyethoxy)-N,N-bis(2-(2-methoxyethoxy)ethyl)ethan-1-aminium iodide

Conditions
ConditionsYield
In acetonitrile at 50℃; Inert atmosphere;88%
butyldimethylsilyl chloride
1000-50-6

butyldimethylsilyl chloride

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

tetramethyldibutyldisilane

tetramethyldibutyldisilane

Conditions
ConditionsYield
With sodium iodide85%
3,4-Dinitrotoluene
610-39-9

3,4-Dinitrotoluene

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

N,N-dimethylethylenediamine
108-00-9

N,N-dimethylethylenediamine

A

N,N-Dimethyl-2-(5-methyl-2-nitroanilino)ethanamine
138423-04-8

N,N-Dimethyl-2-(5-methyl-2-nitroanilino)ethanamine

B

N,N,N-Trimethyl-2-(5-methyl-2-nitroanilino)ethanaminium Iodide
144674-99-7

N,N,N-Trimethyl-2-(5-methyl-2-nitroanilino)ethanaminium Iodide

Conditions
ConditionsYield
In dimethyl sulfoxideA 80%
B n/a
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

N,N-bis(2-(2-methoxyethoxy)ethyl)formamide

N,N-bis(2-(2-methoxyethoxy)ethyl)formamide

Conditions
ConditionsYield
With pyridine; copper(l) chloride In acetonitrile at 100℃; under 7500.75 - 22502.3 Torr; for 24h; Autoclave; regioselective reaction;75%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

aniline
62-53-3

aniline

N-(2-(2-methoxyethoxy)ethyl)aniline
189077-66-5

N-(2-(2-methoxyethoxy)ethyl)aniline

Conditions
ConditionsYield
With 1-hydroxytetraphenylcyclopentadienyl(tetraphenyl-2,4-cyclopentadien-1-one)-μ-hydrotetracarbonyldiruthenium(II) In tert-Amyl alcohol at 150℃; for 24h; Inert atmosphere;74%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

ethylmagnesium bromide
925-90-6

ethylmagnesium bromide

C15H33NO6*2C2H5BrMg

C15H33NO6*2C2H5BrMg

Conditions
ConditionsYield
In diethyl ether; cyclohexane for 1h;72%
2,4-imidazolidinedione
461-72-3

2,4-imidazolidinedione

Benzyloxymethyl chloride
3587-60-8

Benzyloxymethyl chloride

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

3-benzyloxymethyl-imidazolidine-2,4-dione
151918-26-2

3-benzyloxymethyl-imidazolidine-2,4-dione

Conditions
ConditionsYield
With potassium hydroxide In water; 4-methyl-2-pentanone70%
2,4-Difluoronitrobenzene
446-35-5

2,4-Difluoronitrobenzene

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

N,N-dimethylethylenediamine
108-00-9

N,N-dimethylethylenediamine

N,N,N-Trimethyl-2-(5-β-hydroxyethoxy-2-nitroanilino)ethanaminium Iodide
144674-98-6

N,N,N-Trimethyl-2-(5-β-hydroxyethoxy-2-nitroanilino)ethanaminium Iodide

Conditions
ConditionsYield
With potassium carbonate In N-methyl-acetamide; ethylene glycol; dimethyl sulfoxide70%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

potassium hexamethylsilazane
40949-94-8

potassium hexamethylsilazane

C21H51KN2O6Si2

C21H51KN2O6Si2

Conditions
ConditionsYield
In hexane Inert atmosphere; Schlenk technique;69%
1-(6-bromohexyl)-2,3-dihydroxybenzene

1-(6-bromohexyl)-2,3-dihydroxybenzene

1-(6-bromohexyl)-2,3-dimethoxybenzene
123014-42-6

1-(6-bromohexyl)-2,3-dimethoxybenzene

1-hexyl-4-methyl-benzene
1595-01-3

1-hexyl-4-methyl-benzene

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

benzyl bromide
100-39-0

benzyl bromide

1,2-bis-(phenylmethoxy)-3-(6-bromohexyl)benzene
134472-49-4

1,2-bis-(phenylmethoxy)-3-(6-bromohexyl)benzene

Conditions
ConditionsYield
With hydrogenchloride; boron tribromide; potassium carbonate In dichloromethane; water; toluene67%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

vinyl magnesium bromide
1826-67-1

vinyl magnesium bromide

C15H33NO6*2C2H3BrMg

C15H33NO6*2C2H3BrMg

Conditions
ConditionsYield
In tetrahydrofuran; cyclohexane for 1h;64%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

3-butyl-7-chloro-8-methoxy-2,3-dihydro-1,5-benzothiazepin-4(5H)-one

3-butyl-7-chloro-8-methoxy-2,3-dihydro-1,5-benzothiazepin-4(5H)-one

3-butyl-7-chloro-5-(4-fluorophenyl)-8-methoxy-2,3-dihydro-1,5-benzothiazepin-4(5H)-one

3-butyl-7-chloro-5-(4-fluorophenyl)-8-methoxy-2,3-dihydro-1,5-benzothiazepin-4(5H)-one

Conditions
ConditionsYield
With potassium carbonate64%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

[4-(4-bromobutoxy)phenyl][4-(hexyloxy)phenyl]diazene

[4-(4-bromobutoxy)phenyl][4-(hexyloxy)phenyl]diazene

C37H62N3O8(1+)*Br(1-)

C37H62N3O8(1+)*Br(1-)

Conditions
ConditionsYield
In acetonitrile for 96h; Reflux;62%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

2,4-dibromo-N-(1-((4-fluorophenyl)amino)hexan-2-yl)-5-methoxybenzenesulfonamide

2,4-dibromo-N-(1-((4-fluorophenyl)amino)hexan-2-yl)-5-methoxybenzenesulfonamide

7-bromo-3-butyl-5-(4-fluorophenyl)-8-methoxy-2,3,4,5-tetrahydro-1,2,5-benzothiadiazepine 1,1-dioxide

7-bromo-3-butyl-5-(4-fluorophenyl)-8-methoxy-2,3,4,5-tetrahydro-1,2,5-benzothiadiazepine 1,1-dioxide

Conditions
ConditionsYield
With potassium carbonate55%
cesium bis(trimethylsilyl)amide

cesium bis(trimethylsilyl)amide

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

tris{2-(2-methoxyethoxy)ethyl}amine*cesium bis(trimethylsilyl)amide

tris{2-(2-methoxyethoxy)ethyl}amine*cesium bis(trimethylsilyl)amide

Conditions
ConditionsYield
In hexane for 0.166667h; Schlenk technique; Inert atmosphere;49%
tris[2-(2-methoxyethoxy]amine

tris[2-(2-methoxyethoxy]amine

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

potassium 2-chlorobenzoate
16463-38-0

potassium 2-chlorobenzoate

sodium 2-allyl-4-methylphenolate
118537-94-3

sodium 2-allyl-4-methylphenolate

2-(2-allyl-4-methylphenoxy)benzoic acid
117571-24-1

2-(2-allyl-4-methylphenoxy)benzoic acid

Conditions
ConditionsYield
copper(l) chloride In methoxybenzene47%
6-(bromomethyl)-1,3,8-trimethoxyanthracene-9,10-dione
60699-01-6

6-(bromomethyl)-1,3,8-trimethoxyanthracene-9,10-dione

Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

2-(2-methoxyethoxy)-N-(2-(2-methoxyethoxy)ethyl)-N-((4,5,7-trimethoxy-9,10-anthraquinone-2-yl)methyl)ethanaminium bromide

2-(2-methoxyethoxy)-N-(2-(2-methoxyethoxy)ethyl)-N-((4,5,7-trimethoxy-9,10-anthraquinone-2-yl)methyl)ethanaminium bromide

Conditions
ConditionsYield
for 24h; Reflux;31.4%
Tris(3,6-dioxaheptyl)amine
70384-51-9

Tris(3,6-dioxaheptyl)amine

C22H29BrN2O2

C22H29BrN2O2

C37H62N3O8(1+)*Br(1-)

C37H62N3O8(1+)*Br(1-)

Conditions
ConditionsYield
In acetonitrile for 72h; Reflux;25%

70384-51-9Relevant articles and documents

Novel method for preparing tris (3,6 -dioxo-heptyl) amine

-

Paragraph 0037; 0055-0059; 0063-0067; 0071-0074, (2021/04/14)

The invention relates to a new method for preparing tris(3,6-dioxaheptyl)amine. The new method is characterized in that ammonia water, diethylene glycol monomethyl ether and thionyl chloride are takenas raw materials, and the tris(3,6-dioxaheptyl)amine is synthesized through three steps. The new method provided by the invention has the following advantages that reaction conditions are mild, the operation is safe, and the danger of using high-risk chemicals such as hydrogen and Raney nickel is avoided; the reaction conversion rate is high, and the product yield is high; only products, sodium chloride and a very small amount of pre-distillation fractions are produced in the process, excess materials can be recycled after treatment, three wastes are very few, and the production process is green and environmentally friendly.

Synthesis method of tri(3, 6-dioxyheteroheptyl)amine

-

Paragraph 0030-0033; 0038; 0039; 0040; 0044-0046, (2019/02/27)

The invention discloses a synthesis method of tri(3, 6- dioxyheteroheptyl)amine and belongs to the technical field of organic synthesis. The method includes: exchanging triethanolamine and triborate to form ester, and reacting with 2-haloethyl methyl ether in a condition with alkali and a phase transfer catalyst to obtain tri(3, 6-dioxyheteroheptyl)amine. The method can be completed in a same reaction kettle, so that high efficiency of reaction operation is realized, a product obtained by reaction is high in purity and easy to purify, and reference is provided for industrial amplification.

Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film

-

, (2012/05/04)

A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0 (c+d)/(a+b+c+d) ≤ 1.0, and X and Y are each the formula (2) or (3), provided that at least one group of the formula (3) is present, (B) a photoacid generator represented by the formula (8) and (C) a solvent.

Resist composition and patterning process

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, (2010/02/17)

The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

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, (2010/04/23)

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Photo acid generator, chemical amplification resist material and pattern formation method

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, (2008/06/13)

A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer.

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

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, (2008/06/13)

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Method for preparing tris(ether-amine)

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, (2008/06/13)

The invention concerns a method for preparing tris(ether-amines) of formula (I): N[A—O—(B—O)n—R]3wherein R, A, B and n are as defined in Claim 1, comprising the reaction, in liquid phase, of an alkylene-glycol monoether of formula (II): HO—A—O—(B—O)nR wherein R, A, B and n are as defined in Claim 1, with an ammonolysis agent selected among ammonia and an etheramine of formula (I′): H3-pN[A—O—(B—O)nR]pwherein: A, B, n and R are as defined in Claim 1 and p represent 1 or 2, at a temperature ranging between 100 and 250° C., by contacting reagents with a hydrogenation-dehydrogenation catalyst.

Process for the disproportionation of silanes

-

, (2008/06/13)

Silane, SiH4, and diochlorosilane, particularly suitable for the preparation of silicon are readily obtained by disproportionating trichlorosilane to dichlorosilane and, ultimately silane by reacting: (a) a silane containing at least one Si-H bond, of the general formula Rn Hm SiX4-(n+m) wherein R represents an alkyl or aryl group, x represents a halogen or an alkoxy group, n is an integer equal to 0, 1, 2 or 3 and m is an integer equal to 1, 2 or 3, and (b) a catalyst system comprising an ionic inorganic salt of the formula M+ A- and a compound capable of at least partially dissociating the salt by complexing its cation M+.

Tris(polyoxaalkyl)amines (Trident), a New Class of Solid-Liquid Phase-Transfer Catalysts

Soula, Gerard

, p. 3717 - 3721 (2007/10/02)

A new class of solid-liquid phase-transfer catalysts has been prepared.These tris(polyoxaalkyl)amines (I) are designed to obtain the best balance between straightforward synthesis (cheap starting materials), high activity, easy recovery, and low toxicity.The catalysts are synthesized from ethylene glycols by a simple one-step method in yields in the range of 65-81percent.They show high catalytic effects in aliphatic nucleophic substitutions and aromatic nucleophilic substitutions on activated and unactivated molecules.In the Ullman synthesis (a new PTC reaction) there is a synergic effect of anionic activation by tridents and by copper salts.Reactions have been carried out at temperatures up to 180 deg C without evidence of decomposition of the tris(polyoxaalkyl)amines. The behavior and catalytic activity of these catalysts are discussed.

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