such as gas sensors.2 Furthermore, picene 2 showed super-
conductivity with a high superconducting transition tem-
perature, Tc = 18 K, upon being doped with alkaline
metals such as potassium.3 The potassium-doped picene is
the first hydrocarbon-based superconductor3 illustrating
that picene 2 and its derivatives represent a novel and
promising class of materials for organic electronics,
although picene has rarely been applied to practical elec-
tronic devices.
The conventional synthetic methods employed in the
preparation of picene involve the use of multistep
procedures.4 Therefore, a simple and convenient strategy
for the synthesis of picene 2 is highly desirable in order to
promote further investigations into its use in organic
electronics.
In the course of our synthetic study of picene 2, we have
found that sensitized photolysis of 1,2-di(1-naphthyl)-
ethane 3 unexpectedly produced picene 2 in one step.
Herein, we report the photochemical formation of picene
2 as a new and convenient methodology for picene synth-
esis. Additionally, the preparation of novel functionalized
picenes, with the aim of developing a new phenacene for
potential use as an organic electronic material, is also
described.
The initial investigations were performed using direct
irradiationofdinaphthylethane3. Whendinaphthylethane
3 was irradiated (>280 nm) in degassed acetonitrile
(MeCN), no appreciable product formation was observed.
In contrast, photolysis of the same in aerated MeCN
resulted in the formation of 1-naphthaldehyde, instead of
the desired picene 2, as observed in the absorption spectra
of the photolysate (Figure S1, Supporting Information). It
can be concluded that upon direct photolysis, homolytic
cleavage of the CÀC bond of the ethylene bridge of
dinaphthylethane 3 occurred to afford the 1-naphthyl-
methyl radical A which was trapped with the dissolved
O2 and finally produced 1-naphthaldehyde (Scheme 1).5
(DCA) as sensitizers. Primary screening was carried out by
monitoring the progress of the photoreactions (irradiated
at 350 nm) by H NMR spectroscopy. The ratio of 3/
1
sensitizer was set to 1:3. Typical 1H NMR spectral changes
during the photolysis are shown in Figure S2 (Supporting
Information). Figure 2 shows the time course of consump-
tion of the starting dinaphthylethane 3 and formation of
picene 2. For XT-sensitized irradiation, neither significant
consumption of dinaphthylethane 3 nor formation of
picene 2 was observed. In the case of DCA-sensitized
irradiation, 32% of the starting dinaphthylethane 3 was
consumed, whereas a trace amount of picene 2 was ob-
served (<3%) after 44 h of irradiation. It was found that,
among the sensitized photolyses investigated, the photo-
lysis of dinaphthylethane 3 in the presence of 9F resulted in
the highest yield of picene, with a yield of 25% accompa-
nied by 53% consumption of dinaphthylethane 3, after 44
h of irradiation. Prolonged irradiation was not effective for
enhancing the yield (27% after 90 h). In the case of BP
sensitization, conversion of dinaphthylethane 3 (61%) was
the highest among the sensitized phtolyses investigated,
however, the yield of picene 2 (11%) was lower than
that for the 9F sensitization. Therefore, 9F was selected
for use asthe sensitizer in subsequent preparative studies of
picene 2.
Scheme 1. Direct Photolysis of Dinaphthylethane 3
Figure 2. Time course of photolysis (350 nm, CDCl3) of di-
naphthylethane 3 sensitized with 9F (9), BP (b), XT ((), and
DCA (1). The solid and dotted lines show the yield of picene 2
and consumption of dinaphthylethane 3, respectively.
In a small-scale preparation, a mixture of dinaphthy-
lethane 3 (0.25 mmol) and 9F (0.50 mmol) in CHCl3 (50
mL) was irradiated with 350-nm fluorescent lamps for 38.5
h. After chromatographic separation, picene 2 was isolated
in 14% yield. (Since 51% of dinaphthylethane 3 was
recovered, the product yield based on consumed starting
material was 28%.) Larger scale preparation was also
conducted using typical experimental procedures outlined
as follows. A solution of dinaphthylethane 3 (9.7 mmol)
and 9F (29 mmol) in CHCl3 (450 mL) was irradiated with a
450-W high-pressure mercury arc lamp under N2 atmo-
sphere. After 48 h of irradiation, the solvent was removed
under reduced pressure and the residue was washed with
Subsequently, the sensitized photolysis of dinaphthy-
lethane 3 was performed using xanthone (XT), benzophe-
none (BP), 9-fluorenone (9F), and 9,10-dicyanoantharacene
(3) Mitsuhashi, R.; Suzuki, Y.; Yamanari, Y.; Mitamura, H.;
Kambe, T.; Ikeda, N.; Okamoto, H.; Fujiwara, A.; Yamaji, M.;
Kawasaki, N.; Maniwa, Y.; Kubozono, Y. Nature 2010, 464, 76.
(4) For some reported picene syntheses, see: (a) Mallory, F. B.;
Mallory, C. W. Org. React. 1984, 30, 1. (b) Harvey, R. G.; Pataki, J.;
Cortez, C.; Di Raddo, P.; Yang, C. X. J. Org. Chem. 1991, 56, 1210. (c)
Minuti, L.; Taticchi, A.; Gacs-Baitz, E.; Marrocchi, A. Tetrahedron
1998, 54, 10891. (d) Some, S.; Dutta, B.; Ray, J. K. Tetrahedron Lett.
2006, 47, 1221. (e) Nakano, Y.; Saito, M.; Nakamura, H. WO
2010016511 A1 20100211, 2010; Chem. Abstr. 2010, 152, 276730.
(5) Slocum, G. H.; Schuster, G. B. J. Org. Chem. 1984, 49, 2177.
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