ORGANIC
LETTERS
2011
Vol. 13, No. 10
2626–2629
Ti(O-i-Pr)4/Me3SiCl/Mg-Mediated
Reductive Cleavage of Sulfonamides and
Sulfonates to Amines and Alcohols
Noriaki Shohji, Tsuyoshi Kawaji, and Sentaro Okamoto*
Department of Material and Life Chemistry, Kanagawa University, 3-27-1
Rokkakubashi, Kanagawa-ku, Yokohama 221-8686, Japan
Received March 19, 2011
ABSTRACT
A low-valent titanium generated in situ from Ti(O-i-Pr)4, Me3SiCl, and Mg powder in THF reacted with aryl- and alkyl-sulfonamides of aryl and alkyl
amines in a reductive NÀS/SÀO/SÀC bond cleaving pathway to provide the corresponding amines and hydrocarbons (and thiols) derived from
the sulfonyl moiety. The reagent could also cleave sulfonates to the corresponding alcohols.
Protection/deprotection of amine functionality is of impor-
tance for synthesizing nitrogen-containing compounds invol-
ving biologically active substances. One of the most versatile
protecting groups for amines is based on formation/disconnec-
tion of sulfonamides,1 which are readily prepared, often bring
an easiness of purification, and have reasonable stability under
various reaction conditions. However, the requirement of the
robust conditions for their deprotection is a major disadvan-
tage. The traditional way is hydrolysis with strong acids such as
HBr or HClO4. Reductive cleavage through a single-electron
transfer (SET) process from alkali metals is commonly used.
However, these suffer from harsh reaction conditions, which
often affect other functional groups present in the substrate.
The methods reported to mediate p-toluenesulfonamide (Ts-
amide) cleavage under milder conditions are as follows:
electrolysis,2 Ni(acac)2/i-PrMgCl,3 n-Bu3SnH/AIBN,4 TiCl4/
Zn,4a TiCl3/Li,5a mischmetal/TiCl4,5b Mg/MeOH,6 Mg/
Me3CoLi,7 alkali metals on silica,8 TMSI,9 SmI2,10
photolysis,11 TBAF,12 and phase-transfer catalyst.13 How-
ever, many of these methods are not necessarily general
€
(5) (a) Nayak, S. K. Synthesis 2000, 1575. (b) Vellemae, E.; Lebedev,
€
O.; Maeorg, U. Tetrahedron Lett. 2008, 49, 1373.
(6) Sridhar, M.; Kumar, B. A.; Narender, R. Tetrahedron Lett. 1998,
39, 2847. Nyasse, B.; Ragnarsson, U. Chem. Commun. 1997, 1017.
(7) Uchiyama, M.; Matsumoto, Y.; Nakamura, S.; Ohwada, T.;
Kobayashi, N.; Yamashita, N.; Matsumiya, A.; Sakamoto, T. J. Am.
Chem. Soc. 2004, 126, 8755.
(8) Nandi, P.; Redko, M. Y.; Peterson, K.; Dye, J. L.; Lefenfeld, M.;
Vogt, P. F.; Jackson, J. E. Org. Lett. 2008, 10, 5441.
(9) Sabitha, G.; Reddy, B. V. S.; Abraham, S.; Yadav, J. S. Tetra-
hedron Lett. 1999, 40, 1569.
ꢀ
(10) Grach, G.; Santos, J. S. O.; Lohier, J.; Mojovic, L.; Ple, N.;
Turck, A.; Reboul, V.; Metzner, P. J. Org. Chem. 2006, 71, 9572. Duan,
H.; Jia, Y.; Wang, L.; Zhou, Q. Org. Lett. 2006, 8, 2567. Kuriyama, M.;
Soeta, T.; Hao, X.; Chen, Q.; Tomioka, K. J. Am. Chem. Soc. 2004, 126,
8128. Hayashi, T.; Kawai, M.; Tokunaga, N. Angew. Chem., Int. Ed.
2004, 43, 6125. Fujihara, H.; Nagai, K.; Tomioka, K. J. Am. Chem. Soc.
2000, 122, 12055. Alonso, D. A.; Andersson, P. G. J. Org. Chem. 1998,
63, 9455. Vedejs, E.; Lin, S. J. Org. Chem. 1994, 59, 1602. Ankner, T.;
Hilmersson, G. Org. Lett. 2009, 11, 503.
(1) Greene, T. W.; Wuts, P. G. M. Protective Groups in Organic
Synthesis, 4th ed; John Wiley & Sons: New York, 2007.
(2) Senboku, H.; Nakahara, K.; Fukuhara, T.; Hara, S. Tetrahedron
Lett. 2010, 51, 435. Coeffard, V.; Thobie-Gautier, C.; Beaudet, I.; Le
Grognec, E.; Quintard, J. P. Eur. J. Org. Chem. 2008, 383. Civitello,
E. R.; Rapoport, H. J. Org. Chem. 1992, 57, 834. Maia, H. L. S.; Medeiros,
M. J.; Montenegro, M. I.; Court, D.; Pletcher, D. J. Electroanal. Chem.
1984, 164, 347.
(11) Liu, Q.; Liu, Z.; Zhou, Y.-L.; Zhang, W.; Yang, L.; Liu, Z.-L.;
Yu, W. Synlett 2005, 2510 and references therein.
(3) Millburn, R. R.; Snieckus, V. Angew. Chem., Int. Ed. 2004, 43, 892.
(4) (a) Knowles, H. S.; Parsons, A. F.; Pettifer, R. M.; Rickling, S.
Tetrahedron 2000, 56, 979. (b) Parsons, A. F.; Pettifer, R. M. Tetra-
hedron Lett. 1996, 37, 1667.
(12) Yasuhara, A.; Kameda, M.; Sakamoto, T. Chem. Pharm. Bull.
1999, 47, 809.
ꢁ
(13) Liu, Y.; Shen, L.; Prashad, M.; Tibbatts, J.; Repic, O.; Blacklock,
T. J. Org. Process Res. Dev. 2008, 12, 778.
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10.1021/ol200740r
Published on Web 04/21/2011
2011 American Chemical Society