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on/off current ratios are relatively low (<104). On PS−SiO2/Si
Notes and references
substrates, better switching characteristics of FETs can be
achieved. When Tsub= 70 °C (Figure 3), thin film of the complex
1 exhibits excellent n-type FET performance with a mobility of
0.11 cm2 V−1 s−1 and on/off ratio of 2 × 106. The device
performances of the complex 1 are summarized in Table 1.
Except for the high charge carrier mobility, good stability in air
is also a key parameter for the potential application of FETs. The
on/off current cycle test was performed on one representative
10 device (on PS-SiO2/Si substrate) and a good stability was shown
over 1000 test cycles (Figure S7a). Furthermore, FET
performances of the complex 1 in ambient conditions have been
examined. On PS-SiO2/Si substrate at Tsub = 70 °C, the mobility
(0.089 cm2 V−1 s−1) and on/off current ratio (4 × 104) remain in a
15 high level; and after the devices were stored in ambient
conditions for about 30 days, the mobility showed little changing
(ꢀ/ꢀ0 > 0.82) and the current on/off ratio was still kept between
104 and 105 (Figure S7b). These results indicated good air
stability of complex 1, which implies its practical application
20 value.
Atomic force microscopy (AFM) was taken to study the vacuum
deposited films of the complex 1 (Figures S8a and S8b).
Complex 1 forms interconnected films. The grain size increases
and the grain boundaries become more obscure when increasing
25 substrate temperatures. However, the device performance is not
further enhanced at the highest Tsub, probably because the carrier
trap size also becomes larger.15
To gain insight into the film structures, XRD were carried out
for thin films of the complex 1 (Figures S8c and S8d).On PS-
30 SiO2/Si substrates, a series of sharp peaks are observed, and
strongest diffractions appears at Tsub = 70 °C, consistent with the
Tsub at which the best FET performance appeared; on OTS-
SiO2/Si substrates the intensities of diffractions are relatively
weak. The first diffraction peak (5.28 °) is corresponding to layer
35 spacing of 16.8 Å, close to the length of the molecule observed in
the X-ray single crystal structure of the complex 1 (17.4 Å). The
results reveal good crystallinity and ordering of the thin film of
the complex 1, and may imply that the molecules take edge-on
molecular orientation in the film.
60
65
1
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40 It is worth noticing that the complex 1 has a simple structure
with less extended π-conjugation compared to most of organic
semiconductors, such n-type FET performance is unprecedented.
In addition, the ease of synthesis and high ambient stability of
these materials will be ideal for low-cost production and practical
45 application. Therefore, these may open up a new window for the
development of high-performance n-type semiconductors.
In summary, a simple nickel bis(dithiolene) complex 1, bis(1-
(4’-trifluoromethylphenyl)-1,2-ethenedithiolato) nickel, has been
designed and synthesized. Despite its small π-conjugated system,
50 thin film of 1 has shown excellent n-type field-effect transistor
response, with electron mobility of 0.11 cm2 V−1 s−1 and on/off
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ratio of 2 × 106. Good FET stability in ambient condition has 120 14 B. Noda, H. Wada, M. Katsuhara, I. Aoyagi, T. Mori, T.
been also observed. These results suggest the new design
strategy and bright future of square-planar nickel complexes for
55 molecular electronics. Further work is in progress to investigate
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This work was financially supported by the National Natural
Science Foundation of China (No. 20772094).
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