F.-L. Ye et al. / Polymer 54 (2013) 3324e3333
3333
[3] Kim TW, Choi H, Oh SH, Wang G, Kim DY, Hwang H, et al. Adv Mater 2009;21:
2497.
[4] Choi TL, Lee KH, Joo WJ, Lee S, Lee TW, Chae MY. J Am Chem Soc 2007;129:
9842.
[5] Kim M, Choi S, Ree M, Kim O. IEEE Electron Device Lett 2007;28:967.
[6] Cho B, Kim TW, Choe M, Wang G, Song S, Lee T. Org Electron 2009;10:473.
[7] Kim TW, Oh SH, Lee J, Choi H, Wang G, Park J, et al. Org Electron 2010;11:109.
[8] Fang J, You H, Chen J, Lin J, Ma D. Inorg Chem 2006;45:3701.
[9] Ling QD, Wang W, Song Y, Zhu CX, Chan DSH, Kang ET, et al. J Phys Chem B
2006;110:23995.
and ITO/PAzo-Br/Al device can be fitted with PooleeFrenkel (PF)
emission. Figs. 8b and d and Fig. 9b and d show that the IeV
characteristics for all memory devices of the high conductivity
state are linear and can be fitted with the ohmic model. This
indicates that in the ON state the charge transport is dominated
by the ohmic model [45,46].
4. Conclusions
[10] Kim K, Park S, Hahm SG, Lee TJ, Kim DM, Kim JC, et al. J Phys Chem B
2009;113:9143.
In this paper, we have successfully synthesized two new azo
organic molecules Azo-OCH3 and Azo-Br with different terminal
electron moieties and their homopolymers for nonvolatile elec-
tronic memory materials. The ITO/organic molecule/Al devices and
the ITO/polymer/Al devices all exhibit WORM memory behavior.
Both the ON and OFF states of the devices investigated are stable
under a constant read voltage stress of ꢀ1 V and even can endure
108 read cycles under a pulse read voltage. The OFF state of ITO/
Azo-OCH3/Al device and ITO/PAzo-OCH3/Al device can be fitted
with the space charge limited current (SCLC) model while the OFF
state of ITO/Azo-Br/Al device and ITO/PAzo-Br/Al device can be
fitted with PooleeFrenkel (PF) emission. The ON state of all mem-
ory devices can be fitted with the ohmic model. Azo-OCH3, Azo-Br,
PAzo-OCH3 and PAzo-Br are all p-type materials. Both Azo-OCH3
and PAzo-OCH3 based devices have an advantage of possessing low
turn-on threshold voltage due to the lower hole-injection barrier,
which means low-power consumption. Polymers have successfully
retained the storage performance of organic molecules. Moreover,
polymer-based memory devices fabricated by spin coating polymer
materials have the advantages of easy fabrication, high mechanical
flexibility, good stability and many other advantages. Thus, from the
perspective of device fabrication to consider, we have successfully
achieved the advantages of easy fabrication, low-cost and low-
power consumption without destroying the storage performance.
[11] Ling QD, Lim SL, Song Y, Zhu CX, Chan DSH, Kang ET, et al. Langmuir
2007;23:312.
[12] Li L, Ling QD, Lim SL, Tan YP, Zhu C, Chan DSH, et al. Org Electron 2007;8:401.
[13] Cho B, Kim TW, Song S, Ji Y, Jo M, Hwang H, et al. Adv Mater 2010;22:1228.
[14] Lee TJ, Chang CW, Hahm SG, Kim K, Park S, Kim DM, et al. Nanotechnology
2009;20:135204.
[15] Li F, Son DI, Seo SM, Cha HM, Kim HJ, Kim BJ, et al. Appl Phys Lett 2007;91:
122111.
[16] Lee J, Lee E, Kim S, Bang GS, Shultz DA, Schmidt RD, et al. Angew Chem Int Ed
2011;50:4414.
[17] Liu Y, Lv S, Li L, Shang S. Synth Metals 2012;162:1059.
[18] Wei Y, Gao D, Li L, Shang S. Polymer 2011;52:1385.
[19] Kim TW, Oh SH, Choi H, Wang G, Hwang H, Kim DY, et al. IEEE Electron Device
Lett 2008;29:852.
[20] Wang P, Liu SJ, Lin ZH, Dong XC, Zhao Q, Lin WP, et al. J Mater Chem 2012;22:
9576.
[21] Ling QD, Song Y, Ding SJ, Zhu C, Chan DSH, Kwong DL, et al. Adv Mater
2005;17:455.
[22] Baek S, Lee D, Kim J, Hong SH, Kim O, Ree M. Adv Funct Mater 2007;17:2637.
[23] Zhang Q, Pan J, Yi X, Li L, Shang S. Org Electron 2012;13:1289.
[24] Liu G, Zhang B, Chen Y, Zhu CX, Zeng L, Chan DSH, et al. J Mater Chem
2011;21:6027.
[25] Salaoru I, Paul S. Thin Solid Films 2010;519:559.
[26] Fan N, Liu H, Zhou Q, Zhuang H, Li Y, Li H, et al. J Mater Chem 2012;22:19957.
[27] Kim DM, Park S, Lee TJ, Hahm SG, Kim K, Kim JC, et al. Langmuir 2009;25:
11713.
[28] Fang YK, Liu CL, Chen WC. J Mater Chem 2011;21:4778.
[29] Liu CL, Kurosawa T, Yu AD, Higashihara T, Ueda M, Chen WC. J Phys Chem C
2011;115:5930.
[30] Wang KL, Liu YL, Lee JW, Neoh KG, Kang ET. Macromolecules 2010;43:7159.
[31] Liu SJ, Wang P, Zhao Q, Yang HY, Wong J, Sun HB, et al. Adv Mater 2012;24:
2901.
Acknowledgments
[32] You NH, Chueh CC, Liu CL, Ueda M, Chen WC. Macromolecules 2009;42:4456.
[33] Liu CL, Hsu JC, Chen WC, Sugiyama K, Hirao A. ACS Appl Mater Interfaces
2009;1:1974.
[34] Lee WY, Kurosawa T, Lin ST, Higashihara T, Ueda M, Chen WC. Chem Mater
2011;23:4487.
[35] Hahm SG, Lee TJ, Kim DM, Kwon W, Ko YG, Michinobu T, et al. J Phys Chem C
2011;115:21954.
[36] Li H, Wen Y, Li P, Wang R, Li G, Ma Y, et al. Appl Phys Lett 2009;94:163309.
[37] Li H, Li N, Sun R, Gu H, Ge J, Lu J, et al. J Phys Chem C 2011;115:8288.
[38] Zhang B, Liu G, Chen Y, Wang C, Neoh KG, Bai T, et al. ChemPlusChem
2012;77:74.
The authors graciously thank the Chinese Natural Science Foun-
dation (21071105 and 21176164), Chinese-Singapore Joint Project
(2012DFG41900), the Specialized Research Fund for the Doctoral
Program of Higher Education of China (grant no. 20113201130003),
and the project funded by the Priority Academic Program Develop-
ment (PAPD) of Jiangsu Higher Education Institution.
[39] Kuorosawa T, Chueh CC, Liu CL, Higashihara T, Ueda M, Chen WC. Macro-
molecules 2010;43:1236.
Appendix A. Supplementary data
[40] Liu YL, Ling QD, Kang ET, Neoh KG, Liaw DJ, Wang KL, et al. J Appl Phys
2009;105:044501.
[41] Liu YL, Wang KL, Huang GS, Zhu CX, Tok ES, Neoh KG, et al. Chem Mater
2009;21:3391.
Supplementary data related to this article can be found at http://
[42] Wang KL, Liu YL, Shih IH, Neoh KG, Kang ET. Polym Chem 2010;48:5790.
[43] Ling QD, Song Y, Lim SL, Teo EYH, Tan YP, Zhu C, et al. Angew Chem Int Ed
2006;45:2947.
References
[44] Li H, Li N, Gu H, Xu Q, Yan F, Lu J, et al. J Phys Chem C 2010;114:6117.
[45] Li Y, Xu H, Tao X, Qian K, Fu S, Shen Y, et al. J Mater Chem 2011;21:1810.
[46] Liu J, Yin Z, Cao X, Zhao F, Lin A, Xie L, et al. ACS Nano 2010;4:3987.
[1] Chen Q, Zhao L, Li C, Shi G. J Phys Chem C 2007;111:18392.
[2] Joo WJ, Choi TL, Lee J, Lee SK, Jung MS, Kim N, et al. J Phys Chem B 2006;110:
23812.