Shock-induced kinetics of the disilane decomposition and silylene reactions with trimethylsilane and butadiene

DOI: 10.1021/om00069a020

Source and publish data:

Organometallics p. 1217 - 1220 (1982)

Update date:2022-08-05

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Authors:

Dzarnoski

Rickborn

O'Neal O'Neal

Ring Ring

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Article abstract of DOI:10.1021/om00069a020

The homogeneous gas-phase decomposition kinetics of disilane have been studied by the comparative rate, single-pulse shock-tube technique in the 850-1000 K (2300-2700 torr) ranges. Two primary dissociation processes occur, Si2H₆-i SiH_{4
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Full text of DOI:10.1021/om00069a020

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