C O M M U N I C A T I O N S
Scheme 1. Proposed Mechanism for the Photo-Generation of TBD
Further utilization of TBD•HBPh4 for photoinduced polymer
cross-linking can be envisioned, based on the TBD-catalyzed trans-
esterification reaction between an ester and an alcohol. Thus, upon
addition of the irradiated AN solution of TBD•HBPh4 to a mixture
at a 1:1 (wt/wt) ratio of poly(methyl methacrylate) (PMMA) and
2-hydroxyethyl cellulose (HEC) in N,N-dimethylformamide, a gel
was formed in 30 min at room temperature, indicating polymer
cross-linking. This photoinduced polymer cross-linking can also
proceed at the interface of the two polymer films. Upon irradiation
of a thick film of HEC coated with a thin layer of PMMA containing
5 mol % TBD•HBPh4, only PMMA on the irradiated areas were
left on HEC after washing off the top layer, as evident by a large
change in the contact angle of water from 45° (for HEC) to 86°
(for PMMA) (SI, Figure S6). Furthermore, a self-photo-cross-linking
polymer system can be realized, by introducing a hydroxy-ester
moiety in polymer. One example demonstrated herein is the use of
hydroxypropyl acrylate (HPA) as a self-cross-linkable unit in the
copolymers with methyl methacrylate (MMA) and N-vinylpyrroli-
done (VP), respectively. Films of the two copolymers, P(MMA-
co-HPA) (1:1) and P(VP-co-HPA) (1:1), containing 5 mol %
TBD•HBPh4 were irradiated at 254 nm and then baked at 100 °C
for 3 min. Both polymer films became insoluble in organic solvents
due to polymer cross-linking, as a result of trans-esterification and
subsequent loss of methanol or/and 1,3-propylenediol (SI, Figure
S8). In comparison, P(MMA-co-HPA) could not be cross-linked
using 5 mol% Ph3B. Thus, polymers or blends containing hydroxyl
and ester groups can be photocross-linked with a catalytic amount
of TBD•HBPh4.
from TBD•HBPh4
of TBD from TBD•HBPh4. Furthermore, by plotting the area of
the new peak at 3.08 ppm as a function of absorbed photons, the
quantum yield (Φ) for TBD generation is calculated to be 0.18
(SI). A higher efficiency of photolysis of TBD•HBPh4 can be
expected at a shorter wavelength, due to its much higher absorption
coefficient.
To investigate the photobase-generating mechanism, the
kinetics of photolysis of TBD•HBPh4 was studied by UV-vis
spectroscopy, with reference to the known photochemistry of
NaBPh4 (SI, Figure S9).4 Both compounds show nearly identical
absorption, suggesting that BPh4- serves as a chromophore rather
than the TBD•H+ cation. By monitoring the spectral changes
during the photolysis of NaBPh4 and TBD•HBPh4 under same
conditions, the following were observed: (1) a drastic decrease
in absorbance at 200 nm and an increase in absorbance at 250
nm with the two tight isosbestic points (192 and 239 nm) for
both salts and (2) virtually identical rate constants of photodis-
sociation of 0.0368((0.002) s-1 and 0.0370((0.002) s-1 for
NaBPh4 and TBD•HBPh4, respectively (SI). The results strongly
suggest that photolysis of TBD•HBPh4 proceeds in the same
-
In conclusion, TBD•HBPh4 represents a new family of short-
wave UV PBGs and is able to generate a base 100 times more
basic than the strongest base (DBU) generated among all the
previously reported PBGs. This PBG enables the photoinduced
living ROP of cyclic esters and the photocross-linking of polymeric
materials containing the hydroxyl-ester groups.
pathway as NaBPh4. Accordingly, the excited BPh4 ion
rearranges and then abstracts a proton from the neighboring
TBD•H+ cation to release TBD (Scheme 1). The resulting
trivalent arylborane further decomposes to aromatic fragments.
Considering the higher absorption coefficients in the deep UV
region of BPh4- (Figure 1a), TBD can be photogenerated below
200 nm, for example, at 193 nm from ArF excimer laser, in a
higher quantum yield than being done at 254 nm. There are clear
advantages of using sub-200 nm light in photolithography and
other photoinduced processes.7
This photobase-generating mechanism implies that other stronger
organic bases can be converted to photobases as their HBPh4 salts.
Indeed, photolysis of t-BuP1(dma)•HBPh4 at 254 nm generated a
P1 base, t-butyliminotris(dimethylamino)phosphorane (ANpKa )
26.9), as verified by 31P NMR spectroscopy and pH indicator (SI,
Figures S11-S12).
Because TBD can still be released in the presence of alcohols
(methanol and ethanol), due to its lower pKa than alcohols,
TBD•HBPh4 can be utilized as a photocatalyst for some base-
catalyzed reactions such as the anionic ROP of cyclic esters. Thus,
bulk polymerization of CL was attempted using 1 mol % of
TBD•HBPh4 in the presence of 1 mol% of n-hexanol as an initiator.
After irradiation for 5 min at 254 nm in argon, polymerization then
proceeded for 8 h at 60 °C. Poly(CL) in a molecular weight (Mn)
of 16 537 g mol-1 or DP of 144 was obtained with ∼70% monomer
conversion. The ROP rate increased with longer irradiation time
(SI, Figure S5a), indicating the release of more base catalysts. The
living nature of this ROP is evident by the observed linear
relationship between the monomer conversion and molecular weight
of poly(CL) (SI, Figure S5b, c). No poly(CL) was formed using
NaBPh4 or Ph3B, thus eliminating their possible roles as a
photocatalyst or in situ generated Lewis catalyst for ROP. It should
also be noted that DBU generated from reported PBGs is insufficient
to trigger the ROP of CL.3b
Acknowledgment. We thank the Natural Sciences and Engi-
neering Research Council of Canada for financial support.
Supporting Information Available: Synthesis, characterization,
kinetic studies, polymerization, and cross-linking. This material is
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