C O M M U N I C A T I O N S
Table 1. OTFT Data of the Semiconductors DS-nT Deposited at
Different Substrate Temperatures on Silicon Oxide Layers
no decrease, of the on/off ratio was noticed upon storage. Moreover,
the Vt value determined for each independent device did not show
significant change over time.
material
Tsub
(
°
C)
µ
(cm2/Vs)
on/off
Vt (V)
1.6-1.9 × 105
4-8
0-19
0.1-3
4-13
3-13
12-20
5-20
9-22
A DS-4T OTFT device that had been stored over 17 months
has been subjected to a continuous sweeping of gate-source
voltages (-40 V < VGS < +40 V) under a constant drain-source
voltage (VDS ) -40 V) (Figure 2, right). After a first series of
1000 double scans, a small increase of IDS was observed, which
almost overlapped the initial value after a rest period of 10 min.
Then a series of 3000 double scans was further applied, which led
to a similar shift-recovery for IDS and to no degradation of
performances (µ, Vt, and on/off ratio). These results show that the
17 months old devices are stable under continuous operation
conditions. A possible reason for the reversible shift observed for
IDS in these experiments could be an increase of the device
temperature during operation or a reversible charging effect at the
semiconductor-dielectric interface.
DS-2T
30
80
30
80
30
80
110
140
0.002-0.006
0.01-0.02
0.001-0.008
0.01-0.02
0.02-0.04
0.03-0.06
0.08-0.1
2-2.3 × 105
DS-3T
DS-4T
2.2-2.8 × 104
2.2-3.3 × 104
1.2-1.8 × 103
1.9-2.5 × 103
0.8-1.2 × 103
1.5-2 × 103
0.05-0.07
In conclusion, distyryl oligothiophenes represent a novel class
of OTFT semiconductors that combine good electrical performances
and exceptional stabilities. The synthesis of soluble and n-type
analogous derivatives is currently underway for applications in
flexible electronics.
Figure 1. (Left) Plot of IDS versus VDS at various gate voltages in a DS-
4T-based OTFT device fabricated at Tsub ) 110 °C. (Right) AFM picture
(scale ) 2.8 µm × 2.8 µm) of a DS-4T thin film evaporated on SiO2/Si at
Tsub ) 110 °C.
Acknowledgment. We thank David Rondeau (Universite´ An-
gers, France) for his help in mass spectrometry measurements.
Supporting Information Available: DS-nT syntheses, details of
experimental procedures in solution, OTFT device fabrication, X-ray
diffraction procedure; Scheme S1; Figures S1, S2; Tables S1, S2. This
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Figure 2. Characteristics of DS-4T OTFT devices on SiO2/Si. (Left) Plots
of hole mobilities (µ) versus storage days for OTFTs fabricated at different
substrate deposition temperatures (Tsub). (Right) Plots of IDS versus VGS at
constant VDS ) -40 V at Tsub ) 80 °C after 17 months of storage.
OTFT devices were stored over 17 months in the dark under
ambient conditions, and device performances were measured
periodically. Figure 2 (left) illustrates the stability of the hole
mobility values obtained for DS-4T films deposited at three
temperatures onto unmodified SiO2/Si substrates. In contrast, the
mobility value determined under the same conditions for the
octithiophene semiconductor (8T, Tsub ) 150 °C) showed a decrease
of about 70% of its initial value (0.073 cm2/Vs) after 100 days. In
the case of the shorter derivatives, DS-2T and DS-3T, the mobility
values remained constant over 100 days, but a decrease of about
20-50% of the initial device performance appeared on a shelf-life
time test of 10 months. Strikingly, the highest device stability was
obtained for DS-4T, the compound with the highest HOMO energy
level within the DS-nT series, which is in contrast with previous
observations.6 Although this behavior still remains unclear, an
increase of doping level over time for the more oxidizable DS-4T
oligomer can be ruled out at this stage as no change, and especially
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