Photochemically-Removable Silyl Protecting Groups

DOI: 10.1021/jo00077a010

Source and publish data:

Journal of Organic Chemistry p. 6961 - 6963 (1993)

Update date:2022-08-03

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Authors:

Pirrung, Michael C.

Lee, Yong Rok

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Article abstract of DOI:10.1021/jo00077a010

(Hydroxystyryl)dimethylsilyl (HSDMS) and (hydroxystyryldiisopropylsilyl (HSDIS) reagents have been developed that readily protect primary and secondary alcohols and can be removed on irradiation with short wavelength light in polar solvent.

Full text of DOI:10.1021/jo00077a010

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