5690
Y. Zhu et al. / Tetrahedron Letters 48 (2007) 5687–5691
Just as the real and imaginary components of the linear
susceptibility v(1) are associated with refraction and
absorption, nonlinear refraction (NLR) and nonlinear
absorption (NLA) can be described by the real and
imaginary parts of third-order nonlinear susceptibility
v(3). Usually, the third-order nonlinear refractive index
n2 and nonlinear absorptive coefficient b are used in
nonlinear refraction and nonlinear absorption. The
material’s suitability for device fabrication can in most
cases be estimated by considering a figure of merit
(FOM) detailing the ratio of the nonlinear refraction
to nonlinear absorption. The FOM is usually given as
jTjꢀ1 = jn2eff/(2kbeff)j.28,29 When the nonlinearity is due
to the population of excited state, what we observe is
not a true v(3) effect but is a sequential v(1):v(1) process
(effective third-order nonlinearities). Here, the first v(1)
is associated with the ground state absorption, the
second with the resulting excited state absorption or
refraction. In order to determine the FOM of DSPs,
we have also fitted the data of Z-scan experiments with
effective third-order nonlinear absorptive coefficient beff
Acknowledgments
We thank the 973 Program (2006CB932900) and
NSFC (Nos. 20572048, 20421202 and 10574075), Asia
Research Center in Nankai University (No. AS0528)
and the Preparatory Project of the National Key Funda-
mental Research Program (No. 2004CCA04400) for
their generous financial support.
Supplementary data
Supplementary data (Experimental, NMR, mass, X-ray
crystal structure data, absorption and emission spectral
data of selected compounds.) associated with this article
References and notes
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