Full text of DOI:10.1063/1.106540

Effect of helium dilution during plasmaenhanced deposition on electron trapping
in silicon dioxide thin films
Y. C. Park, N. M. Johnson, W. B. Jackson, K. S. Stevens, D. L. Smith, and S. B. Hagstrom
Citation: Applied Physics Letters 60, 695 (1992); doi: 10.1063/1.106540
View online: http://dx.doi.org/10.1063/1.106540
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/60/6?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sun, 21 Dec 2014 17:55:11
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sun, 21 Dec 2014 17:55:11
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sun, 21 Dec 2014 17:55:11
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