A.V. Morozkin et al. / Journal of Alloys and Compounds 415 (2006) 12–15
13
Table 2
and a standard high-pressure container “chechevitsa 028”
(Il’ich plant, St. Peterburg, Russia).
Interatomic distances D 2 × 10−3 nm and coordination number N for
atoms in the CeSi2 and Ce37Si28Ga35 compounds
The quality of the samples before physical measurements
was determined using X-ray phase analysis and microprobe
X-ray analysis. X-ray data were obtained on a DRON-3.0
diffractometer (Cu K␣ radiation, 2Θ = 20–70◦, step 0.05◦, for
5 s per step). The diffractograms obtained were identified by
means of calculated patterns using the Rietan-program [3,4]
in the isotropic approximation. A «Camebax» microanalyser
was employed to perform microprobe X-ray spectral analyses
and to obtain S.E.M. images of the samples.
Atoms
(b) Ce37Si28Ga35
D
N
Atoms
D
N
Ce
Ce
4Si
8Si
Si
0.315
0.316
0.4067
16
4Xa
8X
4Ce
X
0.322
0.321
0.4165
1Si
2Si
2Ce
4Ce
a
0.226
0.242
0.315
0.316
9
1X
2X
2Ce
4Ce
0.233
0.246
0.322
0.321
Theelecricalresistance, thermalconductivityandSeebeck
coefficient were measured with using standard methods [5]
on the laboratory equipment.
X = Si0.4Ga0.6
.
Thermal-pressing treatment of the GdSi2-type Y0.5Ce0.5
-
3. Results and discussion
Si2 compound leads to the formation of the high-temperature
X-ray phase analysis and microprobe X-ray analysis show
that the samples contain an admixture of phases that may
influence the results of the measurements of the thermoelec-
tric properties (Table 3 and Fig. 1).
The temperature dependences of the Seebeck coefficients,
electrical resistance and thermal conductivity are given in
Fig. 2.
The CeSi2 and CeSiGa alloys show metallic type conduc-
tivitywithclosevaluesoftheelectricalresistance(thethermal
coefficients of the electrical resistance are 1.72 × 10−3 K−1
for CeSi2 and 1.43 × 10−3 K−1 for CeSiGa) (Fig. 2b). The
conductivity (the thermal coefficients of the electrical resis-
tance are 7.26 × 10−5 K−1 for CeSiGe and 2.18 × 10−4 K−1
for Y0.5Ce0.5Si2 alloys). The CeSi1.6Ge0.4 alloy shows semi-
conductor type conductivity (Fig. 2b). It is obvious, the
cal resistance of the CeSiGe, CeSi1.6Ge0.4 and Y0.5Ce0.5Si2
alloys (Fig. 1; Table 3).
Analysis of the powder X-ray diffractograms shows that
the solid solutions based on the CeSi2 compound and pre-
pared by arc-furnace melting crystallize in the tetrago-
nal ThSi2-type structure (space group I41/amd, no. 141-2),
excepting Y0.5Ce0.5Si2. The Y0.5Ce0.5Si2 compound crys-
tallizes in the orthorhombic GdSi2-type structure (space
group Imma, no. 74). The cell parameters of the compounds,
refined at room temperature, atomic position papameters
and the reliability factor RF are given in Table 1. The
interatomic distances for CeSi2 and Ce40Si27Ge32 com-
pounds are given in Table 2. The substitution of germanium
or gallium for silicon leads to increasing cell parameters
in the CeSi2 compound. The substitution Y for Ce leads
to decreasing the cell parameters in the CeSi2 compound
(Table 1).
The thermal-pressing treatment leads to a decreasing unit
cell volume and an anisotropic distortion of the unit cell in
the CeSi2 compound (the a cell parameter decreases, whereas
the c cell parameter increases) (Table 1). After arc-furnace
melting the CeSi2 compound has c/a = 3.3204, after thermal-
pressing treatment it has c/a = 3.3478. Probably, the result
of this thermal-pressing treatment is a decreasing number of
defects in the polycrystalline lattice of the alloys.
Thethermalconductivityforallcompoundsincreaseswith
increasing temperature (Fig. 2c). The CeSiGe alloy shows
lowest value of the thermal conductivity. The thermal con-
ductivities of the other alloys are close.
Table 1
Cell parameters a (nm), b (nm) and c (nm), unit cell volume V (nm3) and atomic position parameters of RX2 compounds
Compound
Space group
a
b
c
V
ZX
RF
CeSi2
CeSi2
ThSi2
ThSi2
GdSi2
ThSi2
ThSi2
ThSi2
ThSi2
I41/amd
I41/amd
Imma
0.41874(4)
0.41711(5)
0.4154(6)
0.41219(4)
0.4229(1)
0.42018(4)
0.4243(1)
1.3904(2)
1.3964(2)
1.3491(3)
1.3554(1)
1.4353(2)
1.3865(2)
1.3897(3)
0.24380
0.24295
0.22852
0.23028
0.25670
0.24479
0.25019
0.457(1)
0.456(1)
7.5
8.0
8.7
4.6
5.7
7.6
6.9
a
b
a
Y
0.5Ce0.5Si2
0.40776(6)
Y0.5Ce0.5Si2
I41/amd
I41/amd
I41/amd
I41/amd
ꢀ
0.4570(6)
0.4561(6)
0.458(1)
0.457(1)
Ce37Si28Ga35
Ce38Si48Ge13
Ce40Si27Ge32
ꢀ
The R factors are given in percent (RF = 100(
|(Ikobs
)
1/2 − (Ikcal
)
1/2|)/
|(Ikobs
)
1/2|)%, Ikobs is the integrated intensity evaluated from summation of
k
k
contribution of the kth peaks to net observed intensity, Ikcal is the integrated intensity calculated from refined structural parameters).
a
After thermal-pressure treatment.
b
Atomic position parameters: rare earths atoms occupy 4(c) special position [0,1/4, 375(1)], silicon atoms occupy 4(c) site [0,1/4, 0.778(3)] and 4(c) site
[0,1/4, 0.947(3)].