Full text of DOI:10.1063/1.105438

Optimum implantation conditions for ion beam synthesis of buried cobalt silicide
layers in Si(100)
E. H. A. Dekempeneer, J. J. M. Ottenheim, D. W. E. Vandenhoudt, C. W. T. BulleLieuwma, and E. G. C.
Lathouwers
Citation: Applied Physics Letters 59, 467 (1991); doi: 10.1063/1.105438
View online: http://dx.doi.org/10.1063/1.105438
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/59/4?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.248.9.8 On: Mon, 22 Dec 2014 04:14:01
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.248.9.8 On: Mon, 22 Dec 2014 04:14:01
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.248.9.8 On: Mon, 22 Dec 2014 04:14:01
1