Full text of DOI:10.1063/1.102306

Kinetics aspects of TiSi2 deposition without silicon consumption
D. Bensahel, J. L. Regolini, and J. Mercier
Citation: Applied Physics Letters 55, 1549 (1989); doi: 10.1063/1.102306
View online: http://dx.doi.org/10.1063/1.102306
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/55/15?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 130.113.76.6
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 130.113.76.6
On: Wed, 03 Dec 2014 19:15:50

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 130.113.76.6
On: Wed, 03 Dec 2014 19:15:50

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
130.113.76.6 On: Wed, 03 Dec 2014 19:15:50